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    • 专利摘要:
    A method of producing a solar radiation absorber element for a concentrating solar thermal power plant comprising forming a selective coating (1) on an outer surface (2) of a steel substrate (3), forming the selective coating (1) comprises the following successive steps: - providing a substrate (3) made of steel having a chromium content of between 6% and 12.5% by weight, - carrying out a heat treatment, so as to form a layer of oxide (4) on the surface of the substrate (3).
    公开号:FR3014906A1
    申请号:FR1302935
    申请日:2013-12-13
    公开日:2015-06-19
    发明作者:Gatien Fleury；Raphael Couturier；Olivier Sicardy；Carole Mollard；Benoit Boulay；Jean Marc Duhamel
    申请人:Commissariat a lEnergie Atomique CEA；Salzgitter Mannesmann Precision Etirage SAS；Commissariat a lEnergie Atomique et aux Energies Alternatives CEA；
    IPC主号:
    专利说明:

    [0001] Process for producing a solar radiation absorber element for a concentrated solar thermal power station, a solar radiation absorber element
    [0002] TECHNICAL FIELD OF THE INVENTION The invention relates to a solar radiation absorber element for a solar thermal concentration plant and to its method of production, in particular with the formation of a selective coating on an external surface of a substrate. in steel. STATE OF THE ART A concentrating solar thermal power station, also known as a "Concentrating Solar Power Plant" (CSP), is a central unit for concentrating the sun's rays by means of mirrors for heating a heat-transfer fluid. The coolant then serves as a hot source in a thermodynamic cycle to produce electricity. The concentration of solar radiation makes it possible to reach higher temperatures and to benefit from a significant thermodynamic conversion. There are different techniques for concentrating solar radiation, for transporting and possibly storing heat, and for converting heat into electricity. In any case, one of the essential elements of a concentrated solar power plant is the solar radiation absorber element which forms part of the receiver. In order to maximize the efficiency of the absorber, it generally comprises a coating, called selective coating or selective treatment. The selective coating is intended to allow maximum absorption of incident solar energy while re-emitting the least possible infrared radiation (principle of the black body). In particular, such a selective coating is considered perfect if it absorbs all wavelengths below a cut-off wavelength and reflects all wavelengths longer than this same cut-off wavelength. By way of example, the international application WO 2009/051595 proposes a selective solar coating covering the outer surface of a solar radiation absorber tube, typically made of stainless steel, and comprising a stack of several layers each having a function and a thickness determined by optical simulation. In a particular embodiment, the solar radiation absorber tube is successively covered by a succession of bilayers composed of a layer of material reflecting the IR radiation and a layer of material absorbing solar radiation, followed by the application of an anti-reflective layer. The solar radiation absorber tube is, for example, stainless steel of austenitic structure, for example of the AISI 316, 321, 347 or 304L type. US Pat. No. 4,268,324 and the article "Influence of oxidation and roughness on the radiative characteristics of stainless steels" by Ph. Demont (Journal de Physique, Colloque C1, Volume 42, 1981) describe the use of a heat treatment to obtain an oxide layer on the surface of stainless steel substrates such as AISI 321, 304 and 316. The oxide layer acts as a selective coating. The temperatures used for the heat treatment are between about 300 ° C. and about 1000 ° C. US Pat. No. 4,268,324 specifies that the optimum temperature for formation of the selective coating for AISI 321 stainless steel is 570 ° C. It is at this temperature that the absorption of the oxide layer obtained is the highest, while keeping a relatively low emissivity.
