• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    The present invention relates to an apparatus for adjusting the center of gravity of an ion implanter. In the related art, the disk has an eccentric rotation while the entire center of gravity of the disk by the components constituting the ion implantation disk is deviated from the rotation axis, and is caused by the eccentric rotation The force is transmitted to the main drive shaft to generate the vibration of the shaft, but the conventional disk assembly is not equipped with a separate center of gravity control system, as the disk rotates eccentrically shortens the life of the main drive shaft, as well as the vibration of the drive shaft In the present invention, a vibration measuring device and a vibration recorder are installed below the main drive shaft, and a plurality of mass body insertion holes are formed on the circumferential surface of the disc to measure the vibration. By adjusting the vibration amount accordingly, Extend the life of the main drive shaft so as to offset the vibrations generated by the rotation, as well as has the effect to prevent the leakage of pressure and cooling water.
    公开号:KR19980054411A
    申请号:KR1019960073572
    申请日:1996-12-27
    公开日:1998-09-25
    发明作者:장정훈
    申请人:문정환；엘지반도체 주식회사；
    IPC主号:
    专利说明:

    Center of gravity control of ion implanter
    The present invention relates to an ion implanter, and more particularly to an apparatus for adjusting the center of gravity of an ion implanter to cancel the vibration caused by the eccentric rotation of the main drive shaft to prevent the leakage of pressure and cooling water as well as the life of the main drive shaft. .
    Conventional disk assembly, as shown in Figure 1, the motor system (Motor System) 1, which is the source of rotational power of the disk, the cooling system (Cooling System) 2 for cooling the disk, atmospheric pressure and vacuum It consists of an end station door 3 to be separated, a main drive shaft 4 and a 200 mm implant disk 5 in advance.
    The 200mm ion implantation disk 5 is equipped with a clamp ring 5a for holding a wafer during ion implantation, and a pole and a spring 5b for lifting the wafer when the wafer is unloaded. It is.
    In the drawings, reference numeral 6 denotes a bearing.
    In the conventional ion implanter configured as described above, vertical / horizontal scanning is performed to evenly inject ions into the wafer. In the vertical scanning (Y-scan) method, the disk 5 on which the wafer is mounted is rotated 1000 times per minute. do.
    In order to rotate the disk 5, first, when the motor 1 attached to the chamber transmits a rotational force to the main drive shaft 4, which is the disk rotation shaft, the disk 5 connected to the main drive shaft 4 is The disk 5 is at high vacuum and the motor 1 is at atmospheric pressure. Accordingly, the main drive shaft 4 is subjected to pressure sealing using Ferro Fluid, which is a magnetic fluid.
    Next, when the disk 5 rotates 1000 times per minute, ion implantation is started to generate heat in the wafer. In order to cool this heat, the cooling water was normally supplied to the inside of the disk 5 via a rotary union assembly 2.
    However, the disk 5 is eccentrically rotated as the entire center of gravity of the disk by the components constituting the 200mm ion-implanted disk deviates from the rotating shaft 4, and the force generated by the eccentric rotation is mainly Although it was transmitted to the drive shaft 4 to generate the vibration of the shaft, the conventional disc assembly is not provided with a separate center of gravity control system to reduce the life of the main drive shaft 4 while the disk 5 is eccentric rotation Of course, there was a problem that leakage of the pressure and cooling water generated by the vibration of the drive shaft (4).
    Accordingly, an object of the present invention is to add a separate center of gravity control system to the disk assembly to prevent the eccentric rotation of the disk, thereby extending the life of the main drive shaft as well as the center of gravity of the ion injector to prevent leakage of pressure and cooling water To provide an adjusting device.
    1 is a perspective view showing a conventional cut in the configuration of the ion implanter.
    Figure 2 is a perspective view of the configuration of the ion implanter according to the present invention cut.
    Figure 3 is a perspective view showing the configuration of the center of gravity adjusting device in the ion implanter according to the present invention.
