![]() PHOTOPOLYMERIZABLE COMPOSITION, MATERIAL OBTAINED BY POLYMERIZATION OF SUCH COMPOSITION, AND 3D PRIN
专利摘要:
The invention relates to a photopolymerizable composition comprising at least: • a polymerizable resin, • a photosensitizer (PS), • an annihilator (AN), and • a photoinitiator (PI) Said photosensitizer (PS) and said annihilator (AN) are adapted to implement together an absorption reaction, by the photosensitizer (PS), of two photons of a light excitation signal received from an external excitation source emitting over a first wavelength range, followed of an additive energy conversion reaction by annihilation of triplets (STTA-UC) to obtain an excited annihilator (1AN *) whose photonic energy over a second wavelength range is greater than a photonic energy of the signal d 'excitation. Said excited annihilator (1AN *) and said photoinitiator (PI) are adapted to implement a mechanism of energy transfer between said annihilator and said photoinitiator to produce an excited photoinitiator (3PI *) capable of generating at least one polymerization initiator capable of causing a polymerization reaction of the resin. The invention also relates to a material obtained by photopolymerization of a composition as described above. The invention also relates to a 3D printing process comprising a step of transforming a volume of composition as described above by irradiating said volume. The invention finally relates to a three-dimensional printing device comprising a reservoir containing a composition as described above and an external excitation light source arranged to irradiate a predefined volume of composition inside the reservoir, the volume irradiated having a thickness greater than 0.5 microns and preferably less than 1 cm. 公开号:FR3069862A1 申请号:FR1757401 申请日:2017-08-02 公开日:2019-02-08 发明作者:Patrice Baldeck;Akos Banyasz 申请人:Centre National de la Recherche Scientifique CNRS;Universite Claude Bernard Lyon 1 UCBL;Ecole Normale Superieure de Lyon; IPC主号:
专利说明:
Photopolvmérisable composition. material obtained by polymerization of such a composition and 3D printing process using such a composition Technical field and state of the art The invention relates to the field of three-dimensional printing of objects by photopolymerization of a resin, and more specifically in this field, a photopolymerizable composition, a material obtained by photopolymerization of such a composition and a 3D printing process using a such composition. 3D microfabrication based on photopolymerization induced by multiphotonic absorption is a technique invented in the 1990s, based on the non-linear absorption of photosensitizers. GI This technique is notably described in documents US8197722, US20040067451 or US20110021653. This technique is very effective for the three-dimensional printing of objects. But it leads to a photopolymerization localized only at the focal point, that is to say to a photopolymerization limited to very small volumes with a submicron spatial resolution; the use of this particularly slow technique is therefore limited to the production of objects of small dimensions, of the order of a millimeter. It also requires particularly powerful pulse lasers, having an irradiance typically of the order of magnitude of TWatt / cm 2 . A non-linear photosensitization technique has also been developed based on a fluorescence up-conversion mechanism of inorganic materials to excite polymerization photoinitiators suitable for the generation of radicals (for radical polymerization) or acids (for cationic polymerization) ). This technique is notably described in document US20040198857. This technique makes it possible to use lasers having an irradiance of the order of MWatt / cm 2 , which remains high. Still other documents describe 3D microfabrication processes with CW continuous lasers, for example US8846160 or "M. Thiel, J. Fischer, GV Freymann and M. Wegener," Direct laser writing of three-dimensional submicron structures using a continuous -wave laser at 532mm ", Appl. Phys. Lett. 97, 221102 (2010) ”. The dimensions of the achievable objects remain very limited, of the order of a few tens of micrometers, and the irradiance necessary for implementation remains very high, of the order of 10 MWatt / cm 2 . Recent publications show the possibilities and limitations in the state of the art of two-photon photopolymerization resins. We can quote for example "Guney, MG, and GK Fedder" Estimation of line dimensions in 3D direct laser writing lithography "Journal of Micromechanics and Microengineering 25.10 (2016): 105011" and "Nelson, Garrett et al. "Three-dimensional-printed gas dynamic Virtual nozzles for x-ray laser sample delivery" Optics Express 24.14 (2016): 11515-11530 ". Today it is the 3D printing technique with the best spatial, submicronic and nanometric resolution, but the irradiance thresholds remain high, in the range of MWatt / cm 2 and TWatt / cm 2 , the technique requires he use of ultra-short pulse lasers, the linear manufacturing speeds are limited to a few cm / s and the volume manufacturing speeds to several hours per mm 3 . The approach of massively parallel manufacturing by simultaneous projection of multiple laser spots can overcome the contradiction between resolution and manufacturing speed. It is commonly used with 3D printers that use the projection of masks, including high resolution microstereolithography systems. In these cases, the photopolymerization is triggered by a simultaneous single-photon absorption of several million laser spots, which correspond to the pixels of the projected image. The axial resolution is obtained by a mechanical means of renewing the photopolymer between each layer, which imposes a minimum thickness, typically 5 to 10 microns. This is to be compared with photopolymerization by multiphotonic absorption for which the axial resolution, determined by the optical thickness of the image projected in the volume of the resin, is very easily submicron. Parallel photopolymerization in a multi-photon absorption regime has already been proposed. One can quote for example “Jun-ichi Kato et al. "Multiple-spot parallel Processing for laser micronanofabrication, Applied Physics Letters 86, 044102 (2005)". Given the strong irradiances required, in the range of MWatt / cm 2 to TWatt / cm 2 , it remains limited to a few hundred laser spots, unless using extremely intense pulse lasers. These conditions and these limited results considerably hamper the development of this technology in industrial applications. Description of the invention To overcome the drawbacks of the known techniques set out above, the invention proposes a new non-linear photopolymerizable composition in continuous and ultra-sensitive light irradiance, as an alternative to multiphotonic photopolymerizable compositions especially when the manufacturing processes require to project 2D or 3D distributions of 'irradiances, for example including numerous laser spots in the composition. To this end, the invention provides a new photopolymerizable composition comprising at least: • a polymerizable resin, • a photosensitizer, • an annihilator, and • a photoinitiator, The photosensitizer and the annihilator are suitable for implementing together an absorption reaction, by the photosensitizer, of two photons of a light excitation signal received from an external excitation source emitting over