• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    The present invention relates to a method for removing unreacted gas of a TMAC synthesis reaction and a TMAC reactor at this time, and to remove N 2 at a lower pressure of the TMAC reactor through a circular spray nozzle in a manner of removing unreacted gas during a TMAC synthesis reaction. By spraying evenly, it is possible to drastically reduce the degassing time portion of the overall batch time required for the TMAC synthesis reaction, thereby maximizing the degassing efficiency of the remaining gas by increasing the overall contact efficiency and fast synergistic action. The present invention aims to provide an unreacted gas removal method and a TMAC reactor for the TMAC synthesis reaction, which can ultimately improve the productivity by reducing the batch time.
    公开号:KR20040061084A
    申请号:KR1020020086864
    申请日:2002-12-30
    公开日:2004-07-07
    发明作者:박정수；박덕환
    申请人:삼성정밀화학 주식회사；
    IPC主号:
    专利说明:

    Method for removing residual gas of TMAC synthetic reaction and TMAC reactor at this time
    [7] The present invention relates to a method for removing unreacted gas of a TMAC synthesis reaction and a TMAC reactor at this time, and more particularly, when an unreacted gas is removed after preparing a TMAC solution by adding MC gas to a TMA solution, By applying the method of evenly spraying N 2 with strong pressure through the circular spray nozzle at the bottom, it is possible to maximize the degassing efficiency of the remaining gas by increasing the overall contact efficiency and speeding up synergy. It relates to a reaction gas removal method and a TMAC reactor.
    [8] In general, the synthesis reaction of tetramethylammonium chloride (TMAC) is a reaction of preparing 51% of TMAC solution by adding Methylchloride (MC) gas to 36% of Trimethylamine (TMA) solution in a TMAC reactor. to be.
    [9] At this time, the unreacted gas remaining in the TMAC reactor is removed by adding N 2 while stirring the solution.
    [10] For this purpose, FIG. 1 presents a means for stirring the solution and injecting N 2 .
    [11] As shown in FIG. 1, inside the TMAC reactor 10, an N 2 injection pipe 20 having a plurality of holes and a stirrer 30 for stirring the solution are disposed and degassed by the action thereof. The gas is removed through the bantrain 40.
    [12] However, the method of removing the unreacted gas by auxiliary N 2 while stirring the solution as described above has a disadvantage in that the overall production yield associated with the TMAC synthesis reaction decreases as the batch time increases due to the decrease in reaction efficiency. .
    [13] For example, in the existing TMAC synthesis reaction, the total batch time is 6 Hr / Batch and the degassing time is 15 Hr / Batch, which takes a total of 21 Hr / Batch. In terms of inefficiency.
    [14] Therefore, the present invention has been devised in view of the above, and applies a method of evenly spraying N 2 with a strong pressure through a circular spray nozzle at the bottom of the TMAC reactor by removing unreacted gas during TMAC synthesis reaction. By greatly reducing the proportion of degassing time in the overall batching time required for TMAC synthesis reaction, it is possible to maximize the degassing efficiency of remaining gas by increasing the overall contact efficiency and fast synergy. It is an object of the present invention to provide a method for removing unreacted gas in a TMAC synthesis reaction and a TMAC reactor used for the method, in which the productivity can be improved by shortening the time.
    [15] The present invention for achieving the above object is characterized in that in the method for removing the unreacted gas of the TMAC synthesis reaction, the method of injecting N 2 with a strong pressure through the spray nozzle on the side and bottom of the TMAC reactor.
    [16] In addition, the spray nozzle is characterized in that the N 2 is evenly sprayed from the entire lower area by applying a circular type arranged in a balanced way along the lower circumference of the TMAC reactor.
    [17] In addition, it is characterized in that to control the injection pressure of N 2 by adjusting the hole size or number of the spray nozzle.
    [18] On the other hand, TMAC reactor for achieving the above object is a TMAC reactor comprising a solution circulation means and N 2 supply means, wherein the N 2 supply means is made of a circular type disposed in a balanced along the lower periphery inside the TMAC reactor Characterized in that the structure made to be evenly sprayed N 2 to the total area of the side and bottom of the TMAC reactor.