    [0003] International application WO 2012/168577 also describes the formation of an oxide layer on the surface of a stainless steel substrate by heat treatment. The heat treatment temperatures are between 550 ° C and 650 ° C. No. 4,097,311 discloses forming an oxide layer on the surface of a stainless steel substrate by dipping in an oxidizing bath at a temperature between 70 ° C to 120 ° C. All these types of selective coatings do not simultaneously meet the needs of performance and durability, especially in an oxidizing atmosphere. Indeed, the coatings 10 currently commercially available, for high operating temperatures (typically greater than 400 ° C.), often require the use of a vacuum protection envelope, which on the one hand increases the manufacturing costs. and, on the other hand, poses stability problems over time. In addition, the substrates thus obtained present risks of rupture by thermal fatigue, which reduces their service life. OBJECT OF THE INVENTION The object of the invention is to propose a solar radiation absorber element for a concentrated solar thermal power plant, comprising a high-performance, durable and stable selective coating, not only for operating temperatures higher than 50.degree. 400 ° C, but also in an oxidizing atmosphere such as air. The absorber element must also have a low risk of thermal fatigue failure. According to the invention, this object is achieved by a method for producing a solar radiation absorber element, for a solar thermal concentration plant, comprising the formation of a selective coating on an outer surface of a steel substrate, the formation of the selective coating comprises the following successive steps: providing a steel substrate having a chromium content of between 6% and 12.5% by weight, performing a heat treatment, so as to form an oxide layer on the surface of the substrate. According to the invention, this object is also achieved by a solar radiation absorber element for concentrating solar thermal power plant, obtainable by such an embodiment method. BRIEF DESCRIPTION OF THE DRAWINGS Other advantages and features will emerge more clearly from the following description of particular embodiments of the invention given by way of nonlimiting example and represented in the accompanying drawings, in which: FIGS. to 4 show schematically and in section different steps of a method of producing a solar radiation absorber element, according to the invention. DESCRIPTION OF PREFERRED EMBODIMENTS OF THE INVENTION It is proposed to provide a solar radiation absorber element which is particularly suitable for concentrating thermal solar power plants and overcomes the drawbacks of the prior art. As illustrated in FIGS. 1 to 4, the method for producing a solar radiation absorber element, for a concentrated solar thermal power plant, comprises the formation of a selective coating 1 on an outer surface 2 of a substrate 3 in steel, forming the selective coating 1 comprising the following successive steps: providing a substrate 3 made of steel, performing a heat treatment (arrows F1 in FIG. 2), so as to form an oxide layer 4 on the surface of the substrate 3.
    [0004] The steel used in the composition of the substrate, on which the selective coating is formed, is specifically selected. Preferably, the steel is a so-called "high alloy" steel, that is to say that it contains an alloying element present at more than 5% by weight relative to the total weight of the steel.
    [0005] Compared to stainless steels, high alloyed steels have better thermal conductivity, lower thermal expansion coefficient and better mechanical properties. Advantageously, these properties make them less sensitive to thermal fatigue and make it possible to have better transmission of heat from outside the tube to the coolant. Preferably, the steel has a chromium content of between 6% and 12.5% by weight, and even more preferably between 6% and 11.5% by weight and even more preferably between 6% and 10.5% by weight. weight. By chromium content of a steel is meant the percentage by weight of chromium, based on the total weight of the elements constituting the steel. This is the grade or minimum percentage generally reported for a particular grade of steel. The use of such steel improves heat conduction over stainless steel. Advantageously, these steels have a lower thermal expansion, which makes it possible to limit the thermal stresses and thus to reduce fatigue failure. On the other hand, the steel of the substrate 2 may more specifically be selected from steels having a nickel content of less than 078% by weight, and preferably from steels having a nickel content of less than 0.5%.
    [0006] Advantageously, the presence of nickel in these percentages makes it possible to increase the mechanical strength of the substrate. The steel also has an aluminum content of less than 1% by weight, and even more preferably less than 0.04%. The steel of the substrate 2 is advantageously chosen from the steels designated X10CrAlSi7, X11CrMo9-1, X10CrMoVNb9-1, X10CrWMoVNb9-2 and X11CrMoVVVNb9-1-1 which respectively correspond to the steels defined by 1.4713, 1.7386, 1.4903, 1.4901 and 1.4905 according to the European numerical system (EN 10027-2), and among T9 (K90941), T91 (K90901), T92 (K02460), T911 (K91061) and T122 (K91271) ASTM standards (UNS ). The steel may also be selected from the steels designated X20CrMoV11-1, X20CrMoV12-1 and X19CrMoNbVN11-1 which respectively correspond to the steels defined by 1.4922, 1.7175 and 1.4913 according to the European numerical system DIN (standard EN 10027-2). ). According to a preferred embodiment, the composition of the steel is given in the table below: (% by weight) C Mn Si Cr Mo VW Nb N Al Ti Ni Min 0.07 0.2 0.1 6 0, 2 0 0 0 0 0 0 0 Max 0.23 1.30 1 11.5 2.3 0.4 2.5 0.6 0.08 0.04 0.1 0.5 Table 1 Such a proportion in chromium in steel makes it possible to obtain a high alloyed steel. Advantageously, such a proportion of chromium makes it possible to obtain an oxide layer with improved optical properties, mechanical strength and stability over time. The presence of carbon, manganese, molybdenum, vanadium and tungsten, in these proportions, in the substrate makes it possible to improve the mechanical properties of the oxide layer obtained by oxidation of the substrate.
