• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    PURPOSE: A light guide plate having equal-size patterns of regular arrangement is provided to effectively design dispersion patterns by controlling density distribution in regular arrangement while using equal-size patterns, thereby manufacturing more effective light guide plate. CONSTITUTION: In a light guide plate having dispersion patterns at the bottom surface, the dispersion patterns are formed by using distribution of same shaped polygons divided by axial lines proceeding in a plurality of directions, and that aspect ratio is lowered to the minimum to be close to a regular polygon in the part having a small area owing to a high coating rate; to the contrary, aspect ratio is increased and polygons are distorted in the part having a large area owing to a low coating rate.
    公开号:KR20020078461A
    申请号:KR1020010019435
    申请日:2001-04-12
    公开日:2002-10-18
    发明作者:사종엽；박종렬
    申请人:사종엽；
    IPC主号:
    专利说明:

    A backlight having structured pattern of constant size}
    [16] BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a light guide plate for display and illumination, and more particularly, to a technical idea of regularly arranging dot-shaped scattering patterns having a constant size while controlling a density distribution.
    [17] Originally, the coverage of the pattern is an important factor in forming the scattering pattern of the bottom of the light guide plate, where the coverage is the ratio of the area of the scattering pattern per unit area on the bottom of the light guide plate, and there are two methods of determining the coverage. . The first is to change the size of the pattern while keeping the density distribution uniform, and the second is to change the density distribution of the pattern while using the pattern of uniform size.
    [18] The most common method of forming a scattering pattern in the related art is to change the size of the pattern while maintaining a uniform density distribution as shown in the examples of FIGS. 1 and 2. In this case, there is an advantage that the maximum coverage can be increased by regular arrangement, but since the size of the pattern is continuously changed, considerable precision is required to properly maintain the resolution of the pattern size when selecting a manufacturing and processing method.
    [19] Another conventional method is to change the density distribution of the pattern using a pattern of uniform size, as in the example of FIG. 3, where the position of the pattern is determined in a stochastic manner to obtain the desired coverage.
    [20] However, in order for the distribution control by probability to be applied efficiently, the number of patterns must be large enough, and thus a very fine pattern must be used, which may cause processing difficulties. In addition, such stochastic density distribution control causes irregular arrangement of patterns, and it is difficult to achieve high brightness because the maximum coverage is relatively low in order to avoid overlap between patterns due to irregularities in the spacing of the patterns. In order to overcome the problem of improving the processing accuracy by using the fine size pattern and the problem of decreasing the coverage ratio due to the irregular arrangement, attempts have been made to regularly arrange the pattern of uniform size, but no efficient method has been established.
    [21] Therefore, an object of the present invention is to solve the above problems, and relates to a method for performing density control to enable regular arrangement while using a pattern of uniform size. The technical problem for the successful application of this method is to find an arrangement method in which the position of the pattern must be easily adjustable for the adjustment of the coverage, and the coverage can be maximized. When the above technical problem is achieved, various processing methods can be more easily applied to the development of the light guide plate scattering pattern, and thus it is possible to develop a new light guide plate that is most efficient.
    [1] 1 is a diagram illustrating a change in pattern size of dot patterns for adjusting coverage in a square array using a fixed pitch as an example.
    [2] FIG. 2 is a diagram illustrating a pattern size change of dot patterns for controlling coverage in an equilateral triangle array using a fixed pitch as another example.
    [3] Figure 3 is another example, an illustration of the density distribution according to the probability distribution of the dot patterns for the coverage control in an irregular arrangement using a uniform size pattern.
    [4] 4 is an illustration of the difference in the maximum coverage obtained by avoiding overlap in the regular and irregular arrangements.
    [5] Figure 5 is an example of the present invention, an illustration of a rule arrangement for adjusting the density distribution in accordance with the direction of the line in the triaxial direction while using a pattern of uniform size.
    [6] FIG. 6 is an exemplary diagram for adjusting the size of a triangle formed by lines and intersections of three axes in FIG. 5; FIG.
    [7] FIG. 7 is an exemplary view of the possibility of overlapping with increasing coverage of a portion having a low density distribution and a portion having a high density distribution in FIG. 5; FIG.
    [8] 8 is an illustration of the possibility of overlapping with increasing coverage as the distortion of the triangle becomes larger because the triangles of the same area have the same density when the density distribution is the same.
    [9] 9 is another example of the present invention, an example of a rule arrangement for adjusting the density distribution in a rectangular shape according to the direction of the line in the biaxial direction while using a pattern of uniform size.
    [10] FIG. 10 is an exemplary diagram for adjusting a square size formed by a line in the biaxial direction and intersection points in FIG. 9; FIG.
    [11] 11 is an exemplary diagram in which a linear pattern is introduced along a line of each axis in place of a dot pattern on each intersection in a scattering pattern of a rule array using uniform size.