a first range of lengths of waves, followed by an additive energy conversion reaction by annihilation of triplets (STTA-UC) to obtain an excited annihilator whose photonic energy over a second wavelength range is greater than photonic energy of the signal excitation. The excited annihilator and the photoinitiator are adapted to implement an energy transfer mechanism between said annihilator and said photoinitiator to produce an excited photoinitiator capable of generating at least one polymerization initiator capable of causing a polymerization reaction of the resin . The energy transfer mechanism between the annihilator and the photosensitizer can be for example by emission / absorption of a secondary signal whose photonic energy is greater than the photonic energy of the excitation signal or by resonant transfer of energy. According to a variant, the annihilator can also be the photoinitiator and can, if necessary, directly generate a polymerization initiator after being excited. The invention thus provides a composition particularly sensitive to external irradiances, suitable for being polymerized by the implementation of an effective STTA-UC mechanism with irradiances of the order of the irradiance of the sun, that is to say say of the order of 0.1 W / cm 2 , therefore much lower than the irradiances required with known prior techniques. Furthermore, the STTA-UC mechanism, whose efficiency is non-linear in irradiance, makes it possible to obtain confined photopolymerization in three-dimensional areas of controlled irradiation and with continuous light sources. The photosensitizer (PS) comprises at least one molecule adapted to pass from a singlet state to a triplet state when it absorbs the photonic energy of the external excitation signal. The annihilator (AN) includes molecules suitable for: • to pass from a singlet state to a triplet state when they receive an energy during an interaction (or encounter) with a molecule of the photosensitizer in the triplet state, and • to pass from a triplet state to a singlet state at two photons during a collision between molecules of annihilator and • implement an energy transfer mechanism to excite the photosensitizer for polymerization of the resin. According to one embodiment, the photopolymerizable resin can comprise monomers, oligomers or polymers which can be polymerized by the radical route or by addition or crosslinking mechanisms such as: acrylated monomers, such as acrylates, polyacrylates, methacrylates, for example a pentaaerythritol triacrylate, a polyethylene glycol diacrylate or an acrylate such as aronix D-800 sold by the company TAOGOSEI Ltd. or -acrylated oligomers such as unsaturated amides, or -methacrylated polymers, polymers which have a hydrocarbyl skeleton and pendant peptide groups with a functionality which can be polymerized by free radicals, or -vinyl compounds such as styrenes, diallyl phthalate, divinyl succinate, divinyl adipate and divinyl phthalate, or -mixtures of several of the above monomers, oligomers or polymers, According to another embodiment, the resin can comprise cationically polymerizable monomers and oligomers and cationically crosslinkable polymers, for example epoxy resins such as monomeric epoxides and polymeric epoxides having one or more epoxy groups, ethers of vinyl, cyanate esters, ... and mixtures of several of these compounds. The photosensitizer, the annihilator, and a photoinitiator, as well as the mechanism used for the polymerization will be detailed below. The composition according to the invention can also comprise an antioxidant. Alternatively, the photosensitizer, the annihilator and / or the photoinitiator may have antioxidant properties. An antioxidant makes it possible to limit the harmful effect of the oxygen dissolved in the composition. Indeed, the molecular oxygen dissolved in the resin very quickly deactivates the molecules in triplet state ("3PS *", "3AN *" and "3PI *") and reduces their lifespan. Consequently, the presence of molecular oxygen in the resin can decrease the efficiency of energy transfer triplet-triplet and annihilation triplet-triplet, finally it can prevent photoinitiation or reduce its efficiency. In addition, this deactivation often induces the formation of singlet oxygen which can react with the components of the composition and alter their function. It is known that singlet oxygen reacts quickly with polycyclic aromatic hydrocarbons for example: anthracene (in the example DPA), rubrene, pyrene and with isobenzofuran derivatives which are likely to be used as AN annihilators in compositions in the context of the invention. The composition may contain one or more chemical additives with antioxidant properties. Alternatively, methods can be used to reduce effects inhibiting molecular oxygen, by reducing the concentration of molecular oxygen before or / and during irradiation by the external light source as will be seen further below. The invention also relates to a material obtained by photopolymerization of a composition according to the invention, in particular but not exclusively, a material having the shape of an object in thin layer such as a film or a three-dimensional volume object. The invention also relates to a three-dimensional printing method, comprising a step of transforming a volume of composition according to the invention by irradiating said volume. Thanks to the use of the STTA-UC mechanism, the volume of composition according to the invention to be photopolymerized can be irradiated by an excitation source emitting an external excitation light signal with a power of less than 1000 W / cm 2 , preferably less than 1 W / cm 2 and even more preferably less than 0.1 W / cm 2 on the first range of wavelengths. Such a power, much lower than the powers essential for the implementation of existing techniques, makes it possible to envisage the development of 3D printing techniques on an industrial scale. In the context of the invention, the irradiation can for example be carried out by a three-dimensional photolithography technique, a three-dimensional holographic projection technique or a technique known as direct laser writing (or "3D direct laser writing" "). The method according to the invention can also include an initialization step during which oxygen molecules contained in the composition are eliminated. Also, the irradiation of the composition volume can be carried out under a flow of inert gas, for example argon, nitrogen or carbon dioxide. This eliminates the inhibiting effects of oxygen. The invention finally relates to a three-dimensional printing device comprising a reservoir containing a composition according to the invention and an external excitation light source arranged to irradiate a predefined volume of composition inside the reservoir, the irradiated volume having a thickness greater than 0.5 μm and preferably less than 1 cm. According to one embodiment, suitable for the polymerization of liquid compositions, the optical excitation source comprises an optical system adapted to be immersed and moved in the liquid composition. This allows in particular to polymerize a composition thickness greater than 1 cm. Description of embodiments of the invention As said previously, the invention relates to a photopolymerizable composition comprising at least one photopolymerizable resin, a photosensitizer of