    [0007] The steel may also contain impurities, for example, lead, tin, sulfur, phosphorus, arsenic, antimony. By impurity means an element present at less than 0.1% relative to the total weight of the steel. The remainder of the percentages by weight correspond to the weight percentage of iron. The alloy contains at least 50% by weight of iron. In addition, since the steels used have good thermal conductivity and a low coefficient of expansion, ie of the order of 30% less than that of austenitic stainless steels, the risks of thermal fatigue failure during use will thus be limited. . The steels used to produce the solar radiation absorber element have a much higher corrosion resistance to low alloy alloys, especially comprising between 1 and 5% of chromium, such as for example 10CrMo9-10 steel; the mechanical properties are in addition also significantly improved. Advantageously, these alloys are more resistant to heat, which makes it possible to reduce the thicknesses of the substrate used, and to reduce the thermal gradients as well as the risks of rupture by thermal fatigue. Preferably, the steel substrate 3 has a thickness of between 1 mm and 7 mm. Advantageously, the use of low-thickness steel makes it possible to limit the formation of residual stresses during the heat treatment. In particular, the steel substrate 3 has an outer surface 2 on which the selective coating is made. It can be of any type of shape, suitable for use as a selective solar radiation absorber element, for a concentrated solar thermal power plant (for example a solar plant Fresnel or parabolic-cylindrical type).
    [0008] The use of a steel substrate having a chromium content of between 6% and 12.5%, and preferably between 6% and 11.5% by weight makes it possible, by means of a heat treatment, to form a layer superficial thin film intrinsically selective, on the outer surface of said substrate.
    [0009] Advantageously, this also makes it possible to form a layer of oxide stable in time which does not peel off. The presence of chromium contributes to the good mechanical properties in temperature. By intrinsically selective superficial thin film is meant a superficial thin layer which, by its intrinsic nature, is capable of absorbing a maximum of incident solar energy and of reemitting a minimum of infrared radiation. By absorbing a maximum of energy, it is meant that the superficial thin layer makes it possible to absorb at least 75% of the solar radiation. By reemitting a minimum of infrared radiation, it is meant that the emissivity of the superficial thin layer is less than 25%. Advantageously, the temperature of the heat treatment is greater than the operating temperature of the absorber element, i.e., the heat treatment temperature is above 400 ° C. The selective coating 1, also called selective treatment, thus obtained is stable under air, for operating temperatures above 400 ° C and has a long life, for many years, for example of the order of 20 years . Preferably, the heat treatment is carried out at a temperature between 400 ° C and 900 ° C. And even more preferentially, the heat treatment is carried out at a temperature of between 500 ° C. and 800 ° C. Insofar as the layer, responsible for the good optical properties of the surface, has been formed at a higher temperature than its use temperature, the oxide thus obtained, which contains mainly oxygen, iron and chromium. , is stable during its use, including for use in an oxidizing atmosphere during thermal cycling. For example, the heat treatment is carried out using a rate of temperature rise of 5 ° C / min at 1 ° C / sec, preferably 0.3 ° C / sec at 0.5 ° C / sec. The duration of the temperature plateau during the heat treatment is between 5 minutes and 240 minutes, depending on the chosen temperature and the temperature ramp used. The heat treatment step makes it possible to form, at the interface with the outer surface 2 of the substrate 3, a thin surface layer 1. This heat treatment operation is symbolized by the arrows F1 in FIG. Heat treatment is carried out under oxidizing atmosphere, preferably very weakly oxidizing. Oxidizing atmosphere generally means air, air enriched with oxygen or air enriched with water vapor. The oxidizing atmosphere contains at least 5% by volume of an oxygen precursor, for example O 2, H 2 O 3 O 3. Very weakly oxidizing atmosphere is understood to mean an atmosphere with a low CO2 content and a very low O 2 content. , the heat treatment is carried out under air. The thin surface layer 1 is, in particular, obtained by oxidation of certain elements contained in the steel component of the substrate 2. It is therefore essentially composed of oxide. Measurements made by X-ray diffraction (XRD) have particularly demonstrated that the thin surface layer is composed of iron oxides and chromium. The oxide obtained is of the type (Fe, Cr) 203. The thin surface layer 1 is in direct contact with the steel substrate 2. This thin surface layer 1 being formed by oxidation of the substrate, it has excellent adhesion compared in particular to other layers deposited by thin film deposition such as for example by physical vapor deposition (or PVD for English physical vapor deposition) or else by chemical vapor deposition (or CVD). The thickness of the oxide layer 4 formed is between 10 nm and 1000 nm, and preferably between 20 nm and 500 nm. Even more preferentially, the thickness of the oxide layer is between 50 nm and 100 nm. The thicker the oxide, the better the absorption in the range of solar radiation, but the higher the emissivity of the selective treatment will increase in the range of infra-red. Those skilled in the art will therefore choose thicknesses in the aforementioned range.