    [12] Explanation of symbols on the main parts of the drawings
    [13] 10a: line in the first direction among the three axes 10b: line in the second direction among the three axes
    [14] 10c: line in the third direction among the three axes 20a: line in the first direction among the two axes
    [15] 20b: line in the second direction of the biaxial axis
    [22] In order to achieve the above object, the present invention provides a light guide plate having a scattering pattern in a bottom surface: A scattering pattern is formed by using a distribution of polygons of the same shape separated by axes traveling in a plurality of directions. In the small area, the small area is minimized so as to be close to the regular polygon, and in the large area because the coverage is low, the polygon is distorted to allow the small device to increase. .
    [23] As another feature of the invention, the polygons of the same shape are alternatively selected from triangles or rectangles.
    [24] As another feature of the present invention, a dot pattern having a regular array of uniform size is provided at each point where the plurality of axes intersect.
    [25] Adjust the density distribution of the patterns by intersecting the lines in the triaxial or biaxial directions with each other to adjust the position of the intersection, and adjust the position of the intersection by appropriately changing the direction of the lines coming from each axial direction to control the density distribution. Position adjustment is possible. The use of uniformly sized patterns has the advantage of not having to consider the resolution due to the change of the pattern size during processing, and the use of a regular arrangement allows the patterns to be as close as possible without overlapping each other, thereby improving the coverage. Higher brightness can be maintained.
    [26] Hereinafter, with reference to the accompanying drawings will be described in detail a preferred embodiment of the present invention.
    [27] First, the advantages and disadvantages of each of the conventional pattern arrangement schemes are compared with reference to FIGS. 1 to 3.
    [28] 1 is an example of a conventional rule array, and illustrates a shape of a regular array of dot patterns formed in a square using a fixed pitch. In this arrangement, since the size of the dot pattern is to be adjusted in order to adjust the coverage, a processing method having high precision and high resolution must be used so that the change of the size of the dot pattern can be well represented.
    [29] FIG. 2 is a diagram showing another conventional rule arrangement, in which dot patterns are arranged in a regular arrangement of equilateral triangles using a fixed pitch. In order to control the coverage, such an arrangement requires a precise processing method capable of continuously changing the size of the pattern, similar to the square arrangement of FIG. 1. However, in FIG square array of 1 is maximum coating rate is 78.5% which does not overlap to the pattern (when the LA side of the square is a, so that the diameter of the maximum-coated dots a (πa 2/4) / a 2 = 0.785) on the other hand, since the maximum coverage of the equilateral triangular arrangement of the two is 90.7% (referred to one side of the equilateral triangle b, a class of the diameter of the maximum-coated dots b applying a regular triangle (πa 2/4/2) / ( a 2/4) has the advantage of increasing further the covering ratio as = 0.907).
    [30] However, when using a regular array as shown in FIG. 1 or 2, there is an advantage that a relatively high brightness can be obtained by increasing the coverage ratio without overlapping each other due to the regularity of the array (see FIG. 4). Since it must be able to change continuously with, it has disadvantages such as constraints on the precision of the processing method used. Therefore, although it is advantageous to make a light guide plate of high brightness, it is not suitable to be applied to a diffused light guide plate using a pattern of fine size due to the problem of precision and resolution of the continuously changing dot size.
    [31] 3 shows an example of an irregular arrangement in which the coverage is controlled by varying the density distribution of dots using a dot pattern of uniform size. Conventional irregular array method uses a dot pattern of uniform size to overcome the resolution problem according to the processing precision, but because the probability position is used to determine the position of the pattern to control the density distribution has an irregular array only Rather, in order to increase the accuracy of the probability, a large number of very small dot patterns must be used.
    [32] Therefore, the conventional irregular array has advantages such as making a diffused light guide plate by using a pattern of uniform size, but as shown in FIG. There is this.
    [33] As described above, it is absolutely necessary to find a method that can take regular advantages while using a dot pattern of uniform size by taking only the advantages of the conventional pattern arrangement method (rule arrangement and irregular arrangement). Through it can greatly improve the quality of the light guide plate.
    [34] 5 to 8 illustrate examples in which the light guide plate according to one embodiment of the present invention simultaneously implements a dot pattern having a uniform size and a regular array.
    [35] As shown in FIG. 6, the position of the dot pattern is defined as an intersection point of the lines 10a, 10b, and 10c in the triaxial direction, and the intersection point of two lines (for example, 10a and 10b) of the three lines in each direction is determined. The other line 10c must automatically pass through that point. An example of controlling the intersection to adjust the density distribution is illustrated in FIG. 6. By adjusting the directions of the two axial lines 10a and 10b, the position of the intersection point can be changed, and the density distribution is adjusted using this. When the intersection is determined, the other one line 10c passes through the intersection.
