• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    An arrangement and photometer for measuring and controlling the thickness of optically active thin layers wherein the axis of the measurement light beam coming from the measurement light source is directed to the measurement object and a referenced light receiver, independent of the optical properties of the measurement object, is associated with the measurement light beam. The output signal of the referenced light receiver is mixed with a trigger stage for a phase sensitive photometer amplifier and is fed to a compensation circuit for the equilization of brightness variations in the measurement light source.
    公开号:SU845804A3
    申请号:SU772501304
    申请日:1977-06-21
    公开日:1981-07-07
    发明作者:Швиккер Хорст；Торн Гернот；Эрль Ханс-Петер
    申请人:Лейбольд-Херойс Гмбх Унд Ко.Кг (Фирма)；
    IPC主号:
    专利说明:

    The invention relates to measuring technique, namely to the design of devices for measuring the thickness of optically thin layers.
    The closest in technical essence of this invention is a device for measuring optically thin film layers, comprising a vacuum chamber having an evaporator, a device for interrupting the deposition process Yu and a sample holder and made with a translucent window, successively installed along an axis passing through the center of the window, the radiation source, the interrupting unit of the radiation and the beam splitter - 16 bodies, as well as successively placed in the measuring branch of the beam splitter, installed at an angle of 45 k a c, passing through the center, a monochromator with a control unit, a radiation detector 20 and an amplifier ij.
    A disadvantage of the known device is that the measurement results in the value / degree are affected as deviations of the source brightness.
    flax
    so the change will sense the amplifier and receiver.
    The aim of the invention is not to increase measurement accuracy.
    The goal is achieved by the fact that the device is equipped with a second radiation receiver and
    or by the key, successively installed
    y
    the driver of the reference branch of the beam splitter, the EL of the associated unit is compared
    f phase-sensitive photometric M amplifier, differentiating element, th. a null detector and a logic circuit whose output is connected to the input
    a problem for interrupting a process by triggering a Bxoflos-bound trigger
    and the output of the second receiver emitter and output - with the second input file
    Chuvstel, the vital photometric effort by the connected input with its output to the radiator, the output of which is connected
    the second input of the logic circuit and
    code-related element I connected to the suppressive element, and the output
    their amplifiers are connected to the inputs of the comparison unit.
    The radiation chopper motor is made with quartz stabilization, the radiation source is placed in a cruciform body, at the intersection of the arms of which the beam splitter is located, and the arm opposite the radiation source is connected to a vacuum chamber. The connection between the first radiation receiver and the device body is made detachable.
    IV
    FIG. 1 shows a structural diagram of the device; in fig. 2 - the described device in section.
    A device for measuring the thickness of optically thin layers contains a radiation source 1, a radiation interrupting unit 2 made in the form of a cylindrical drum with grooves driven by a quartz-stabilized engine, a splitter 3 consisting of a half-transparent mirror at an angle of 45 to the axis measuring beam, and a vacuum chamber 4 having an evaporator 5, a device for interrupting the spraying process, consisting of a barn 6 with a drive 7, a sample holder 8, a reference sample, for example glass 9, and a magazine 1 About reference glasses with a control unit (not).
    The radiation source 1, the radiation interruption unit 2 and the beam splitter 3 are installed along the axis passing through the center of the translucent window 11, which is made in the wall 12 of the vacuum chamber 4,
    In the measuring branch of the splitter 3, the monochromator 13 is placed with the control unit, implemented as a stepper motor 14 and the digital control unit 15, the radiation receiver 16 and the amplifier 17, and the amplifier of the splitter 3 also has a radiator receiver 16 and a amplifier 17 in the outgoing branch of the splitter 3 also installed a receiver and a header 17 and the amplifier 17. The outputs of the amplifiers 17 and 19 are connected to the input of the 2 O comparison unit, which can output both the difference and the ratio - the output of both amplifiers; The output of the comparator unit is connected to a photosensitive photometric pin 21, which receives a control signal from trigger 22. The output of the photosensitive photometric pin 21 is connected to the inputs of the differentiating element 23 and comparator 24. The second input of the differentiating element
    23 is connected to the ajieMeHTOM 25 encoding. A null detector 26 is connected to the output of the differentiating element 23. The null detector 26 comparator 24 is connected to the inputs of the logic circuit 27 by its outputs, and the output of the latter is connected to the input of the device, which provides the spraying interruption process.
    The radiation source 1, the radiation interruption unit 2, the beam splitter 3 and the radiation receivers 16, 18 are located in the cruciform body 28, the beam splitter 3 is installed at the intersection of the body shoulders, and the arm opposite to the radiation source 1 is connected using a clamp 29 and a cap nut 30 with a vacuum chamber 4. Between the radiation source 1 and the radiation interrupting unit 2, there is an optical diaphragm 31, which by means of adjustment screws (not shown) is movable radially relative to the housing 28. The connection between the receivers The radiation chambers 16, 18 and the housing are made with the help of pluggers 32, 33.
    The operation of the device is as follows.