    [0010] According to a preferred embodiment, before or after the heat treatment step, a surface treatment is performed on the substrate 3 so as to obtain a roughness Ra of less than 1 μm, preferably less than 0.5 μm, according to the standard NF ISO 4287, for the outer surface 2 of the substrate 3.
    [0011] The roughness Ra of the outer surface 2 of the substrate 3, after the heat treatment, is preferably between 0.05pum and 0.5pm, which makes it possible to obtain a layer having good absorption while having a low emissivity. By good absorption is meant an absorption greater than 0.75 in the wavelength range of solar radiation, and preferably greater than 0.9, and by low emissivity, an emissivity of less than 0.25 and preferably less than 0.25. to 0.2 in the infra-red range relevant to the intended application. The lower the roughness and the lower the emissivity and absorption. A roughness of between 0.05 μm and 0.5 μm makes it possible to obtain both a low emissivity and a good absorption of the solar radiation received, while being feasible from an industrial point of view.
    [0012] For the realization of the selective coating 1 covering the outer surface 2 of the substrate 3, said outer surface 2 is therefore, beforehand, polished according to conventional polishing processes or specific shaping methods.
    [0013] Preferably, the surface treatment is a mechanical polishing or an electrolytic polishing or a chemical surface treatment. By way of example, the mechanical polishing can be carried out using a decreasing grain size polishing paper (from P220 to P1200) and a felt impregnated with a suspension of monocrystalline diamond particles having typically 3 ium in diameter. Among the shaping processes, the surface treatment can also be carried out by cold drawing of the substrate. Stretching is a step that is part of the seamless tube manufacturing process. Advantageously, stretching makes it possible both to give the tube its final dimensions and, at the same time, to structure the surface of the tube so as to increase the absorption of the absorber element. This surface treatment operation by polishing or cold drawing makes it possible, in particular, to control the roughness condition of the outer surface 2 of the substrate 3, before the heat treatment operation, and it has, in particular, an influence on the emissivity of the outer surface 3 in the infrared range. As shown in FIG. 4, according to a particular embodiment, the method comprises depositing an anti-reflection layer 5 on the oxide layer 4 on the surface of the substrate 3. The assembly composed of the thin layer surface 4 coated with the antireflection layer 5, then forms the selective coating 1 of the solar radiation absorber element. The anti-reflection layer 5 advantageously makes it possible to improve the absorption. The anti-reflection layer 5 does not emit, or very little, in the infra-red so as not to degrade the performance of the selective treatment.
    [0014] The antireflection layer 5 is, for example, a layer of silicon oxide SiO 2, alumina A1203, silicon nitride, or titanium oxide TiO 2 or a combination of these different layers or products. This layer will advantageously have a refractive index between that of the substrate and that of air. The anti-reflection layer 5 has, for example, a refractive index between 1.5 and 3.5, and preferably between 1.5 and 2.5. Advantageously, it has a very low extinction coefficient in order to avoid an increase in emissivity. Advantageously, the presence of the antireflection layer 5 must not increase by more than 5% the emissivity of the selective coating 1 of the absorber element. The thickness of the anti-reflection layer 5 is between 30 nm and 250 nm, and preferably between 50 nm and 200 nm, in order to obtain the best performances. The optimal thickness is determined according to the target wavelength at which the quarter wave filter is to be formed. The quarter wave filter is used to form destructive interference and minimize reflection. For example, the chosen wavelength will have a maximum absorption of incident solar radiation around 500 nm.