    [36] Since a dot pattern having a uniform size is used, a large area is formed at a low density while a small area is formed at a high density, and in FIG. 7, a small triangle is formed at a high density distribution. As the distance between them narrows, the pattern is more likely to overlap. In two triangles having the same area, as the fineness of the triangle increases, as in the example of FIG. 8, the possibility of overlap increases. 7 and 8, it can be seen that the coverage can be made as large as possible when the triangles are formed to be close to the equilateral triangle by minimizing the fineness at the place where the density distribution is high, that is, the size of the triangle is small. have.
    [37] In the present invention, the result of adjusting the density distribution using the intersection of the lines in the triaxial direction is shown as triangles as shown in FIG. 5, but it is impossible to make all the triangles close to the equilateral triangle by controlling the exact density distribution. That is, some triangles cannot avoid the increase in fineness. Therefore, in the places where density distribution is high, that is, triangles are minimized, minimization of fine equipment should be minimized so as to be close to equilateral triangle, and large triangles where high density distribution is likely to overlap even if the fine equipment is large. Not very high
    [38] Therefore, as shown in FIG. 5, in the place where the density distribution is high, the thin equipment is made small so as to be as close to the equilateral triangle as possible. While FIG. 5 is a triangular regular array pattern using intersections of line segments in the triaxial direction, the same idea can be applied to a regular square array.
    [39] 9 and 10 show, as another example of the present invention, a pattern shape of uniform size that adjusts the density distribution by a regular array of square shapes by intersections of biaxial lines.
    [40] In order to form such an arrangement, it may be determined by adjusting the direction of two adjacent lines 20a in one axial direction and the position of the line 20b in the other axial direction as in the example of FIG. 10. However, this shape is not very efficient compared to the triangular rule arrangement of FIG. 5, since the smooth distribution of the density distribution is not easy and the maximum coverage ratio does not overlap with the triangular rule arrangement of FIG. 5. It is possible to create a regular array of rules of uniform size.
    [41] In the above, a method of forming a scattering pattern having a regular array while using a dot pattern of uniform size has been described, but it is also possible to apply such a method by modifying it as follows. Instead of arranging uniformly sized dot patterns at the intersections, a linear pattern is used along each axial line. This method can be advantageously applied when forming a linear pattern among processing methods is easier than forming a dot pattern.
    [42] 11 illustrates an application example using a line pattern instead of a dot pattern.
    [43] According to the above configuration and operation, the present invention controls the density distribution of the pattern in a regular arrangement by controlling the lines in the triaxial direction while using a pattern of uniform size, so that it is possible to efficiently design the scattering pattern for various processing methods It is effective.
    [44] Therefore, it is possible to manufacture a light guide plate more efficiently by using various ultra-precision processing methods that can expect the accuracy of the pattern position, but difficult to realize the resolution of the pattern size.
    [45] In addition, even though the density distribution of the patterns is changed, it is possible to design the light guide plate of high brightness because the coverage can be maintained as large as possible by using a regular arrangement using intersections between the triaxial lines.
    [46] It is apparent to those skilled in the art that the present invention is not limited to the described embodiments, and that various modifications and variations can be made without departing from the spirit and scope of the present invention. Therefore, such modifications or variations will have to belong to the claims of the present invention.
    权利要求:
    Claims (4)
    [1" claim-type="Currently amended] In a light guide plate having a scattering pattern at the bottom:
    Scattering pattern is formed by using a distribution of polygons of the same shape that are separated by the axis lines running in a plurality of directions,
    In areas where the coverage is high, the small area is at least small so as to be close to the regular polygon, and in the area where the coverage is low, the polygon is distorted, which allows the enlargement of the equipment. A light guide plate with a uniform size pattern of a regular array.
    [2" claim-type="Currently amended] The method of claim 1,
    The light guide plate having a uniform size pattern of a regular array, characterized in that the polygon of the same shape is selected from a triangle or a square.
    [3" claim-type="Currently amended] The method of claim 1,
    A light guide plate having a uniform size pattern of a regular array, characterized in that a dot pattern having a regular array of uniform size is provided at each point where the plurality of axes intersect.
    [4" claim-type="Currently amended] The method of claim 3, wherein
    While maintaining the area (A pattern ) of the dot pattern uniformly, the rule characterized in that to control the coverage (A pattern / A figure ) by adjusting the area (A figure ) of the polygon consisting of intersections of each direction axis Light guide plates with an array of uniformly sized patterns.
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    同族专利:
    公开号 | 公开日
    KR100371739B1|2003-02-12|
    引用文献:
    公开号 | 申请日 | 公开日 | 申请人 | 专利标题
    法律状态:
    2001-04-12|Application filed by 사종엽
    2001-04-12|Priority to KR10-2001-0019435A
    2002-10-18|Publication of KR20020078461A
    2003-02-12|Application granted
    2003-02-12|Publication of KR100371739B1
    优先权:
    申请号 | 申请日 | 专利标题
    KR10-2001-0019435A|KR100371739B1|2001-04-12|2001-04-12|A backlight having structured pattern of constant size|
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