    During the spraying process, the beam from source 1 passes through radiation interrupting unit 2 and enters beam splitter 3. Thanks to beam splitter 3, part of the measuring beam at an angle of 9O is deflected and hits the reference receiver 18, and part of the measuring beam passing through the beam splitter through window 11 and falls on the glass 9, located on the optical axis of the system. From the measurement object, a part of the measuring beam is reflected and deflected along the optical axis back to the beam splitter 3. From the beam splitter, the part of the measuring beam coming from the vacuum chamber also at an angle of 90 deviates to the measuring receiver
    16, the passage of this monochromator 13, by means of which the measuring receiver is sensitized for a specific wavelength
    The electrical signal from measuring cell 16 is supplied to the amplifier.
    17, and the signal, excited by the reference receiver, to the compensation amplifier 19 and parallel to this, to the trigger 22, the output signal of the comparator
    2O, which is the difference between the ratio of the output signals of the amplifiers 17, 19, goes to the phase-sensitive photometric force 1, 21, which
    receives its control signal relative to the phase value from trigger 22. The output of photometric amplifier 21 is continuous and is fed from one side to differentiating element 23, to which a digital signal from encoding element 25 is fed through the second input to change the time constant of differentiating element and on the other hand, to the comparator 24, in which the actual intensity value of the photometric amplifier 21 is compared with the analog value given through the second input performance Once
    the actual value reaches a predetermined, short-duration pulse sent to logic circuit 27, which also contains the output signals of the null detector 26. The null detector 26 at the output gives a signal when the differentiated signal at the output of the element 23 passes through the zero level. Depending on the task of sputtering, the logic circuit 27 can be implemented both in the form of AND and in the form of the OR element. Thus, if it is required that the film thickness lies between zero and 1/4 of the wavelength of the measurement light used, the clumping off follows the first zero crossing on the differentiating element 23. At the same time, the null indicator is not processed and the comparator turns off only valid and given value is consistent. However, if the shutdown at a certain film thickness occurs between any zero passes, the null indicator and comparator are activated and the logic circuit starts to work in OR mode. The consequence of this is the fact that the signal can be transmitted by transit only when the selected number of transitions through zero has been reached, after which a new agreement of the actual and specified intensity values occurs.
    Thus, the described device allows controlling the spraying process and measuring the amount of thin films with a high degree of accuracy during the long bleaching process, as well as obtaining good reproducibility to achieve results in multilayer coatings.
    权利要求:
    Claims (4)
    [1]
    The formula invented)
    A device for measuring optically thin layers containing a vacuum chamber, an evaporator, a tool for interrupting the sputtering process and a sample holder, and made with a transparent window, successively installed along an axis passing through the center of the window, radiation source, node interruption of radiation and a beam splitter, successively placed in the measuring branch of the beam splitters installed at an angle of 45 to the axis passing through the center, a monochromator with a control unit, a radiation receiver and force In order to improve the measurement accuracy, it is equipped with second radiation receivers and an amplifier sequentially installed in the reference branch of the splitter electrically connected with the comparator unit, a phase-sensitive photometric amplifier, a differentiating element, a zero detector and a logical a circuit whose output is connected with the input of the device for the deposition process by a trigger, connected with the input with the output of the second radiation receiver, and the output with the second input of the phase-sensitive photo metric amplifier associated input comparator with its output, the output of which is connected to the input of the logic circuit vtsfym and encoding element, conn; much to differentiating element, and the outputs of both amplifiers are connected to the inputs of the comparison unit.
    [2]
    2. Device POP.1, excellent and
    This is due to the fact that the radiation emission motor is made with quartz stabilization.
    [3]
    3. The device according to claim 1, distinguishes that the source is emitted {Ø is located in a cruciform body, at the intersection of the shoulders of which the beam splitter is located, and the shoulder, which is the source of radiation, now
    with vacuum chamber.
    [4]
    4. The device according to claim 3, wherein the connection between the first radiation detector and Kupoycoi is made detachable.
    Sources of information taken into consideration
    1. Accepted for Germany № 1О7992О, cl. (5O1 B 11 / O6, 1970 (schyotyp).
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    引用文献:
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    US3526460A|1967-06-27|1970-09-01|Webb James E|Optical characteristics measuring apparatus|
    FR1539538A|1967-10-05|1968-09-13|Leybold Hochvakuum Anlagen Gmb|Optical instrument for measuring the thickness of layers deposited by vacuum metallization|
    US3654109A|1968-04-25|1972-04-04|Ibm|Apparatus and method for measuring rate in flow processes|
    US3737237A|1971-11-18|1973-06-05|Nasa|Monitoring deposition of films|
    DE2220231A1|1972-04-25|1973-11-08|Serv Anstalt|PHOTOMETER FOR DIGITAL DISPLAY OF LIGHT ABSORPTION OF A MEASURING SAMPLE IN A CUVETTE|
    US3869211A|1972-06-29|1975-03-04|Canon Kk|Instrument for measuring thickness of thin film|
    US3892490A|1974-03-06|1975-07-01|Minolta Camera Kk|Monitoring system for coating a substrate|
    US4024291A|1975-06-17|1977-05-17|Leybold-Heraeus Gmbh & Co. Kg|Control of vapor deposition|JPS5653681B2|1976-02-25|1981-12-21|
    FI69370C|1981-08-18|1986-01-10|Topwave Instr Oy|FOERFARANDE FOER MAETNING AV EGENSKAPERNA HOS ETT PLASTSKIKT MED HJAELP AV INFRAROED STRAOLNING|
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    法律状态:
    优先权:
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