    [0015] The anti-reflection layer 5 is, for example, formed by a vacuum deposition technique, such as physical vapor deposition (sputtering or evaporation) or by chemical vapor deposition. According to a preferred embodiment, the anti-reflection layer is deposited by plasma-assisted chemical vapor deposition or PACVD for "Plasma-Assisted Chemical Vapor Deposition". The deposition by PACVD in ambient atmosphere makes it possible to produce an anti-reflection layer 5 at low cost because this deposit does not require working under vacuum. Ambient atmosphere means a pressure of the order of 1atm, i.e. of the order of 1013hPa, and a temperature of the order of 20 ° C to 25 ° C.
    [0016] The PACVD technique makes it possible in particular to deposit oxide layers having low refractive indices, such as SiO 2 layers of index n = 1.5, or high refractive indices such as TiO 2 layers of index n = 2.55. It is therefore easy, with this technique, to make a multilayer stack low cost, each layer may have a different refractive index.
    [0017] According to a particular embodiment, several layers of different index and thickness are placed on the surface of the thin oxide layer in order to form a stack making it possible to reduce the reflection. By way of example, absorptivity, emissivity and reflectance measurements have been made on an absorber element having a 1.4903 designation steel substrate, also referred to as ASTM A-213 T91 country standards. or X10CrMoVNb9-1 (EN 10216-2). The theoretical composition of the steel is given in the following table: (% by weight) C Mn Si Cr Mo V Ni Theoretical 0.07-0.14 0.3-0.6 0.2-0.5 8- 9.5 0.85-1.05 0.18-0.25 0.03-0.07 Table 2 Several measurement configurations were tested: - Sample No. 1 corresponds to the substrate T91 subjected to a treatment thermal under air for 1 hour at 600 ° C, 20 - the sample No. 2 corresponds to the sample No. 1 which has undergone, in addition to the heat treatment, a first aging step at 350 ° C. for 750 hours and a second aging step at 450 ° C. for 250 h, sample No. 3 corresponds to sample No. 2 on which an anti-reflection layer has been deposited, that is to say that the sample no. 3 corresponds to a substrate T91 subjected to heat treatment in air at 600 ° C for 1 h, then to a first aging step at 350 ° C for 750h and a second aging step at 450 ° C for 250h, and which one Anti-reflection coating has finally been deposited. Sample No. 4 corresponds to sample No. 3 which has undergone, after the deposition of the anti-reflection layer, an aging step at 350 ° C. for 250 hours. Sample No. 5 corresponds to sample No. 4 which has undergone an additional aging step at 450 ° C. for 250 hours. The unpolished substrates generally have a roughness Ra greater than 1 μm. The polished substrates were mechanically polished, giving a Ra-0.1pm roughness.
    [0018] The heat treatment is carried out at a temperature of 600 ° C., under air, for 1 hour. The heat treatment operation causes the formation, directly on the outer surface of the substrate, of an oxidized surface thin layer having an intrinsically selective character. The oxide layer obtained has a thickness between 10 nm and 1000 nm, and preferably between 20 nm and 500 nm. The anti-reflection layer 5 is deposited by PACVD at atmospheric pressure. It is SiO2 and has a thickness of the order of 80 nm.