triplets PS, an annihilator of triplets AN and a photoinitiator of polymerization PI. The invention also relates to various procedures and additives suitable for reducing the inhibiting effect of molecular oxygen and thus improving the efficiency of the polymerization process. Example of composition No. 1. By way of nonlimiting example, conclusive tests have made it possible to photopolymerize with an external excitation signal emitted by a laser source at 532 nm with an emission power of the order of only 150 mW / cm 2 , a composition according to l invention comprising: • as a polymerizable resin, a monomer of the acrylic acid ester type, more specifically an Aronix D-800 resin (TOAGOSEI CO. LTD, • as PS photosensitizer, a porphyrin, more specifically an octaethylporphyrin platinium, commonly called PtOEP • as an AN annihilator, an anthracene derivative, more specifically a 9.10 diphenylanthracene, commonly abbreviated DPA, and • as PI photoinitiator, Camphorquinone commonly abbreviated CQ For this specific example, the concentrations of the various components were chosen on the one hand to allow penetration over at least one millimeter of the composition of at least 50% of the energy of the excitation signal and on the other hand for obtain the implementation of a STTA-UC mechanism with an efficient quantum yield for polymerization. The STTA-UC mechanism as well as other concrete examples of composition according to the invention will be detailed below. The PtOEP photosensitizer has an absorption spectrum with a peak at 536 nm; it has a molar absorption coefficient (also called the molar extinction coefficient or molar absorptivity) of 6.52.10 4 LmoHcrrr 1 at the wavelength 536 nm and ^ lT.lO ^ .mol km- 1 at the length d wave 532 nm (or, at 532 nm, a relative molar absorption coefficient equal to 64% of the maximum molar coefficient (= 100% at 536 nm). In the example used, a concentration of 0.14 mM = 0.14 mmol.L -1 was used, which corresponds to a relative molar absorption coefficient of 44% when passing through I mm of resin, while PtOEP is much more transparent between 405 and 500nm; indeed, the transmission due to the PtOEP of concentration 0.14 mmol.L · 1 is greater than 90% between 405 and 500 nm when crossing I mm of composition; its molar extinction coefficient is approximately 4.10 3 Lmobcm 4 , which corresponds to a relative molar absorption coefficient of 5% under the same conditions. The DPA annihilator does not absorb at the emission wavelengths of PtOEP, nor at the wavelength 532 nm. On the other hand, the DPA emits efficiently at the absorption wavelength of the photoinitiator CQ between 400 and 500 nm: experience thus shows that the light power emitted by the DPA at 440 nm is a function of the square of the light power of the source of excitation, which is characteristic of a high energy emission following the absorption of two photons by the STTA-UC mechanism. In the example used, a concentration of 6 mM of DPA was used, ie a concentration 60 times greater than the concentration of photosensitizer PtOEP. In addition, DPA is also an antioxidant which helps reduce the limiting effects of molecular oxygen dissolved in the resin. The PI photoinitiator used, camphorquinone, is a photoinitiator producing free radicals capable of triggering a polymerization chain reaction. The photoinitiator CQ does not absorb the green light at 532 nm, but absorbs in the blue between 400 and 500 nm and therefore absorbs the photons emitted by the annihilator AN. In the example used, a concentration of 0.5 mM of PI was used. Finally, the resin chosen is photopolymerizable by a mechanism of the radical type, and capable of reacting with the photoinitiator. The initiation of photopolymerization induced by STTA-UC takes place as follows. A light source (excitation source external to the composition) illuminates the part of the composition to be polymerized by an excitation signal emitting over a first range of wavelengths corresponding to the absorption of PS. In the examples used, a green laser emitting at 532 nm was used. Only the PS molecules (in the example PtOEP) absorb photons at 532 nm and mainly form the triplet states "3PS *". Many molecules of annihilator AN (in the example the DPA) surround the molecules PS so that, in collisions between "3PS *" and AN, the excitation energy of the molecules "3PS *" is transferred towards the AN molecules which become excited in triplet states "3AN *". Then, during collisions between two molecules of annihilators in the “3AN *” state, there is the annihilation of the triplet excited states and the addition of the energy of two “3AN *” in one of the two molecules of annihilator which then becomes excited with the energy of approximately two triplet states (two photons) in the singlet state "1AN *", of energy higher than the photonic energy of the excitatory signal. Then, these “1AN *” molecules transfer their energies to the molecules of the PI photoinitiator (in the CCI example). This energy transfer can be done either by a non-radiative mechanism, or by the emission of a secondary signal in a second range of wavelengths (400-500 nm in the examples) different from the first range of lengths. wave. Then, the PI photoinitiators generate “R *” radicals after conversion into their “3PI *” triplet states. Finally, these “R *” radicals cause the radical polymerization reaction of the monomers which constitute the base of the resin. The above example was implemented and polymerization was started with a continuous laser excitation source at 532 nm from a light irradiance of 150 mW / cm 2 , therefore much lower than the irradiances usually necessary for a reaction with two conventional photons as recalled above in the state of the art part. Measurements have shown a quadratic relationship between the average light power of the excitation signal supplied by the source, the external laser excitation annihilator, and the average light power of the secondary signal emitted by fluorescence by the acceptor after the transfer of energy from the photosensitizer to the annihilator and the annihilation of the triplet states of the molecules of the annihilator. In the composition, the polymerization is limited to three-dimensional zones in which the irradiance of the excitation source has created enough radicals by the STTA-UC mechanism. In a concrete implementation, the excitation signal was focused in a composition layer according to the invention one millimeter thick by a microscope objective to create a polymerization voxel of submicron size. The continuous displacement of the focal point during the light excitation made it possible to manufacture polymerization lines inside the composition. In another concrete implementation, the front face of a 3D hologram of the edges of a cube with an 8 mm side was projected into a composition tank with a thickness of approximately 1 mm; the polymerization of the resin made it possible to obtain a solid reproduction of this 3D image. The polymerization of a resin-based composition according to the invention has just been described above in the context of a particular example of composition. However, the invention cannot be reduced to this particular example, and other photosensitizers, other annihilators and other photoinitiators can be chosen, in particular as a function of the resin chosen and the