专利摘要:

公开号:SU1836488A3
申请号:SU904830675
申请日:1990-08-03
公开日:1993-08-23
发明作者:Lunov Tomas;Mentsel Khorst;Pettselt Peter;Vilberg Ryudiger;Vinkler Rolf
申请人:Ftd Vakuumtekhnik Drezden Gmbk;
IPC主号:
专利说明:

The invention relates to an electric arc evaporator with multiple evaporation crucibles, especially for plasma spraying of mixed or multi-layer coatings. Such an evaporator can be successfully used wherever it is necessary to spray two or more materials in parallel or in series.
The aim of the invention is to obtain high-quality mixed or multilayer plasma coatings with minimal technical and economic costs.
The object of the invention is to provide an electric arc evaporator with several crucibles, with the help of which the deposited materials can be sprayed separately or together and with a variable mixing ratio.
According to the invention, this problem is solved due to the fact that the electric arc evaporator contains a cathode and several anode evaporation crucibles, isolated from each other, each of which has a separate current lead, and all of them are placed in the area of action of a common magnetic system for controlling the arc discharge. Each current lead is connected to an adjustable current source. The evaporation crucibles are preferably located at a small distance from each other around the center of the arc discharge electron flow.
If, during operation of the evaporator, the same anode potential is supplied to all crucibles, then the arc current is also distributed approximately evenly over all crucibles, and the sprayed materials evaporate in accordance with their evaporating capacity. If only one crucible is connected to the anode potential and the other crucible is connected to a floating potential, then the arc is ignited only relative to the crucible with the anode potential and only this material is vaporized. At different potentials on separate evaporation crucibles, the electron flux is divided accordingly. It is only important that the individual crucibles are located in the area of action of the common magnetic system for controlling the arc discharge. Directly above the crucibles, the flow of electrons from the arc is exposed to potentials. Thanks to this, the compact multi-crucible evaporator allows either sequential spraying of materials or spraying of a mixture of materials in any ratio of components. The type of cathode used in the evaporator does not play a special role. It can be a hot cathode or a hollow cathode.
It is preferable to install simple masks between individual crucibles, so as not to affect the individual sprayed materials already in the crucible and, thus, does not introduce impurities into them. However, such masks should not impede the flow of electrons from the cathode to the anode crucibles. Depending on the area of use of the evaporator, the crucibles can be of the same design or be specially designed for a specific material. For example, one crucible may have a regular shape and another boat shape, possibly with a device for feeding the material. In this case, such a device must be completely insulated so that the arc does not connect to it.
The operation of the evaporator takes place in a known manner. The evaporation process can be controlled, for example, by flow rate or time. However, if necessary, it is possible to use local adjustment by means of measuring instruments for each individual sprayed component. A reaction medium such as N2, Cx or Og is also useful.
The invention is further illustrated by two examples. The attached drawings show:
Fig. 1 shows a two-rod evaporator according to example 1;
Fig. 2 shows an evaporator with a material supply device according to example 2.
Example!. A two-rod evaporator is described. Figure 1 shows a compact design of an evaporating crucible 1 without a lining and a crucible 2 with a graphite insert 3. Crucibles 1 and 2 are insulated with a ceramic insulator 4 from each other and are installed together as a block. This anode unit includes a general magnetic system, consisting of a coil 5 and two side magnetic plates 6, which create a longitudinal magnetic field above both crucibles 1, 2. A hollow cathode 7 is placed on the side and structurally separate from the anode unit 7. When an arc discharge is ignited in a known manner, the flow electrons fall into the area of influence of the magnetic field and is deflected by it towards crucible 1 and / or 2. Another means of directing and deflecting the electron flux is a common mask 8, isolated above crucibles 1 and 2. Due to its floating potential, mask 8 focuses the electron flux through the holes directly onto the material to be sprayed in crucibles 1 or 2. This prevents the formation of an electron flow relative to other anode parts (not crucibles). The mask 8 includes a vertical diaphragm 9, the purpose of which is to prevent separate streams of the sprayed material from entering another crucible and creating unwanted deposits.
The supply of potential to the anode crucibles 1 and 2 occurs separately along lines 11 and 12. The drawing does not show the supply of cooling water. The following describes the use of this evaporator to make a 5: 1 titanium / copper mixed coating used on the surface of wear-resistant electrical contacts.