    Explanation of symbols on the main parts of the drawings
    7: Vibration measuring instrument 8: Vibration recorder
    9: mass body insertion port 10: mass body
    In order to achieve the object of the present invention, in the ion implanter comprising a main drive shaft rotated by a motor attached to the chamber and an ion implantation disk coupled to the upper end of the main drive shaft; Vibration measuring device provided on the lower side of the main drive shaft for measuring the magnitude and direction of the vibration generated when the eccentric disk is rotated, Vibration recorder provided on one side of the vibration measuring device to periodically record the data measured from the vibration measuring device And a mass body insertion hole formed on the circumferential surface of the disk and a mass body mounted on the mass body insertion hole for correcting the amount of eccentricity of the main drive shaft.
    Hereinafter, the apparatus for adjusting the center of gravity of the ion implanter according to the present invention will be described in detail based on the embodiment shown in the accompanying drawings.
    As shown in FIG. 2, the ion implanter equipped with the center of gravity adjusting device according to the present invention includes a motor system 1 serving as a rotational power source of the disk, a cooling system 2 for cooling the disk, and an atmospheric pressure and a vacuum. The amount of vibration generated when the end station door (3), the main drive shaft (4), the 200mm ion implantation disk (5), and the disk eccentrically provided on the main drive shaft (4) below are separated from each other. And a vibration meter 7 for measuring a direction, and a vibration recorder provided at one side of the vibration meter 7 to periodically record and monitor data measured by the vibration meter 7. (8), a mass body insertion opening (9) formed on the circumferential surface of the disk (5), and a mass body mounted on the mass body insertion opening (9) for correcting the amount of eccentricity of the main drive shaft (4). It consists largely of (10).
    As shown in FIG. 3, the mass insertion hole and the mass are composed of a mass insertion groove 9a formed in the circumferential surface of the disk 5 and a fastening groove 9b formed in the center of the insertion groove 9a. The mass 10 is composed of a body 10a fitted into the mass insertion groove 9a and a fastening protrusion 10b formed at the center of one side of the body 10.
    In the drawings, the same reference numerals are given to the same parts as in the prior art.
    In the drawings, reference numeral 6 denotes a bearing.
    In the ion implanter according to the present invention configured as described above, the driving process of the ion implanter is the same as in the prior art, it will be omitted, the following will be described with respect to the mounting process of the center of gravity adjustment device according to the present invention.
    That is, when the disk 5 rotated by the main drive shaft 4 is eccentric to generate vibration, the vibration measuring device 7 measures the vibration, and the measured value is received by the vibration recorder 8 and recorded. Will be
    Next, the operator analyzes the data recorded in the recorder 8 to grasp the degree of vibration to calculate the size and position of the mass necessary for weight balancing, and the calculated value requires the center of gravity adjustment. In this case, weight balancing is performed by additionally attaching the appropriate mass 10 to the appropriate mass insertion hole 9.
    As described above, the apparatus for adjusting the center of gravity of the ion implanter according to the present invention includes a vibration measuring device and a vibration recorder disposed below the main drive shaft, and a plurality of mass body insertion holes are formed on the circumferential surface of the disc to measure the vibration. By correcting the vibration amount, the vibration generated by the eccentric rotation of the main drive shaft is canceled, thereby preventing the leakage of pressure and cooling water as well as the life of the main drive shaft.
    权利要求:
    Claims (1)
    [1" claim-type="Currently amended] An ion implanter comprising a main drive shaft rotated by a motor attached to a chamber, and an ion implantation disk coupled to and rotated at an upper end of the main drive shaft; Vibration measuring device provided on the lower side of the main drive shaft for measuring the magnitude and direction of the vibration generated when the eccentric disk is rotated, Vibration recorder provided on one side of the vibration measuring device to periodically record the data measured from the vibration measuring device And a mass body inserted into a plurality of circumferential surfaces of the disc, and a mass body mounted on the mass body inserted to correct an amount of eccentricity of the main drive shaft.
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    同族专利:
    公开号 | 公开日
    KR100214542B1|1999-08-02|
    引用文献:
    公开号 | 申请日 | 公开日 | 申请人 | 专利标题
    法律状态:
    1996-12-27|Application filed by 문정환, 엘지반도체 주식회사
    1996-12-27|Priority to KR1019960073572A
    1998-09-25|Publication of KR19980054411A
    1999-08-02|Application granted
    1999-08-02|Publication of KR100214542B1
    优先权:
    申请号 | 申请日 | 专利标题
    KR1019960073572A|KR100214542B1|1996-12-27|1996-12-27|A centroid regulator of ion implantation device|
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