external light source chosen. Other means to limit the inhibiting effect of oxygen can also be implemented. Implementation example No. 2 • The non-linear polymerization initiated by the STTA-UC mechanism was obtained in a second practical example of composition according to the invention comprising: • as a polymerizable resin, a monomer of the acrylate type, more specifically pentaerythriol triacrylate, • as photosensitizer PS, a porphyrin, more specifically a platinium octaethylporphyrin, commonly called PtOEP • as an annihilator AN, a derivative of anthracene, more specifically a 9 , 10-diphenylanthracene, commonly abbreviated DPA, and • as PI photoinitiator, phenylbis (2,4,6-trimethylbenzoyl) phosphine oxide) commonly abbreviated BAPO. The concentration of PtOEP was 8 pmol L 1 , which is approximately 17-times lower than in Example No. 1, allowing a transmission of approximately 70% through I cm of resin at 532 nm, c is to say at the wavelength of the external excitation source. The concentration of DPA was 0.22 mmol-L ' 1 , 27-times lower than the concentration in Example No. 1 and 27-times higher than that of PtOEP. The photoinitiator, BAPO, is suitable for initiating radical polymerization. This PI photoinitiator does not absorb light at the wavelength of the external excitation source (at 532 nm), but absorbs in the spectral range 400-450 nm to absorb the secondary signal emitted by the annihilator. The concentration of PI was 32 mmol-L 1 in this example. To decrease the oxygen contained in the resin-based composition, the composition was bubbled by an inert gas, argon (Ar), before the polymerization. Then, the composition was placed in a slide culture chamber system (Lab-Tek ™) under a continuous flow of argon to reduce the redistribution of oxygen in the composition. The polymerization was carried out under micro-fabrication conditions in an inverted microscope. The intensity of the external excitation source at 532 nm was 100 mW / cm 2 Example of realization No. 3 In a third practical example, the polymerization was carried out in a transparent tank with an internal volume of 10 χ 10 χ 40 mm (width χ depth χ height). The composition according to the invention included • as a polymerizable resin, an acrylate type monomer, more specifically poly (ethylene glycol) diacrylate, • as a PS photosensitizer, a porphyrin, more specifically an octaethylporphyrin platinium, commonly known as PtOEP • as an AN annihilator , an anthracene derivative, more specifically a 9,10-diphenylanthracene, commonly abbreviated DPA, and • as photoinitiator PI, phenylbis (2,4,6-trimethylbenzoyl) phosphine oxide) commonly abbreviated BAPO. The concentration of PtOEP was this time of 7 pmol-L 1 , which is 20-times lower than in Example No. 1., the resin transmission is 51% when passing through 1 cm of resin to the wavelength of the external excitation source at 532 nm. The concentration of DPA was 0.22 mmol-L 1 , 27 times lower than the concentration in Example No. 1. The photoinitiator, BAPO does not absorb at the irradiation wavelength (532 nm), but absorbs in the spectral range 400-450 nm to absorb the secondary signal emitted by the annihilator. The concentration of PI was 30 mmol-L 1 in the example. The resin was bubbled with an inert gas, this time nitrogen (N 2 ), to decrease its oxygen content before polymerization. Then the tank was sealed to prevent the return of oxygen in the resin. The resin was exposed to an external irradiation source emitting at 532 nm with the energy illumination of approximately 50 mW-cm 2 to initiate the polymerization. Choice of photosensitizer The photosensitizer is chosen from photosensitizers having at least one of the following properties. The best results are obtained for photosensitizers having all of the following properties. The photosensitizer PS must absorb the external excitation signal in order to make maximum use of the energy of the external light source emitted over the first range of wavelengths to generate the triplet states "1PS *". It must also be as transparent as possible to the light radiation (secondary signal) emitted by the annihilator over the second wavelength range so that the energy of the secondary signal is available to the photoinitiator. For these reasons, a photosensitizer PS will be chosen comprising at least one molecule whose molar absorption coefficient over the first wavelength range is greater than at least twice, and preferably at least ten times, a coefficient of molar absorption of said molecule over the second wavelength range. In the previous example, PtOEP has a molar absorption coefficient (also called molar extinction coefficient or molar absorptivity) ε = 4.10 3 LmolAcnr 1 on the second range 400-500 nm and a molar coefficient ε = 4.17.10 4 L.mol-hcnr 1 for a wavelength of 532 nm, five times greater than the value of the molar coefficient at 532 nm. PtOEP thus absorbs ten times more the external excitation signal than the secondary signal emitted by the annihilator. In the examples used, a photosensitizer comprising a single molecule, PtOEP was used. However, it is also possible to use a photosensitizer comprising several types of photosensitizer molecules, each photosensitizer molecule having, over at least part of the first wavelength range, a molar absorption coefficient greater than at least two. times, and preferably at least ten times, the molar absorption coefficient of the same photosensitizer molecule over at least part of the second wavelength range. We thus choose molecules with neighboring absorption spectra, having a large absorption coefficient on parts close to the first range of wavelengths, so that it is possible to illuminate the composition with a source d excitation having a wider, more diffuse emission spectrum, of the same limited power, while having a maximum of energy of the excitation signal absorbed by one or the other of the different molecules of the photosensitizer. A composition according to the invention is more or less liquid, more or less viscous or even solid and, to be used, it is stored in a reservoir of a shape suitable for the desired use or deposited on a substrate. So that the composition can be polymerized over a thickness d, the external excitation signal must be able to penetrate into the composition over the thickness d with sufficient energy. For this purpose, a concentration of photosensitizer Cps is chosen which is less than Cpsmax = log 10 (0.3) / (e * d), and preferably less than Cpsmax = - logi 0 (0.7) / (e * d) , on the first wavelength range, where ε is the molar extinction coefficient (also called molar absorptivity or molar absorption coefficient) of the photosensitizer and d is the thickness of the composition to be photopolymerized. With such a concentration, 30% and preferably 70% of the energy of the excitation signal penetrates at least up to a thickness d inside the composition. In the example of PtOEP, preferably Cpsmax = 3.7 pmol.L ' 1 for d = 1 cm, PtOEP having a molar extinction coefficient equal to ε = 4.1710 4 L.molbcm- 1 . If necessary, the optical system can also be immersed in the composition to be polymerized, liquid, to manufacture objects whose thickness is greater than d. In addition, the photosensitizer molecule must have a quantum yield of triplet state generation greater than 0.1, and preferably greater than 0.5. For example, that