Temperature control apparatus of heat-block for semiconductor equipment

专利摘要:
PURPOSE: A temperature control apparatus of the heat block for a semiconductor device is provided to be capable of adequately controlling the temperature of the heat block for stably carrying out a cleaning process at a window. CONSTITUTION: A temperature control apparatus of the heat block for a semiconductor device is provided with a heater for being heated by a power supply, a heat block(10) connected to the heater for being heated by the heat transmitted from the heater, and a switching terminal part(40) for switching the supply voltage applied to the heater. The switching terminal part includes a bimetal(41) made of two metal parts having a different thermal expansivity, a connection terminal(42) for contacting each end portion of the bimetal, and a supporting part(43) protruded from the heat block as one piece for stably loading one end of the bimetal.
公开号:KR20040003335A
申请号:KR1020020038002
申请日:2002-07-02
公开日:2004-01-13
发明作者:강상우
申请人:삼성전자주식회사；
IPC主号:

专利说明:

Temperature control apparatus of heat block for semiconductor equipment {Temperature control apparatus of heat-block for semiconductor equipment}
[10] The present invention relates to a temperature control device for a heat block for semiconductor equipment, and more particularly, damage to the detector due to excessive temperature rise of the heat block, so that the power supply applied to the heater is interrupted according to the temperature state of the heat block. The temperature control apparatus of the heat block for semiconductor installations which prevents fall is prevented.
[11] In general, a facility for manufacturing a semiconductor is provided with a very large number of processes, a specific process atmosphere is required to perform such a process, the configuration provided for the process is called a process chamber.
[12] Process chambers require a specific process atmosphere to be established depending on the process to be performed, usually allowing the process to be carried out at high temperature conditions. Also, in most cases, the process is performed under a specific pressure condition of high pressure or low pressure rather than under normal pressure. The formation of such a specific process atmosphere requires a high degree of air tightness, which is strictly isolated from the outside.
[13] On the other hand, a thorough isolation from the outside requires a means for easily understanding the internal condition of the process chamber. That is, if the process performance situation occurring inside the process chamber is not known at all from outside, there is a problem that causes a serious work error and a large amount of product defects because an immediate response cannot be made when a process error occurs. A configuration that is provided such that the internal situation of the process chamber can be easily seen from the outside is a transparent window made of a transparent quartz material.
[14] However, the see-through window is confined by a large amount of polymers generated during the process inside the process chamber and thus becomes ineffective. That is, as the process is performed, a large amount of polymers are generated inside the process chamber, and these polymers are adsorbed by the viewing window so that the inside of the viewing window cannot function properly. Therefore, in order to prevent contamination of the see-through window by the polymers, the heat block is provided to be attached to the see-through window so that the adsorption of the polymer is prevented.
[15] The heat block is usually made of an aluminum material having high thermal conductivity, and is attached to one side of the viewing window to heat the viewing window to a predetermined temperature to prevent polymer adsorption onto the viewing window.
[16] FIG. 1 is a schematic structural diagram illustrating a heating structure for heating a viewing window in a general process chamber, in which a heat block 10 is heated in a heat block 10 attached to a viewing window (not shown). Is connected, and the driving of the heater 20 is controlled by the applied power.
[17] In order to control the temperature of the heat block 10, a current change of the temperature detected by the temperature sensor is selected by mounting an appropriate capacity of the heater 20 generating a heat source or by attaching a separate temperature sensor to the heat block 10. As a result, the power applied to the heater 20 is interrupted to control the temperature of the heat block 10.
[18] However, the temperature control by mounting the temperature sensor is expensive and the application is insufficient in reality, on the other hand, there is a problem that the optimum temperature control is difficult in the method of using the heater 20 of the appropriate capacity.
[19] Therefore, the heat block 10 is frequently overheated more than necessary during operation, especially the heat block 10 of the etch facility, the detector 30 for performing the end point detection (EPD) function to detect the stop of the etching to one side usually ) Is connected, but the overheating of the heat block 10 causes overheating of the detector 30, which causes a serious problem that causes the detector 30 to be damaged or to malfunction, such as loss of function. Sometimes.
[20] Therefore, the present invention has been invented to solve the above-mentioned problems of the prior art, and a main object of the present invention is to provide a stable cleaning of the viewing window by allowing an excessive temperature rise of the heat block to be properly controlled by a simple structure improvement in an already used equipment. Is to make this happen.
[21] In addition, the present invention has another object to ensure that the maintenance and management of the stable equipment is made by preventing the damage or deterioration of the detector by appropriate control of the heating temperature by the heater.
[1] 1 is a perspective view showing a structure for heating a conventional see-through window,
[2] Figure 2 is a side cross-sectional view showing the main portion configuration according to the present invention,
[3] Figure 3 is a side cross-sectional view showing a configuration in which the main configuration of the present invention is protected by a cover,
[4] Figure 4 is an operating state diagram showing a state in which the bimetal bent deformation of the present invention.
[5] Explanation of symbols on the main parts of the drawings
[6] 10: heat block 20: heater
[7] 30: detector 40: switching terminal portion
[8] 41: bimetal 42: connection terminal
[9] 43: support
[22] In order to achieve the above object, the present invention provides a heater that is heated by an applied power source, a heat block connected to the heater and heated by heat transferred from the heater, and a switching terminal unit for intermittently controlling the power applied to the heater, The switching terminal portion has a bimetal laminated with two metal members having different thermal expansion coefficients, a connection terminal respectively contacting surfaces corresponding to each other at both ends of the bimetal, and one end of the bimetal being integrally protruded from the heat block. It is provided as a support to be seated.
[23] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.
[24] In the configuration of the present invention, the same reference numerals apply to the same configuration as before.
[25] As shown in FIG. 2, the present invention is configured as a heat block 10, a heater 20, and a switching terminal unit 40.
