专利摘要:
A SHADOW COLOR MASK TO OSPE, containing slotted holes located in columns separated by strips of equal thickness and bridges, is characterized in that, in order to increase the transparency of the mask, the thickness of the bridges is reduced at the junction with the strips in such a way that the cross-section of the jumper is constant along its length, and the ratio of the length of the jumper to the length of its part, whose thickness is equal to the thickness of the strip, is chosen from the expression 0.38, 4, where b is the length of the jumper; C - the length of the jumper, whose thickness is equal to the thickness of the strip.
公开号:SU1176859A3
申请号:SU803217962
申请日:1980-12-17
公开日:1985-08-30
发明作者:Эддисон Нолан Ричард
申请人:Рка Корпорейшн (Фирма);
IPC主号:
专利说明:

11 The invention relates to television equipment, in particular to color picture tubes with shadow masks. As a rule, color kinescopes with shadow masks include a screen of phosphor lines or chutes that glow in red, green, and blue, electronic projectors designed to excite screen colors, and a shadow mask located between the projectors and the screen. The well-known shadow mask is a thin metal sheet with a multitude of holes, the number of which is equal to the number of screen triad phosphors p J. The disadvantage of such masks is their low transparency. A known shadow mask is a color kinescope containing slotted holes located in columns separated by strips of equal thickness and L2J jumpers. However, such a mask characterizes with an insufficiently high coefficient of transparency. In a known mask, the vertical slit openings are interrupted by a plurality of bridges or jumpers spaced apart at appropriate distances, providing mechanical rigidity. The presence of such bridges reduces the transmission of electron beams and thereby degrades the brightness of the phosphors. The aim of the invention is to increase the transparency of the mask. This goal is achieved by the fact that the shadow mask of a color kinescope containing slotted holes located in columns separated by strips of equal thickness and re-reduced at the junction with the strips in such a way that the cross-sectional area of the jumpers is constant along its length, and the ratio of the jumper length to its length the part whose thickness is equal to the thickness of the strip is chosen from the expression
0.38i 0.4,
D
1de b - jumper length;
c is the length of a part of the strip, whose thickness is equal to the thickness of the strip.
FIG. 1 shows a shadow mask; in fig. 2 and 3 are rasters of a photo in Fig. Figures 2 and 3 show rasters 8 and 9 of photomasks used to create holes in mask 1, respectively. The shaded areas of each raster are the places where the etching is carried out. Presented in FIG. 2 raster B from the side of the electronic searchlight consists of columns of strokes 10 in place of holes, raster 9 on the side of the screen consists of strips 11 with light horizontal sections 12 in places of jumper islands.
The advantage of mask 1 in comparison with the known for obtaining domes used for etching, located on opposite sides of the shadow mask of hole patterns; from the side of electronic projectors and from the screen, respectively; in fig. 4 - shadow mask, Bi-m in front; in fig. 5 shows a section A-A in FIG. 4; in fig. 6 is a section BB in FIG. four; in fig. 7 shows section B-B in FIG. 4. Mask 1 contains columns of openings 2. Holes 2 of each column are separated by bridges 3. In mask 1 there are areas with full thickness and areas of reduced thickness. The full thickness sections consist of strips 4 between the columns of the holes and the islands 5 at the jumpers 3. The strips 4 and the islands 5 are separated by sections 6 of reduced thickness. Presented in FIG. 1, the mask surface faces the kinescope screen (the opposite surface faces the electron projector). When the mask has a dome-shaped (e.g., spherical or biradial) or cylindrical shape, the strips 4 and islands 5 are located in a curved contour and are the parts of the mask closest to the screen 1. From the side of the screen, it can be seen that most of the jumpers 3 contain islands located in depressions extending along the length of the column openings. Thanks to this design, all three electron beams 7 pass through the mask and do not collide with the jumpers. As a result, the transmittance of the mask increases, and since the maximum thickness is maintained directly between the cavities of the holes, the strength of the mask does not deteriorate.
Noah shape is seen when comparing the cross section of the jumpers (Fig. 4-7).