of PtOEP is 0.5 in a polystyrene matrix and close to unity in solution. Also, the photosensitizer molecule is chosen to have a lifetime in the triplet state greater than 10 ps. This allows efficient energy transfer by diffusion and collision with the AN annihilator molecules. By way of example, PtOEP in the triplet state has a lifetime of 91 ps in polystyrene matrix and of 50 μm in a deoxygenated solvent. The molecule of the photosensitizer PS is chosen so that an energy level of the molecule of the photosensitizer in the triplet state "3PS *" is greater than an energy level of the molecule of the annihilator in the triplet state " 3 AM* "and so that an energy level of the photosensitizer molecule in singlet state" 1PS * "is less than an energy level of the molecule of annihilator in singlet state" 1 AM* ". This makes it possible to obtain an efficient energy transfer from the triplet state "3PS *" to the triplet state "3 AM*" and to limit, or even prohibit, an energy transfer from the singlet state "1 AM*" towards the singlet state "1PS *". Among the PS photosensitizer molecules capable of being used in the context of the invention, there may be mentioned in particular: • metalloporphyrins, for example a platinium octaethyi-porphyrin (PtOEP), a paladium octaethyl-porphyrin (PdOEP), a paladium-tetratolylporphyrin (PdTPP), a platinum (ll) tetraphenyltetrabenzoporphyrin, PtTPBP) 10-dinaphthylanthracene (PdMeTPP), a paladium-meso-tetraphenyltetrabenzoporphyrin 1 (PdPh4TBP), a 1,4,8,11,15,18,22,25-octabutoxyphthalocyanine (PdPc (OBu) s), • the molecule Ir (ppy ) 3, with ppy a 2-phenylpyridine, • the molecules comprising a radical Ru (dmb) 3-, Ru-polypyridyl- for example the molecule Ru (dmb) 3-An, • the molecule 2, 3-butanedione (or diacetyl ), • or a combination of several of the above molecules. These molecules are likely to be excited, depending on the molecule, with an emitting source at a wavelength in the visible or near infrared. For example at wavelengths of 450 nm, 532 nm, 635 nm, 725 nm, depending on the molecules. Other molecules could be optimized for other wavelengths in the near UV, the visible or the near infrared. Choice of annihilator The AN annihilator is chosen from annihilators having at least one of the following properties, the best results in the context of the invention being obtained for annihilators having all of the following properties. The AN annihilator must be as transparent as possible to the external excitation signal so that in no case does the annihilator alone emit more than 10% of the photons, and preferably more than 1% of the photons, emitted by the STTA-UC mechanism in the presence of the photosensitizer PS. The annihilator (AN) has a relative molar absorption coefficient over the first range of wavelengths of less than 20%, and preferably less than 10%. Preferably, a molar concentration of the annihilator AN is greater than at least 10 times and preferably at least 30 times the molar concentration of the photosensitizer. This makes it possible to obtain a good transfer of energy between the triplet state "3PS *" and the triplet state "3 AM*". Preferably, the annihilator AN must have a quantum emission yield greater than 10% and preferably 50%. For example, DPA has a fluorescence yield of 0.9 in a solution of cyclohexane. Also, the molecule of the AN annihilator is chosen to have a lifetime in the triplet state greater than 10 ps. This makes it possible to have a collision probability between two “3 AM*” molecules sufficient to have effective annihilation between two “3 AM*” molecules to obtain a “1AM” molecule in the excited singlet state with two photons. More preferably, the molecule AN is chosen to have an energy level in the singlet state "1 AM*" less than twice its energy level in the triplet state "3 AM*". This facilitates the annihilation between two “3 AM*” molecules to obtain a “1AM” molecule in the excited singlet state with two photons. In the examples described above, an annihilator comprising a single molecule, for example DPA, was used. However, it is also possible to use an annihilator comprising a plurality of molecules, a relative molar absorption coefficient of each molecule of the acceptor being less than 20% and preferably less than 10% over at least part of the first wavelength range. AM molecules are thus chosen that are as transparent as possible to the external excitation signal so that the energy transmitted by the external excitation signal is absorbed essentially by the photosensitizer and not by the annihilator. Using several molecules of annihilator AN allows to have a probability of collision between two molecules "3 AM*" sufficient to have an effective triplet-triplet annihilation by diffusion and collision between two molecules "3 AM*" to obtain a molecule "1AM" in the excited two-photon singlet state. Among the molecules of annihilator AN capable of being used in the context of the invention, there may be mentioned in particular: • anthracene (An) or one of its derivatives, for example 9, 10-diphenylanthracene (DPA), 9,10dimethylanthracene (DMA), 9, 10-dip-tolyanthracene (DTA), 2-chloro- 9,10-dip-tolylanthracene (DTACI, 2-carbonitrile-9,10-dip-tolylanthracene (DTACN), 2-carbonitrile-9,10dinaphthylanthracene (DNACN), 2-methyl-9,10-dinaphthylanthracene (DNAMe ), 2-chloro-9,10dinaphthylanthracene (DNACI), 9,10bis (phenylethynyl) anthracene (BPEA), 2-chloro9,10bis (phenylethynyl) anthracene (2CBPEA), 5,6,11,12-tetra -phenylnaphthacene (rubrene), pyrene or perylene • a derivative of anthracene and a derivative of benzofuran, for example 1,3diphenylisobenzofurane (DPBF) • the molecule 2, 5-diphenyloxazole (PPO). These molecules are capable of emitting a secondary signal, an emission peak of which is centered, depending on the molecule, on the following wavelengths: 380-400 nm, 435-440 nm, 446-464 nm, 470-475 nm , 550-600 nm, ... Choice of a photosensitizer / annihilator pair And preferably, good compatibility between photosensitizer and annihilator can be obtained with a phtosensitizer / annihilator pair among the following pairs: • a compound comprising a ruthenium- (polypyridyl) 3- (Ru (dmb) 3-) radical, for example the ruthenium- (polypyridyl) 3-anthracene compound associated with 9,10-diphenylanthracene (DPA) • a lr compound (ppy ) 3, where ppy is a 2-phenylpyridine, associated with pyrene, • a paladium-meso-tetraphenyltetrabenzoporphyrin 1 (PdPhUBP) associated with 5,6,11,12Tetraphenyl-naphthacene (rubrene) • 1,4,8,11, 15,18,22,25-octabutoxyphthalocyanine (PdPc (OBu) s) associated with 5,6,11,12Tetraphenyl-naphthacene (rubrene) • a paladium-retrantantraporphyrin (PdTAP) associated with 5,6,11,12-Tetraphenylnaphthacene ( Rubrene), • an octaethyl-porphyrin platinum (PtOEP) associated with 9,10-diphenylanthracene (DPA) • a paladium-meso-tetratolylporphyrin (PdTPP) associated with 9, 10-diphenylanthracene (DPA) • a palladium-tetrabromophenylporphyrin associated with 9,10-diphenylanthracene (DPA) • a palladium-tetramethylphenylporphyrin (PdMeTPP) associated with a 9,10-dinaphthylanthracene, by example 2-carbonitrile-9,10-dinaphthylanthracene (DNACN), 2-methyl-9,10dinaphthylanthracene (DNAMe) or 2-chloro-9,10-dinaphthylanthracene (DNACI) • a platinum (ll) -tetraphenyltetrabenzoporphyrine (PtTPB ) associated with perylene, 9,10bis (phenylethynyl) -anthracence (BPEA), • a molecule 2,3-butanedione (diacetyl) associated with 2,5-diphenyloxazole (PPO). Choice of photoinitiator The PI photoinitiator must not absorb the external excitation light signal so that a greater part of the energy of this signal can be absorbed by the photosensitizer. On the other hand, the photoinitiator must absorb the energy of the secondary signal emitted by the annihilator. For this, the absorption spectrum of the photoinitiator must significantly overlap (at least 80%) of the fluorescence emission spectrum of the annihilator in the singlet state. Thus, in the examples described above, camphorquinone (CQ) and BAPO absorb the secondary signal emitted by the annihilator well over the 400-500 nm range. The photoinitiator must also be adapted to the resin to be polymerized. Thus, in the example described above, camphorquinone (CQ) and BAPO generate free radicals suitable for initiating the polymerization of the chosen resin of acrylate type, more specifically pentaerythriol triacrylate or diacrylate of poly (ethylene glycol). However, other photoinitiators can be used, for example a photoinitiator suitable for generating, as appropriate, acids or bases suitable for initiating the ionic polymerization of certain resins. Alternatively, the photoinitiator can be combined with other co-initiating molecules, such as camphorquinone when combined with tertiary amines. More preferably, the photoinitiator molecule is chosen to have an energy level in the triplet state " 3 PI *" greater than the energy level in the triplet state " 3 PS *" of the photosensitizer and at the level of energy in the triplet state " 3 AN *" of the annihilator. This avoids a possible unwanted reaction between the molecule " 3 P1 *" and the molecule " 3 PS *" or between the molecule " 3 PI *" and the molecule " 3 AN *". For example, camphorquinone has an energy level in the triplet state of the order of 2.2 eV, which is at least 0.3 eV more than PtOEP (including the energy level at l triplet state is around 1.9 eV) and the DPA (whose energy level in triplet state is around 1.77 eV). As another example, bis (acyl) phosphine oxide (BAPO), whose energy level in the tripled state is of the order of 2.6 eV or at least 0.5 eV of more than PtOEP or DPA. In another variant, the same molecule can be used for the annihilator and the photoinitiator. Solutions for reducing the effects of the oxygen present in the composition according to the invention. The methods for reducing the concentration of molecular oxygen in the composition according to the invention are in particular: • degassing of the resin under vacuum by freeze-thaw cycles, • bubbling an inert gas, for example argon (Ar), nitrogen (N 2 ), carbon dioxide (CO 2 ) or the like through the resin, • the addition to the composition of a strong reducing agent in high concentration which reacts with oxygen, for example various sulphites. Using the methods described above, it is preferable that the tank containing the polymerizable resin be sealed or that the resin be polymerized under an inert atmosphere due to the return of oxygen by diffusion. The first two methods consist of a step of eliminating the oxygen present in the composition, an initialization step carried out before a step of polymerization of the composition. The third method consists in adding an antioxidant to the composition according to the invention. One or more types of antioxidant molecules can be chosen which react with singlet oxygen resulting from the deactivation of the triplet states of PS, AN and PI by molecular oxygen. The antioxidant molecule and its concentration are chosen so that the singlet oxygen reacts preferentially with the antioxidant. At the start of the exposure of the composition to the external excitation signal, the antioxidant reduces the concentration of singlet oxygen and consequently the concentration of molecular oxygen dissolved in the resin also decreases. As soon as the oxygen concentration is sufficiently reduced for its interaction with the triplet states of the components ( 3 PS *, 3 AN * and 3 PI *) to be negligible, the STTA-UC phenomenon and the polymerization start. The use of the antioxidant in the formulation induces a delay time (induction time) in the polymerization. Antioxidants can have several functions, more precisely they can be both antioxidants and annihilators, antioxidants and photoinitiators, antioxidants and photosensitizers or antioxidants and polymerizable monomers. In particular, the derivatives of anthracene, pyrene, rubrene may be used in the composition as both annihilators and antioxidants. The antioxidant is chosen so that it absorbs at least 5 times less than the other compounds in the first and in the second wavelength ranges, with the exception of the antioxidants which have multiple functions. In other words, the antioxidant is chosen so that its molar absorption coefficient is at least five times lower than the molar absorption coefficient of the photosensitizer (PS), the molar absorption coefficient of the annihilator (AN) and the photoinitiator molar absorption coefficient (PI) on the first wavelength range and on the second wavelength range. Preferably, the antioxidant is chosen so that it does not react either with the photosensitizers, annihilators and photoinitiators or with these components in their triplet or singlet states. The antioxidants capable of being used in a composition according to the invention are in particular: • polycyclic aromatic hydrocarbon derivatives, for example from anthracene, pyrene, rubrene, naphthalene, • isobenzofuran derivatives, such as 1,4-diphenylisobenzofuran, • furan derivatives, such as 2,5- dimethylfurane, • unsaturated carboxyic acids, for example oleic acid, • tertiary amines and their derivatives, such as for example N-methyldiethanolamine (MDEA) or triethylamine (TEA), • sulfites. Choice of polymerizable resin Finally, the resin used in the context of the invention can be any photopolymerizable resin, whatever the mechanism to be used to trigger the polymerization (radical mechanism, ionic mechanism, etc.). In the context of the invention, a photoinitiator will then be chosen which is suitable for the mechanism to be used to initiate the polymerization and which is more specifically suitable for the resin to be polymerized, then a photosensitizer / annihilator pair compatible with the photoinitiator and suitable for use will be chosen. implementation of a STTA-UC mechanism. Resins which may be used include, for example: • monomers, oligomers or polymers which can be polymerized by the radical route by addition or crosslinking mechanisms such as: - acrylated monomers, such as acrylates, polyacrylates, methacrylates, or - acrylated oligomers such as unsaturated amides, or - methacrylated polymers, polymers which have a hydrocarbyl skeleton and pendant peptide groups with a functionality which can be polymerized by free radicals, or vinyl compounds such as styrenes, diallyl phthalate, divinyl succinate, divinyl adipate and divinyl phthalate, or mixtures of several of the above monomers, oligomers or polymers, · cationically polymerizable monomers and oligomers and polymers crosslinkable by the cationic route, for example epoxy resins such as monomeric epoxides and polymeric epoxides having one or more epoxy groups, vinyl ethers, cyanate esters, ... and mixtures of several of these compounds.