    [1] 1 is a schematic view showing an embodiment of a conventional method for removing unreacted gas during TMAC synthesis reaction
    [2] Figure 2 is a schematic diagram showing an embodiment of the method for removing the unreacted gas of the present invention during the TMAC synthesis reaction
    [3] <Explanation of symbols for main parts of drawing>
    [4] 10: TMAC reactor 20: N 2 injection pipe
    [5] 30: Stirrer 40: Ban Line
    [6] 50: spray nozzle
    [19] Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.
    [20] As shown in FIG. 2, the present invention has the characteristics of maximizing the degassing efficiency by employing a method in which a circular spray nozzle means is applied to remove the existing stirring method for efficient removal of TMAC synthesis reaction and unreacted residual gas. .
    [21] To this end, after completing the synthesis process to prepare the TMAC solution 51% by adding MC gas to the TMA solution 36% in the TMAC reactor during the TMAC synthesis reaction, a circular spray nozzle 50 at the bottom of the TMAC reactor 10 By evenly spraying N 2 with a strong pressure through, the degassing efficiency can be increased as much as possible according to the increase of the overall contact efficiency and the rapid synergistic effect.
    [22] In this case, the spray nozzle may adjust the size or number of the holes, and thus the N 2 injection pressure may be varied by adjusting the size and number of holes.
    [23] In the TMAC synthesis reaction of the present invention applying the above degassing reaction method, the total batch time is 6Hr / Batch, degassing time is 6Hr / Batch, which takes a total of 12Hr / Batch, resulting in 0.291T / Hr. It can increase about 1.76 times compared to the production of 0.166T / Hr.
    [24] Therefore, in the method of removing the unreacted gas according to the present invention, degassing can be smoothly progressed to the banline under the influence of N2 which is injected from the side and the bottom of the unreacted gas. It can be.
    [25] On the other hand, the present invention provides a TMAC reactor excluding the existing stirrer and introduced a new stirring concept.
    [26] For this purpose, by the TMAC reactor in TMAC reactor, the feed means of the N 2 comprises a rotation means and a supply means of N 2 in the solution is constituted by a circular type that is arranged to balance along the lower periphery in the interior of the TMAC reactor, N 2 can be evenly sprayed on the total area of the side and bottom of the TMAC reactor, thereby increasing the degassing efficiency according to the increase in the contact efficiency.
    [27] As described above, the present invention provides a method for removing unreacted gas of the TMAC synthesis reaction, including a method of evenly injecting N 2 with a strong pressure through a circular spray nozzle at the bottom of the TMAC reactor during the TMAC synthesis reaction. Degassing time can be significantly reduced in the overall batch time required for the reaction.Therefore, there is an effect of maximizing the degassing efficiency of the remaining gas by increasing the overall contact efficiency and the rapid synergistic effect. There is an advantage that the productivity can be improved by reducing the batch time.
    权利要求:
    Claims (4)
    [1" claim-type="Currently amended] In the method of removing unreacted gas of TMAC synthesis reaction,
    Method of removing the unreacted gas of the TMAC synthesis reaction comprising the method of spraying N 2 at a strong pressure through the spray nozzle on the side and bottom of the TMAC reactor.
    [2" claim-type="Currently amended] The unreacted gas of TMAC synthesis reaction according to claim 1, wherein the spray nozzle is applied with a circular type that is well-balanced along the lower circumference of the TMAC reactor so that N 2 can be evenly sprayed from the lower total area. How to remove.
    [3" claim-type="Currently amended] 3. The method of claim 1 or 2, wherein the injection pressure of N 2 is adjusted by adjusting the size or number of holes of the spray nozzle.
    [4" claim-type="Currently amended] In the TMAC reactor comprising a solution circulation means and N 2 supply means,
    The N 2 supply means is composed of a circular type spray nozzle 50 is arranged in the TMAC reactor along the lower circumference in a balanced manner so as to evenly spray N 2 to the side and lower total area of the TMAC reactor. TMAC reactor, characterized in that.
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    同族专利:
    公开号 | 公开日
    引用文献:
    公开号 | 申请日 | 公开日 | 申请人 | 专利标题
    法律状态:
    2002-12-30|Application filed by 삼성정밀화학 주식회사
    2002-12-30|Priority to KR1020020086864A
    2004-07-07|Publication of KR20040061084A
    优先权:
    申请号 | 申请日 | 专利标题
    KR1020020086864A|KR20040061084A|2002-12-30|2002-12-30|Method for removing residual gas of TMAC synthetic reaction and TMAC reactor|
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