Cross sections, bridges 3, made in different places, are different in shape, but the area of all cross sections is the same. On jumper 3 there are no relatively weak points that can burst when the mask is 1 domed in shape. This advantage allows a certain reduction in the width of the web, measured in the longitudinal direction of the column of holes, which improves the transmission of the mask without compromising the mechanical strength required to form the mask and subsequent processing.
Below are the measurements made in the center of the experimental shadow mask with a diagonal of 48, 26 mm, mm:
Axle spacing
column lines0.902
Hole length 0.716
Intercenter distance
vertical holes 0,813
The vertical spacing between the holes (the vertical size of the lintel) is 0.097 The width of the hole (in Fig. 4, a) is 0.169 The width of the depression (Fig. 4, b). 0.453 The width of the jumper island (Fig. 4, c) 0.179 The width of the jumper island (Fig. 4, d) 0.060 The thickness of the jumper section with a reduced thickness (Fig. 5, e) 0.051 The thickness of the mask and islands (Fig. 6, f) 0.152 From Given the geometrical parameters of the mask, it is clear that the ratio of the length of the intermixture, the thickness of which is equal to the strip thickness, to its total length b is 0, 39. With this ratio of c / b in the mask, the transmission of the electronic component improves without deteriorating the mechanical strength of the mask. With, 38, the strength of the mask decreases, and with, 4, the transmission of electron beams hardly improves.
II
one
2
in-in
d-5
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e;
权利要求:
Claims (1)
[1]
THE SHADOW MASK OF THE COLORFUL KINSKIN is equal to the thickness <1 о QO СП с
类似技术:
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同族专利:
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DD155465A5|1982-06-09|
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IT8026095D0|1980-11-19|
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引用文献:
公开号 | 申请日 | 公开日 | 申请人 | 专利标题

JPS513733Y2|1972-01-19|1976-02-03|
JPS519264B2|1972-05-30|1976-03-25|
US3973965A|1972-05-30|1976-08-10|Tokyo Shibaura Electric Co., Ltd.|Making shadow mask with slit-shaped apertures for CRT|
US3923566A|1972-06-21|1975-12-02|Rca Corp|Method of fabricating an apertured mask for a cathode-ray tube|
US3944867A|1974-03-15|1976-03-16|Zenith Radio Corporation|Shadow mask having ribs bounding rectangular apertures|
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JPS5310961A|1976-07-19|1978-01-31|Hitachi Ltd|Color picture tube|
JPS6349336B2|1976-12-20|1988-10-04|Tokyo Shibaura Electric Co|
JPS5390755A|1977-01-21|1978-08-09|Toshiba Corp|Shadow mask|
US4131822A|1977-05-20|1978-12-26|Rca Corporation|Cathode ray tube with stress-relieved slot-aperture shadow mask|JPH0136223B2|1981-02-25|1989-07-28|Tokyo Shibaura Electric Co|
JPH0437537B2|1982-01-27|1992-06-19|Tokyo Shibaura Electric Co|
JPS60122037U|1984-01-26|1985-08-17|
JPH041394Y2|1984-05-14|1992-01-17|
SU1461377A3|1984-05-25|1989-02-23|Рка Корпорейшн |Colour kinescope|
JPH0434262Y2|1987-10-01|1992-08-14|
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US6072270A|1998-06-22|2000-06-06|Chunghwa Picture Tubes, Inc.|Shadow mask for color CRT|
KR100388903B1|1999-12-10|2003-06-25|삼성에스디아이 주식회사|Shadow mask frame assembly for the flat CRT|
KR100683647B1|2000-04-21|2007-02-15|삼성에스디아이 주식회사|Tension mask frame assembly of the color picture tube|
AU2002359547A1|2001-11-30|2003-06-17|Bmc Industries, Inc.|Tie bars only on the grade side of aperture masks|
US20030143469A1|2001-11-30|2003-07-31|Sage Thomas R.|Grade tie bar onlyand graded grade tie bar onlyaperture masks|
法律状态:
优先权:
申请号 | 申请日 | 专利标题
US06/104,823|US4300069A|1979-12-18|1979-12-18|Color picture tube having improved slit type shadow mask and method of making same|
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