权利要求:
Claims (22) [1" id="c-fr-0001] 1. Light-curing composition comprising at least: • a polymerizable resin, • a photosensitizer (PS), • an annihilator (AN), and • a photoinitiator (PI), said photosensitizer (PS) and said annihilator (AN) being adapted to implement an absorption reaction together, by the photosensitizer (PS), of two photons of a light excitation signal received from an external excitation source emitting over a first wavelength range, followed by an additive energy conversion reaction by annihilation of triplets (STTA-UC) to obtain an excited annihilator (1AN *) whose photonic energy over a second wavelength range is greater than a photonic energy of the excitation signal, said excited annihilator (1AN *) and said photoinitiator (PI) being adapted to implement an energy transfer mechanism between said annihilator and said photoinitiator to produce an excited photoinitiator (3PI *) capable of generating at least one initiator of polymerization capable of causing a polymerization reaction of the resin. [2" id="c-fr-0002] 2. Composition according to claim 1 in which the photosensitizer (PS) comprises at least one molecule adapted to pass from a singlet state (PS) to a triplet state (3PS *) when it absorbs the photonic energy of the signal. external excitement. [3" id="c-fr-0003] 3. Composition according to claim 2 in which the annihilator (AN) comprises molecules suitable for: • to pass from a singlet state (1AN *) to a triplet state (3AN *) when they receive an energy during an interaction with a molecule of the photosensitizer in the triplet state (3PS *), and • to pass from a triplet state (3AN *) to a singlet state (1AN *) with two photons during a collision between molecules of annihilator and • implement an energy transfer mechanism to excite the photoinitiator (PS) of polymerization of resin. [4" id="c-fr-0004] 4. Composition according to one of the preceding claims, in which the photopolymerizable resin comprises: • monomers, oligomers or polymers which can be polymerized by the radical route by addition or crosslinking mechanisms such as: - acrylated monomers, such as acrylates, polyacrylates, methacrylates, or - acrylated oligomers such as unsaturated amides, or - methacrylated polymers, polymers which have a hydrocarbyl skeleton and pendant peptide groups with a functionality which can be polymerized by free radicals, or vinyl compounds such as styrenes, diallyl phthalate, divinyl succinate, divinyl adipate and divinyie phthalate, or mixtures of several of the preceding monomers, oligomers or polymers, • cationically polymerizable monomers and oligomers and polymers crosslinkable by the cationic route, for example epoxy resins such as monomeric epoxides and polymeric epoxides having one or more epoxy groups, vinyl ethers, cyanate esters, ... and mixtures of several of these compounds. [5" id="c-fr-0005] 5. Composition according to one of the preceding claims in which the photosensitizer is chosen from photosensitizers having at least one of the following properties: The photosensitizer comprises at least one molecule whose molar absorption coefficient over the first range of wavelengths is greater than at least twice, and preferably at least ten times, a molar absorption coefficient of said molecule over the second wavelength range. • the photosensitizer comprises a plurality of photosensitizer molecules, each photosensitizer molecule having, over at least part of the first wavelength range, a molar absorption coefficient greater than at least twice, and preferably at least ten times the molar absorption coefficient of the same photosensitizer molecule over at least part of the second wavelength range. • the photosensitizer has a molar concentration Cps lower than Cpsmax = - logi 0 (0.3) / (sd) over the first wavelength range, where s is the molar extinction coefficient of the photosensitizer and d is the thickness of the composition to be photopolymerized, and / or • the photosensitizer molecule has a lifetime in the triplet state greater than 10 ps, and / or • an energy level of the photosensitizer molecule in the triplet state is greater than an energy level of the molecule of the annihilator in the triplet state and an energy level of the molecule of the photosensitizer in the singlet state is less than an energy level of the molecule of the annihilator singlet. [6" id="c-fr-0006] 6. Composition according to one of the preceding claims, in which the photosensitizer is chosen from: • metalloporphyrins, the photosensitizer being for example a platinum octaethylporphyrin (PtOEP), a palladium octaethyl-porphyrin (PdOEP), a palladium-tetratolylporphyrin (PdTPP), a platinum (ll) -tetraphenyltetrabenzoporphyrin (PtTP) 9, 10dinaphthylanthracene (PdMeTPP), a paladium-meso-tetraphenyltetrabenzoporphyrin 1 (PdPh4TBP), a 1,4,8,11,15,18,22,25-octabutoxyphthalocyanine (PdPc (OBu) s), • the molecule Ir (ppy ) 3, with ppy a 2-phenylpyridine, • the molecules comprising a radical Ru (dmb) 3-, Ru-polypyridyl- for example the molecule Ru (dmb) 3-An, • the molecule 2,3-butanedione, • or a combination of several of the above molecules. [7" id="c-fr-0007] 7. Composition according to one of the preceding claims in which the annihilator (AN) is chosen from annihilators having at least one of the following properties: • the annihilator (AN) has a relative molar absorption coefficient over the first wavelength range of less than 20%, and preferably less than 10%, and / or • a molar concentration of the annihilator is greater at least 10 times and preferably at least 30 times the molar concentration of the photosensitizer, and / or • an energy level of the annihilator molecule in the singlet state is less than twice the energy level of the said molecule of annihilator in the triplet state and / or • the molecule of the annihilator has a lifetime in the triplet state greater than 10 ps, and / or • the annihilator comprises a plurality of molecules, the coefficient relative molar absorption of each molecule of the annihilator being less than 20% and preferably less than 10% over at least part of the first range of wavelengths. [8" id="c-fr-0008] 8. Composition according to one of the preceding claims in which the annihilator is chosen from: • anthracene (An) or one of its derivatives, for example a 9,10-diphenylanthracene (DPA), 9,10dimethylanthracene (DMA), a 9,10-dip-tolyanthracene (DTA), a 2-chloro- 9,10-dip-tolylanthracene (DTACI, a 2-carbonitrile-9,10-dip-tolylanthracene (DTACN), a 2-carbonitrile-9,1022 dinaphthylanthracene (DNACN), a 2-methyl-9,10-dinaphthylanthracene ( DNAMe), a 2-chloro-9,10dinaphthylanthracene (DNACI), a 9,10bis (phenylethynyl) anthracene (BPEA), a 2-chloro9,10bis (phenylethynyl) anthracene (2CBPEA), a 5,6,11,12- tetra-phenylnaphthacene (rubrene), a pyrene or a perylene, • a combination of an anthracene derivative and an isobenzofuran derivative, for example 1,3-diphenylisobenzofuran (DPBF), • a molecule 