[26] The heat block 10 is made of an aluminum material having high thermal conductivity as in the past, and one side of the heat block 10 is in close contact with the viewing window of the process chamber to heat the viewing window.
[27] The heater 20, which is a heating means, is coupled to the heat block 10, and the heater 20 is a heat source that is heated by electrical resistance, and is connected to the heat block 10 to heat the heat block 10.
[28] The switching terminal portion 40 is to interrupt the application of an electrical signal to the heater 20 that controls the heating of the heat block 10. This switching terminal portion 40 is formed again as a bimetal 41, a connecting terminal 42, and a support 43.
[29] The bimetal 41 has a structure in which two metal members having different thermal expansion coefficients overlap each other. One end is fixed, and the other end is provided with two metal members laminated so that bending deformation is possible. By this, the end that is not fixed is to bend deformation. It is most important that the bimetal 41 has a pair of metal members in consideration of the coefficient of thermal expansion so that deformation at a desired heater temperature is possible.
[30] In addition, the connection terminals 42 are contacts provided at both ends of the bimetal 41 to be in contact with the surfaces corresponding to each other. The connection terminal 42 on one side is connected to the fixed end of the bimetal 41, and the other side is connected. The terminal 42 has a structure in which an end portion corresponding to the fixed end is provided such that the connection is interrupted. In other words, before the bimetal 31 is thermally deformed, the bimetal 31 remains connected to the end of the bimetal 41. When the bimetal 41 is bent due to thermal deformation, the other connection terminal 42 is bimetal 31. The end of the short circuit and the power supply to the heater 20 is to be disconnected.
[31] On the other hand, the support 43 is configured to fix one end of the bimetal 41 so as not to be deformed, and is formed to protrude integrally from one side of the heat block 10. That is, the molding of the heat block 10 is made at the same time as the same material so that the heating state of the heat block 10 can be transferred as it is.
[32] In particular, the switching terminal unit 40 integrally provided in the heat block 10 is protected from the outside by the cover 50 as shown in FIG. 3, and the cover 50 can be replaced by the heat block 10. To be combined.
[33] The operation by the present invention configured as described above will be described in more detail.
[34] The present invention, as described above, is to prevent the deposition of foreign matter on the viewing window provided to know the situation inside the process chamber. Foreign substances adsorbed on the sight glass are mostly polymers generated during the process in the process chamber. If these polymers are left as they are, they deposit on the see-through window so that they will solidify.
[35] Accordingly, the most prominent feature of the present invention is to improve the heating temperature of the heat block, which is a means for heating the viewing window, by forcibly heating the viewing window to remove the polymer.
[36] To this end, the present invention is provided with a switching terminal 40 for intermittent power supply to the heater 20 according to the heating temperature of the heat block 10 to prevent overheating of the heat block 10. That is, the connection is interrupted by the bending deformation of the bimetal 41 between the pair of connection terminals 42 where the electric wire connected to the heater 20 passes through one side of the heat block 10 and is disconnected. As shown in FIG. 2, the bimetal 41 and the pair of connection terminals 42 are connected to the heater 20 while the heating temperature of the heat block 10 is appropriate or before the power is applied to the heater 20. The power supply to the furnace is always possible, or the power supply is stably applied.
[37] When power is applied to the heater 20, the heat block 10 starts to be heated, and the heat in the heat block 10 is transferred to the bimetal 41 through the support 43, and is transmitted to the bimetal 41. When the temperature is lower than the set temperature, the pair of connection terminals 42 are connected to each other by the bimetal 41 and continuously supply power to the heater 20.
[38] When the heating temperature in the heat block 10 during this operation exceeds an appropriate level, the other end of the bimetal 41 having one end attached to the support 43 is fixed on the one end fixed to the support 43 as shown in FIG. 4. Flexural deformation.
[39] In other words, the bimetal 41 integrally deposits two metal members having different coefficients of thermal expansion so that one end is attached to the support 43, and one end attached to the support 43 and the other end corresponding thereto are mutually at one end. The connecting terminal 42 is provided to be in contact with the corresponding surface, that is, the upper and lower surfaces corresponding to each other of the bimetal 41, but the connecting terminal 42 contacting the bimetal 41 on the support 43 side is fixed. Make contact.
[40] The other end of the bimetal 41 in contact with the connection terminal 42 corresponding thereto is to bend deformation. Therefore, it is most preferable that the bimetal 41 is made of a material having a higher coefficient of thermal expansion than the metal member laminated on the rear surface of the metal member on the side of the connection terminal 42 at the end of the bending deformation.
[41] In this way, when the heat block 10 is heated to a predetermined temperature or more while the power supply is applied to the heater 20 until the heat block 10 is a constant temperature, heat transfer to the bimetal 41 through the support 43. Is done.
[42] At this time, the metal member having a high thermal expansion rate is first bent and deformed to the lower metal member side, thereby disconnecting the connection state with the connection terminal 42. Therefore, since the heating of the heat block 20 is stopped while the power supply to the heater 20 is stopped, the damage of components such as the detector 30 adjacent to the heat block 20 due to the overheating of the heat block 20 is not inferred. To prevent it.
[43] When the temperature of the heat block 20 is gradually lowered and lowered below a predetermined temperature, the bimetal 41 is returned to its original state and brought into contact with the connection terminal 42 again to drive the heat block 20 by driving the heater 20. ) Is heated.
[44] Therefore, the switching terminal portion 40 having a simple configuration as in the present invention prevents the overheating of the heat block 10 and also prevents damage of adjacent parts thereof, thereby providing an economic advantage of extending the operability and the useful life of the parts. To provide.
[45] On the other hand, while many matters have been described in detail in the above description, they should be construed as illustrative of preferred embodiments rather than to limit the scope of the invention.
[46] Therefore, the scope of the present invention should not be defined by the described embodiments, but should be determined by the technical spirit described in the claims.
[47] As described above, according to the present invention, the temperature control of the heat block 10 by the heater 20 can be more precisely performed by a more simple configuration, which enables stable cleaning of the viewing window and at the same time operates the equipment. There is a very useful effect that provides an improvement in product yield due to reliable and stable process performance.

