Process for producing mixture of silicon tetrachloride and trichlorosilane
专利摘要:
Iron, aluminium and titanium free silicon tetrachloride or a mixture thereof with silicochloroform and/or dichlorosilane is prepared by the continuous reaction of lumpy ferrosilicon with chlorine or hydrogen chloride in a closed reactor which has a support for the ferrosilicon as well as means for supplying the halogenation agent in its lower portion and has a ferrosilicon supply and reaction gas exit in its upper portion. The temperature in the top space of the reactor is held below the sublimation temperature of ferric chloride by spraying in liquid chlorosilane and the reaction gas, in a given case by way of a cyclone, is supplied to a washer pressurized with liquid chlorosilane; the mixture of gas, liquid and solid leaving this washer is introduced directly into a separator for liquid and solid laden with liquid chlorosilane, the separated gas lead through a washing column pressurized with pure chlorosilane and finally pure chlorosilane is condensed out. 公开号:SU988184A3 申请号:SU721826746 申请日:1972-09-11 公开日:1983-01-07 发明作者:Келлер Рудольф;Клебе Ханс;Фолльбрехт Хейнц-Рюдигер 申请人:Дегусса Аг (Фирма); IPC主号:
专利说明:
I am burning it to YuOO ° C. To remove heat from the free-flowing FeSi layer of the reaction gases and to condense iron chloride gas, 1200 kg / h of liquid recirculated pure chlorosilane mixture is injected into the head of the reactor. Thus, the reaction gas is cooled to 280 ° C, i.e., to a temperature well below the sublimation temperature of ferric chloride. The gas stream from the reactor is sent to the cyclone to separate the separated solid iron chlorides. For further purification of the gaseous reaction product, it is sent to the washing in a Venturi washer,) which is supplied with 10 m / h circulating chlorine-free silica purified from solid chlorides. In the washing apparatus, the reaction gas due to partial evaporation of the circulu liquid silicon tetrachloride is cooled to, which leads to condensation of the residual amount of iron chlorides and also aluminum chloride and titanium tetrachloride. For fine purification of titanium chloride impurities, the reaction gas is subjected to additional washing in a washing column with non-liquid purified chlorosilane mixture. Purified from undesirable metal compounds silicon tetrachloride they are coiled in a condenser at + 2O-5O C. The finished product (345 kg / h of a mixture of silicon tetrachloride and grichlorosilane with an insignificant content of dichlorosilane,%: 83 SiCp, 16.8, and 0.2 SiMjCe) enters the storage tank. The product contains not more than O, OOZ% ferric chloride, O, O 6% aluminum chloride and 0, O 7 titanium tetrachloride.
权利要求:
Claims (1) [1] Invention Formula The method of obtaining a mixture of silicon tetrachloride and trichlorosilane by hydrochlorination of ferrosilicon at a temperature of 8OO-12OOC, followed by washing with silicon tetrachloride and condensation of the product, characterized in that, in order to simplify the process by eliminating impurities condensation and rectifying the product, before washing the product is cooled. chlorosilane mixture to a temperature of 280-450 ° C. Sources of information taken into account in the examination, I. Furman A., A., Rabovsky .B. G. Fundamentals of Chemistry and Technology of Anhydrous Chlorides, M., 197O, p. 167-169 (prototype).
类似技术:
公开号 | 公开日 | 专利标题 SU988184A3|1983-01-07|Process for producing mixture of silicon tetrachloride and trichlorosilane RU2368568C2|2009-09-27|Method of obtaining silicon US4165363A|1979-08-21|Process for the production of chlorosilanes US2395314A|1946-02-19|Process for the production of chlorine US5124135A|1992-06-23|Process for the selective absorption of chlorine and/or bromine from CO.sub. -containing off-gases with the aid of steam US4470959A|1984-09-11|Continuous production of silicon tetrafluoride gas in a vertical column US2841243A|1958-07-01|Purification of hydrogen chloride US2817580A|1957-12-24|Process for purifying hydrogen sulphide containing hydrogen cyanide US2538723A|1951-01-16|Process for producing perchlorethylene US2431823A|1947-12-02|Manufactruing thionyl chloride US3233978A|1966-02-08|Process for producing chlorine and recovering substantially pure hydrogen chloride from the hot reaction product GB948788A|1964-02-05|Improvements in or relating to sub-halide distillation process for aluminium JPS6221706A|1987-01-30|Recycling production of silicon or silicon compound via trichlorosilane US4233280A|1980-11-11|Manufacture of anhydrous hydrogen chloride by combusting chlorine-containing organic substances US4259309A|1981-03-31|Method for obtaining gaseous hydrogen chloride from dilute aqueous hydrochloric acid JPH08225471A|1996-09-03|Method of separating hydrogen chloride US2018397A|1935-10-22|Anhydrous hydrogen fluoride US3544274A|1970-12-01|Halogen production KR100255969B1|2000-05-01|A process for purifying gaseous methane-containing hydrogen chloride US4388290A|1983-06-14|Purifying thionyl chloride with AlCl3 catalyst US3555784A|1971-01-19|Separating ammonia from offgas obtained in the synthesis of melamine US2672398A|1954-03-16|Process for the production of cyanogen chloride US3336111A|1967-08-15|Apparatus and method for the manufacture of fluorides US3315441A|1967-04-25|Process for separating ammonia from methyl chloride US3145079A|1964-08-18|Process for the preparation of purified hydrogen bromide gas by the use of activated arbon as catalyst