In the receivers, the argon pressure is regulated in a known manner to a value not exceeding L10 ~ 3 Pa. Then an electric arc is ignited in the hollow cathode 7, and the crucible 1 with titanium serves as the anode. After a short-term stabilization of the discharge, the anode current in crucible 2 is set at 50 A. Due to this, the evaporation rate of titanium is 0.5 g / min and copper is 0.1 g / min. The sprayed TIC layer has plasma strength, density, good conductivity and high uniformity. Its production using the proposed multi-crucible evaporator is very economical and easy to control.
By changing the anode currents on the crucibles, it is possible to change the mixture ratio in the layer practically from 100: 0 to 0: 100. With the constant or temporary presence of reagent gases, the variety of types of coatings obtained can be significantly increased.
Example 2. The proposed evaporator with a constant supply of the evaporated material is described. This evaporator is especially suited for the production of coatings from mixtures with aluminum, since aluminum is comparatively difficult to vaporize by means of the known arc discharge.
In this evaporator, a hot cathode 13 is used as a cathode. The general magnetic system consists of coils 14 and 15, both sources of evaporation are combined into a block, as in Fig. 1, crucible 1 serves to evaporate titanium, and a boat 16 of titanium boride combined with it serves for the evaporation of aluminum. Aluminum is supplied by means of tool 17. As an example, a Ti x Al y N z coating was prepared as a protective layer for a cutting tool. The process began as in example 1. Then crucible 1 was installed under an anode current of 350 A, and boat 16 - under an anode current of 40 A. The evaporation rate was: for titanium 0.5 g / min, and for aluminum 0.2 r / min. The ratio of the rates of evaporation can in this case be regulated by the corresponding anode currents, and also (within certain limits) by means of the feed rate of the aluminum wire. The nitrogen partial pressure is set at 1 Ί0 -1 Pa. thirty
If necessary, it is possible to change the ratio of the mixture, that is, to deposit directly on the substrate.
First a layer of pure titanium, then a TIN layer with a gradient, and only then, again with a gradient, a Tl x Al y N z layer.
Both examples clearly show the versatility of the use of the evaporator with the advantage that no new costs are required each time.
The examples show two crucibles or boats. It is obvious, however, that three or four crucibles can be used, although this raises the question of whether there is a practical need to apply this amount of substances simultaneously.
权利要求:
Claims (3)
[1]
1. Electric arc evaporator for multilayer and mixed coatings, containing a cathode, several evaporation crucibles and a power supply,
20 different themes. that, in order to expand technological capabilities, the evaporation crucibles are isolated from one another and equipped with a magnetic system and current leads connected to regulated power supplies, and the crucibles are placed between the pole pieces of the magnetic system.
[2]
2. The evaporator according to claim 1, which is characterized by the fact that one or more crucibles are equipped with a system for feeding the evaporated material.
[3]
3. The evaporator according to claims 1 and 2, which is heated by the fact that the crucibles are equipped with masks.
类似技术:
公开号 | 公开日 | 专利标题
US4197175A|1980-04-08|Method and apparatus for evaporating materials in a vacuum coating plant
US4992153A|1991-02-12|Sputter-CVD process for at least partially coating a workpiece
JP3348865B2|2002-11-20|Method for forming diamond layer, apparatus therefor, and method for adjusting temperature of holder
US3791852A|1974-02-12|High rate deposition of carbides by activated reactive evaporation
SU1836488A3|1993-08-23|Electrical arc evaporator to apply multilayer and mixed coatings
US4951604A|1990-08-28|System and method for vacuum deposition of thin films