2 , 5-diphenyloxazole (PPO). [9" id="c-fr-0009] 9. Composition according to one of the preceding claims in which the annihilator and the photoinitiator are identical. [10" id="c-fr-0010] 10. Composition according to one of the preceding claims, also comprising an antioxidant. [11" id="c-fr-0011] 11. Composition according to claim 10, in which the photosensitizer (PS), the annihilator (AN), and / or photoinitiator (PI) have antioxidant properties. [12" id="c-fr-0012] 12. Composition according to claim 11, in which a molar absorption coefficient of the antioxidant is at least five times lower than the molar absorption coefficient of the photosensitizer (PS), than the molar absorption coefficient of the annihilator (AN ) and the photoinitiator molar absorption coefficient (PI) over the first wavelength range and over the second wavelength range. [13" id="c-fr-0013] 13. Material obtained by photopolymerization of a composition according to any one of the preceding claims. [14" id="c-fr-0014] 14. Material according to the preceding claim having the shape of an object in thin layer such as a film or a solid object in three dimensions. [15" id="c-fr-0015] 15. A three-dimensional printing process, comprising a step of transforming a volume of composition according to one of claims 1 to 12 by irradiation of said volume. [16" id="c-fr-0016] 16. The method of claim 15 wherein the irradiation of the volume of composition to be transformed is carried out by an excitation source emitting a light signal with a power of less than 1000 W / cm 2 , and preferably less than 1 W / cm 2 , on the first wavelength range. [17" id="c-fr-0017] 17. Method according to one of claims 15 to 16 during which the irradiation of the volume of composition is carried out by a three-dimensional photolithography technique, a three-dimensional holographic projection technique or a technique called direct writing. by laser. [18" id="c-fr-0018] 18. Method according to one of claims 15 to 17, also comprising an initialization step during which oxygen molecules contained in the composition are eliminated. [19" id="c-fr-0019] 19. Method according to one of claims 15 to 17 during which the irradiation of the volume of composition is carried out under a flow of inert gas, for example argon or nitrogen. [20" id="c-fr-0020] 20. A three-dimensional printing device comprising a reservoir containing a composition according to one of claims 1 to 12 and an external excitation light source arranged to irradiate a predefined volume of composition inside the reservoir, the irradiated volume. having a thickness 15 greater than 0.5 µm and preferably less than 1 cm. [21" id="c-fr-0021] 21. Printing device according to the preceding claim, wherein the composition is liquid. [22" id="c-fr-0022] 22. Device according to the preceding claim wherein the external excitation light source comprises an optical irradiation system immersed in the liquid resin and means for moving the optical system in the liquid resin.
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同族专利:
公开号 | 公开日 CN111164108A|2020-05-15| EP3661974A1|2020-06-10| US20210189156A1|2021-06-24| WO2019025717A1|2019-02-07| JP2021502466A|2021-01-28| KR20200037815A|2020-04-09| FR3069862B1|2019-11-01|
引用文献:
公开号 | 申请日 | 公开日 | 申请人 | 专利标题 FR2567668A1|1984-07-16|1986-01-17|Cilas Alcatel|Device for producing a model of an industrial part.| EP0535828A1|1991-09-30|1993-04-07|Zeneca Limited|Photostereolithographic process| WO2017093530A1|2015-12-02|2017-06-08|Adolphe Merkle Institute, University Of Fribourg|Optically upconverting liquid-filled polymeric materials| US6267913B1|1996-11-12|2001-07-31|California Institute Of Technology|Two-photon or higher-order absorbing optical materials and methods of use| US7118845B2|2000-06-15|2006-10-10|3M Innovative Properties Company|Multiphoton photochemical process and articles preparable thereby| US20040198857A1|2003-04-01|2004-10-07|Dejneka Matthew J.|Photochemical reactions using multi-photon upconverting fluorescent inorganic materials| CN102301277B|2008-12-05|2013-07-17|3M创新有限公司|Three-dimensional articles using nonlinear thermal polymerization| US20110021653A1|2009-07-22|2011-01-27|Lixin Zheng|Hydrogel compatible two-photon initiation system| CN103483495B|2013-09-16|2016-08-17|复旦大学|Photo-deformable macromolecular material based on triplet state-triplet state annihilation up-conversion luminescence|WO2021154895A1|2020-01-28|2021-08-05|Quadratic 3D, Inc.|Three-dimensionalprinting including upconversion photopolymerization| EP3909747A4|2020-05-12|2021-11-17|Tiger Coatings Gmbh & Co Kg|Thermosetting material for use in a 3d printing process| WO2021247930A1|2020-06-03|2021-12-09|Quadratic 3D, Inc.|Volumetric three-dimensional printing methods including a light sheet and systems| FR3112345A1|2020-07-09|2022-01-14|Universite Claude Bernard Lyon 1|Initiator molecule for a nonlinear absorption reaction, photopolymerizable composition activatable by two-photon absorption, and associated 3D printing process.|
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2019-02-08| PLSC| Publication of the preliminary search report|Effective date: 20190208 | 2019-08-22| PLFP| Fee payment|Year of fee payment: 3 | 2020-08-21| PLFP| Fee payment|Year of fee payment: 4 | 2021-08-25| PLFP| Fee payment|Year of fee payment: 5 |
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申请号 | 申请日 | 专利标题 FR1757401A|FR3069862B1|2017-08-02|2017-08-02|PHOTOPOLYMERIZABLE COMPOSITION, MATERIAL OBTAINED BY POLYMERIZATION OF SUCH COMPOSITION, AND 3D PRINTING METHOD USING SUCH A COMPOSITION| FR1757401|2017-08-02|FR1757401A| FR3069862B1|2017-08-02|2017-08-02|PHOTOPOLYMERIZABLE COMPOSITION, MATERIAL OBTAINED BY POLYMERIZATION OF SUCH COMPOSITION, AND 3D PRINTING METHOD USING SUCH A COMPOSITION| EP18752608.2A| EP3661974A1|2017-08-02|2018-07-31|Photopolymerisable composition, material obtained by polymerising such a composition and 3d printing method using such a composition| US16/636,008| US20210189156A1|2017-08-02|2018-07-31|Photopolymerisable composition, material obtained by polymerising such a composition and 3d printing method using such a composition| CN201880064139.9A| CN111164108A|2017-08-02|2018-07-31|Photopolymerizable composition, material obtained by polymerizing the composition, and 3D printing method using the composition| JP2020528515A| JP2021502466A|2017-08-02|2018-07-31|A photopolymerizable composition, a material obtained by polymerizing the composition, and a 3D printing method using the composition.| KR1020207005599A| KR20200037815A|2017-08-02|2018-07-31|Photopolymerizable composition, material obtained by polymerization of such composition, and 3D printing method using such composition| PCT/FR2018/051963| WO2019025717A1|2017-08-02|2018-07-31|Photopolymerisable composition, material obtained by polymerising such a composition and 3d printing method using such a composition| 相关专利
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