权利要求:
Claims (5)
[1" claim-type="Currently amended] A heater heated by an applied power source;
A heat block connected to the heater and heated by heat transferred from the heater;
Switching terminal unit for intermittent the power applied to the heater;
The switching terminal portion
A bimetal in which two metal members having different thermal expansion coefficients are laminated;
Connection terminals respectively contacting surfaces corresponding to each other at both ends of the bimetal;
A support part which protrudes integrally from the heat block so that one end of the bimetal is seated;
Temperature control device for a heat block for semiconductor equipment provided with.
[2" claim-type="Currently amended] The temperature control apparatus of claim 1, wherein one end of the bimetal is attached to the support part, and the other end thereof is formed to bend deformation.
[3" claim-type="Currently amended] The said bimetal has a connection terminal provided at the one end side attached to the said support part fixedly contacting the said bimetal, and the connection terminal provided at the other end side of the bimetal bend | transformed is contacted or short-circuited with the said bimetal. The temperature control apparatus of the heat block for semiconductor installations which interrupts the power supply to the said heater.
[4" claim-type="Currently amended] 3. The temperature of the heat block for semiconductor equipment according to claim 2, wherein the bimetal is made of a material having a lower bending strain than that of the metal member in the direction in which the metal member in contact with or short-circuited by the bending terminal is caused by bending deformation. Control unit.
[5" claim-type="Currently amended] The apparatus of claim 1, wherein the switching terminal portion is protected from the outside by a cover.

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同族专利:

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引用文献:

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公开号 | 申请日 | 公开日 | 申请人 | 专利标题

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法律状态:
2002-07-02|Application filed by 삼성전자주식회사

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2002-07-02|Priority to KR1020020038002A

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2004-01-13|Publication of KR20040003335A

优先权:

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申请号 | 申请日 | 专利标题

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KR1020020038002A|KR20040003335A|2002-07-02|2002-07-02|Temperature control apparatus of heat-block for semiconductor equipment|