WO2008145459A1|2008-12-04|Vacuum treatment unit and vacuum treatment process
EP0975818B1|2002-09-25|Method and device for pvd coating
US6110540A|2000-08-29|Plasma apparatus and method
DE4200429A1|1993-07-15|METHOD FOR IONIZING THERMALLY PRODUCED MATERIAL STEAMS AND DEVICE FOR IMPLEMENTING THE METHOD
EP0566606B1|1995-05-31|Device and process for the vaporisation of material
US5302271A|1994-04-12|Anodic vacuum arc deposition system
US3883679A|1975-05-13|Vapor source assembly
US6302056B1|2001-10-16|Device for coating substrates with a material vapor in negative pressure or vacuum
JPH08199346A|1996-08-06|Arc vaporization source
DE19724996C1|1998-09-03|Plasma-activated electron beam vapour deposition
KR930002442B1|1993-03-30|Method for making an aluminium coating by arc-discharge induction ion-plating
RU2676720C1|2019-01-10|Method of vacuum ion-plasma low-temperature deposition of noncrystalline coating from aluminum oxide
JPH02305963A|1990-12-19|Material evaporation rate detector and material evaporation rate controller for ion plating device
JP2006045632A|2006-02-16|Vapor deposition apparatus
RU2051987C1|1996-01-10|Installation for applying coatings in plasma of gas discharge
JPH0762241B2|1995-07-05|Ion plating device
JPH0693433A|1994-04-05|Arc ion plating device
JPS61119669A|1986-06-06|Ion plating apparatus
JPS63282257A|1988-11-18|Ion plating device
同族专利:
公开号 | 公开日
DE59009139D1|1995-06-29|
DD286375A5|1991-01-24|
JPH0372067A|1991-03-27|
EP0438627A1|1991-07-31|
EP0438627B1|1995-05-24|
引用文献:
公开号 | 申请日 | 公开日 | 申请人 | 专利标题
RU2489515C1|2012-02-13|2013-08-10|Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Сибирский государственный индустриальный университет"|METHOD FOR ELECTROEXPLOSIVE SPUTTERING OF COMPOSITE COATINGS OF TiB2-Cu SYSTEM ONTO COPPER CONTACT SURFACES|
RU2703751C2|2014-09-18|2019-10-22|ТюссенКрупп Стил Еуроп АГ|Device for forming coatings on surfaces of element, band material or tool|DD219354A1|1983-07-20|1985-02-27|Hochvakuum Dresden Veb|METHOD FOR REGULATING THE PLASMAPARAMETERS IN VACUUM COATING DEVICES WITH ARC DISCHARGES|
DD232513A1|1984-07-19|1986-01-29|Hochvakuum Dresden Veb|EVAPORATOR FOR PLASMA-SUPPORTED VACUUM COATING PROCESS|
DE3801957A1|1987-04-23|1988-11-10|Hochvakuum Dresden Veb|Method and device for evaporation by means of arc discharge evaporator|
DD263423A3|1987-04-23|1989-01-04|Hochvakuum Dresden Veb|METHOD FOR THE PLASMA-ASSISTED DEPOSITION OF MIXED OR MULTILAYERS|
DD274747A3|1987-04-23|1990-01-03|Hochvakuum Dresden Veb|POSITIONING DEVICE FOR BOW DISCHARGE EVAPORATOR|US5222468A|1991-04-25|1993-06-29|Mitsubishi Denki Kabushiki Kaisha|Anti-theft ignition control apparatus|
US6130604A|1996-04-30|2000-10-10|Toyota Joshida Kabushiki Kaisha|Anti-theft system for vehicles|
US6223683B1|1997-03-14|2001-05-01|The Coca-Cola Company|Hollow plastic containers with an external very thin coating of low permeability to gases and vapors through plasma-assisted deposition of inorganic substances and method and system for making the coating|
US6251233B1|1998-08-03|2001-06-26|The Coca-Cola Company|Plasma-enhanced vacuum vapor deposition system including systems for evaporation of a solid, producing an electric arc discharge and measuring ionization and evaporation|
US6720052B1|2000-08-24|2004-04-13|The Coca-Cola Company|Multilayer polymeric/inorganic oxide structure with top coat for enhanced gas or vapor barrier and method for making same|
US6740378B1|2000-08-24|2004-05-25|The Coca-Cola Company|Multilayer polymeric/zero valent material structure for enhanced gas or vapor barrier and uv barrier and method for making same|
US6599584B2|2001-04-27|2003-07-29|The Coca-Cola Company|Barrier coated plastic containers and coating methods therefor|
WO2003089503A1|2002-04-15|2003-10-30|The Coca-Cola Company|Coating composition containing an epoxide additive and structures coated therewith|
法律状态:
优先权:
申请号 | 申请日 | 专利标题
DD89331495A|DD286375A5|1989-08-04|1989-08-04|ARC DISCHARGE EVAPORATOR WITH SEVERAL EVAPORATOR TILES|
[返回顶部]