同族专利:
公开号 | 公开日 DE2161641C3|1974-05-16| IT975490B|1974-07-20| GB1407020A|1975-09-24| FR2162364B1|1979-04-06| YU250472A|1982-05-31| JPS5238518B2|1977-09-29| SE379032B|1975-09-22| FR2162364A1|1973-07-20| NL165436B|1980-11-17| JPS4866097A|1973-09-11| DE2161641A1|1973-06-28| YU39163B|1984-08-31| NL7212721A|1973-06-13| BE792542A|1973-03-30| RO64682A|1980-06-15| NO133321C|1976-04-12| DE2161641B2|1973-10-04| NO133321B|1976-01-05| CH584655A5|1977-02-15| NL165436C|1981-04-15| US3878291A|1975-04-15| CA979620A|1975-12-16|
引用文献:
公开号 | 申请日 | 公开日 | 申请人 | 专利标题 US2594370A|1947-05-14|1952-04-29|Diamond Alkali Co|Method of separating metal halides| US2718279A|1952-12-18|1955-09-20|Du Pont|Process for condensing vaporized metal halides| US2849083A|1957-01-31|1958-08-26|American Cyanamid Co|Separation of iron chloride from gaseous iron chloride-titanium tetrachloride mixtures| GB963745A|1961-01-05|1964-07-15|British Titan Products|Halogenation of silicon-containing materials| CH412345A|1961-01-31|1966-04-30|Weisse Ernst Ing Dr|Method and device for separating harmful constituents from the waste gases produced during the treatment of light metal melts with chlorine or chlorine-containing gases| DE1567469B1|1966-12-02|1970-08-27|Degussa|Process for the simultaneous separation of aluminum chloride and titanium tetrachloride from the reaction gases resulting from the chlorination or hydrochlorination of silicon| DE1667195C3|1968-01-31|1979-09-27|Metallgesellschaft Ag, 6000 Frankfurt|Process for the production of hydrohalic acids and metal oxides|US4043758A|1973-03-06|1977-08-23|Larco Societe Miniere Et Metallurgique De Larymna S.A.|Apparatus for the manufacture of metallic chlorides| US4066424A|1976-10-13|1978-01-03|E. I. Du Pont De Nemours And Company|Selectively recovering metal chlorides from gaseous effluent| DE3303903A1|1982-02-16|1983-08-25|General Electric Co., Schenectady, N.Y.|Process for the preparation of trichlorosilane from silicon| US4743344A|1986-03-26|1988-05-10|Union Carbide Corporation|Treatment of wastes from high purity silicon process| DE3642285C1|1986-12-11|1988-06-01|Huels Troisdorf|Process for working up residues of a chlorosilane distillation| US5182095A|1987-12-16|1993-01-26|Huls Troisdorf Aktiengesellschaft|Method for processing residues from the distillation of chlorosilanes| DE3828344C1|1988-08-20|1989-07-06|Huels Ag, 4370 Marl, De| DE4033611A1|1990-10-23|1992-04-30|Huels Chemische Werke Ag|METHOD FOR OBTAINING LOW CHLORIDE OVEN ASH IN THE CONVERSION OF RAW SILICON TO CHLORINE SILANES| DE4126670A1|1991-08-13|1993-02-18|Huels Chemische Werke Ag|METHOD FOR WASTEWATER-FREE PROCESSING OF RESIDUES FROM A CHLORINE SILANE DISTILLATION WITH HYDROCHLORIC ACID| TW223109B|1991-09-17|1994-05-01|Huels Chemische Werke Ag| DE10030251A1|2000-06-20|2002-01-03|Degussa|Separation of metal chlorides from gaseous reaction mixtures from chlorosilane synthesis| DE10057483B4|2000-11-20|2013-02-21|Evonik Degussa Gmbh|Process for removing aluminum trichloride from chlorosilanes| DE10061682A1|2000-12-11|2002-07-04|Solarworld Ag|Process for the production of high-purity silicon| US20060183958A1|2003-04-01|2006-08-17|Breneman William C|Process for the treatment of waste metal chlorides| EP2105410B1|2008-03-24|2014-03-12|Mitsubishi Materials Corporation|Chlorosilanes purifying apparatus and chlorosilanes purifying method| US7736614B2|2008-04-07|2010-06-15|Lord Ltd., Lp|Process for removing aluminum and other metal chlorides from chlorosilanes| DE102008001577A1|2008-05-06|2009-11-12|Wacker Chemie Ag|Process for the hydrolysis of solid metal salts with aqueous salt solutions| DE102008042936A1|2008-10-17|2010-04-22|Wacker Chemie Ag|Process for removing titanium from hexachlorodisilane| DE102009020143A1|2009-05-04|2010-11-11|Pv Silicon Forschungs- Und Produktionsgesellschaft Mbh|Process for the treatment of saw waste for the recovery of silicon for the production of solar silicon| EP2530052A1|2011-06-01|2012-12-05|HEI Eco Technology|Method for producing silicon tetrachloride and method for producing solar silicon| DE102012103755A1|2012-04-27|2013-10-31|Centrotherm Sitec Gmbh|Synthesizing trichlorosilane, comprises converting metallic silicon and hydrogen chloride in reactor using aluminum as a catalyst, recycling aluminum chloride in the reactor leaked out from reactor, and reusing recycled aluminum chloride| DE102012103756A1|2012-04-27|2013-10-31|Centrotherm Sitec Gmbh|Lowering the temperature prevailing in a reaction zone of a trichlorosilane-synthesis reactor, comprises introducing a liquid chlorosilane into the reaction zone| JP2016521241A|2013-04-19|2016-07-21|アールイーシー シリコン インコーポレイテッド|Method for reducing corrosion and fouling in hydrochlorosilane production|
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申请号 | 申请日 | 专利标题 DE19712161641|DE2161641C3|1971-12-11|1971-12-11|Process for the production of iron-, aluminum- and titanium-free chlorosilane in the chlorination or hydroboration of ferro-silicon| 相关专利
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