Protective film for mask pattern having pollution preventing case

专利摘要:
The mask pattern protective film provided with the antifouling case of this invention is equipped with a protective film and an antifouling case. The protective film covers the mask on which the pattern is formed to protect the mask. The anti-fouling case completely covers the protective film, and adhesive is attached to the inner wall corresponding to the protective film. According to this, contaminants of the case or contaminants introduced from the outside stick to the adhesive attached to the case, thereby preventing contamination of the protective film.
公开号:KR20000021293A
申请号:KR1019980040309
申请日:1998-09-28
公开日:2000-04-25
发明作者:유상용
申请人:윤종용；삼성전자 주식회사；
IPC主号:

专利说明:

Mask pattern protective film with contamination protection case
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to semiconductor manufacturing equipment, and more particularly, to a mask pattern protective film having a pollution prevention case.
In general, an exposure method using a mask is used to perform patterning for manufacturing a semiconductor device. That is, when the light passes through the mask to reach the semiconductor substrate, the light is irradiated only to the selected region of the semiconductor substrate by the pattern formed on the mask, and the mask pattern is transferred to the semiconductor substrate. As described above, as the semiconductor devices are highly integrated, the production of mask patterns becomes increasingly difficult, and the management after completion is also increasing in importance.
1 is a cross-sectional view showing a mask pattern protective film having a conventional general case.
Referring to FIG. 1, the protective film 10 may cover a mask on which a pattern is formed to protect the mask from contaminants. The case 20 completely covers the protective film 10. This case 20 is for preventing contamination of the protective film 10. That is, when the protective film 10 is exposed to the outside, the protective film 10 may be contaminated by various causes. As such, when the protective film 10 is contaminated, the mask may be contaminated thereby, and thus the case 20 for preventing the contamination of the protective film 10 is essential.
However, even when the case 20 is used, it is difficult to completely block impurity particles such as dust. In addition, when the impurity particles penetrate into the space in the case 20, it is difficult to prevent the contamination of the protective film 10 due to this, and consequently, the mask pattern may be contaminated, thereby causing incorrect pattern transfer.
SUMMARY OF THE INVENTION The present invention has been made in an effort to provide a mask pattern protective film having a pollution prevention case capable of preventing contamination from impurity particles penetrating therein.
1 is a cross-sectional view showing a mask pattern protective film having a conventional general case.
2 is a cross-sectional view showing a mask pattern protective film having a contamination prevention case according to the present invention.
<Explanation of symbols for main parts of the drawings>
10, 100 ... shield 20, 200 ... case
30, 300 ... adhesive
In order to achieve the above technical problem, the mask pattern protective film having a pollution prevention case according to the present invention includes a protective film and a pollution prevention case.
The protective layer covers the mask on which the pattern is formed to protect the mask, and the anti-fouling case completely covers the protective layer, and an adhesive is attached to the inner wall corresponding to the protective layer.
According to this, contaminants of the case or contaminants introduced from the outside stick to the adhesive attached to the case, thereby preventing contamination of the protective film.
Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.
2 is a cross-sectional view showing a mask pattern protective film having a contamination prevention case according to the present invention.
Referring to FIG. 2, the mask pattern protective film having the pollution prevention case according to the present invention includes a protection film 100 and a pollution prevention case 200.
The passivation layer 100 covers the mask on which a pattern is formed (not shown) to protect the mask, and the pollution prevention case 200 completely covers the passivation layer 100, and the adhesive 300 is formed on an inner wall corresponding to the passivation layer 100. ) Is attached. In this case, the adhesive 300 is attached to the parts except for the part where the frame of the pollution prevention case 200 touches.
In this state, when the contaminants of the pollution prevention case 200 or the contaminants introduced from the outside adhere to the inner surface of the pollution prevention case 200, by the adhesive 300 attached to the pollution prevention case 200. Since it does not fall again, the protection film 100 may be protected from contaminants.
In the above, the present invention has been described in detail with reference to preferred embodiments, but the present invention is not limited to the above embodiments, and various modifications may be made by those skilled in the art within the scope of the technical idea of the present invention. It is possible.
As described above, according to the mask pattern protective film provided with a pollution prevention case according to the present invention, the contamination of the protective layer or the contaminants introduced from the outside adhere to the adhesive attached to the case, thereby preventing contamination of the protective film. have.

权利要求:
Claims (1)
[1" claim-type="Currently amended] A protective film covering the mask on which the pattern is formed to protect the mask; And
A mask pattern protective film having a pollution prevention case completely covered with the protection film and having an antifouling case with an adhesive attached to an inner wall corresponding to the protection film.

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同族专利:

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公开号 | 公开日

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引用文献:

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公开号 | 申请日 | 公开日 | 申请人 | 专利标题

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法律状态:
1998-09-28|Application filed by 윤종용, 삼성전자 주식회사

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1998-09-28|Priority to KR1019980040309A

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2000-04-25|Publication of KR20000021293A

优先权:

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申请号 | 申请日 | 专利标题

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KR1019980040309A|KR20000021293A|1998-09-28|1998-09-28|Protective film for mask pattern having pollution preventing case|