    [0019] The total reflectivity of the substrate was measured over a wavelength range of 320nm to 10,000nm. These reflectivity measurements make it possible to calculate the absorption and emissivity quantities, which are the desired surface properties. Measurements were made in the range of visible radiation (0.32pm -2.5pm), using a Perkin Elmer lambda 950 spectrophotometer, which has a 150mm diameter integrated sphere coated with BaSO4. In the 2.5-10pm range, reflectance is measured using an Equinox 55 spectrophotometer, manufactured by Bruker, which has a gold-coated integration sphere that is highly reflective at these wavelengths. samples are listed in the following table: N ° 1 N ° 2 N ° 3 N ° 4 N ° 5 unpolished unpolished unpolished unpolished unpolished polished polished polished polished Absorption 77 72 78 73 85 82 81 81 83 81 Reflectance 23 28 22 27 15 18 19 19 17 19 Emissivity at 20 7 23 9 23 9 24 8 24 8 100 ° C Emissivity at 24 11 27 12 27 12 28 12 27 11 300 ° C Emissivity at 26 12 29 14 30 The presence of the anti-reflection layer 5 in the selective coating covering the steel substrate 3 makes it possible to obtain a gain of 7 to 9% in absorption without modifying the emissivity. the anti-reflective layer. The use of a substrate 3 having a roughness Ra of less than 0.4 μm makes it possible to obtain a selective treatment having a significantly lower emissivity than that obtained for substrates having higher roughnesses, typically greater than lpm. It has also been found that these performances are stable even after the aging stages of the solar absorber at 350 ° C. and 450 ° C. The oxide layer 4 formed on the outer surface 2 of the substrate 3 is a stable oxide layer at temperatures above the operating temperature of the solar radiation absorber element (typically greater than 400 ° C.) and under oxidizing conditions (especially under air). Thus, the formation of such a thin surface layer allows the selective coating, which includes it, to be efficient, durable and stable for use temperatures up to typically 500 ° C, which is the conventional operating temperature absorber elements of solar radiation. In addition, the production of such a thin surface layer is easy to implement and inexpensive, since the heat treatment, to achieve the surface oxidation of the substrate, is a simple treatment to implement on an industrial scale . Steels with a chromium content of less than 11.5% by weight are known to form an oxide that is not stable over time. However, it has been shown that, under the conditions described above, the oxide formed on the surface of the substrate is stable under the conditions of use of a solar power station (in air and at operating temperatures below 500 ° C) and has good optical properties. Advantageously, long length steel tubes will be used to limit the number of welds to be made in order to obtain a tube of great length. Indeed, the welds are more difficult to achieve on high alloyed steels compared to low alloy steels or stainless steels.
    [0020] The steel substrates, selected from the range described above, may be used in installations operating at higher temperatures: typically up to a heat transfer fluid temperature of 550 ° C, for pressures between 3 bar and 150 bar, for example, and up to a temperature of 600 ° C for use at low pressure, close to atmospheric pressure, between 1 and 5 bar. These steels are particularly interesting as a substrate for the production of absorber elements in direct contact with a heat transfer fluid such as water vapor, coolant which has a significant experience feedback in thermal power plants in particular.
    [0021] Absorber elements, presented above, are suitable for solar power plants of any type, and, more particularly, for Fresnel and parabolic-type plants, requiring a stable selective treatment under air, especially for temperatures above 400. ° C. Given the thermal properties of such steels and their lower production cost than stainless steels, these steels can also be used for producing absorbers in the form of a bundle of tubes having unit lengths up to several hundred meters away. The realization of a solar thermal concentration plant includes, for example, the following steps: - provide a steel substrate 3 having an outer surface 2 covered by a selective coating 1 to solar radiation, the substrate 3 being intended to form a cavity can be traversed by a heat transfer fluid; the most conventional form of this substrate being in particular the cylindrical tube, - providing at least one mirror arranged to concentrate a portion of the solar radiation received on the substrate 3.
    [0022] The method for producing a solar thermal concentration plant also comprises the following steps: providing a substrate 3 made of steel, having a chromium content of between 6% and 12.5% by weight, and preferably between 6% and 11.5% by weight, - effecting a heat treatment, so as to form an oxide layer 4 intrinsically selective to solar radiation on the surface of the substrate 3. The method for producing such a surface also comprises a step of surface treatment of the substrate so as to obtain a substrate roughness of less than 0.5 μm. The surface treatment step is performed before or after the heat treatment.
    权利要求:
    Claims (23)
    [0001]
    REVENDICATIONS1. A method of producing a solar radiation absorber element for a solar thermal concentrating plant comprising forming a selective coating (1) on an outer surface (2) of a steel substrate (3), characterized in that that the formation of the selective coating (1) comprises the following successive steps: - providing a substrate (3) made of steel having in particular a chromium content of between 6% and 12.5% by weight, - carrying out a heat treatment, so as to forming an oxide layer (4) on the surface of the substrate (3).
    [0002]
    2. Method according to claim 1, characterized in that the substrate (3) has a carbon content of between 0.07% and 0.23%.
    [0003]
    3. Method according to one of claims 1 and 2, characterized in that the substrate (3) has a manganese content of between 0.2% and 1.3%.
    [0004]
    4. Method according to any one of claims 1 to 3, characterized in that the substrate (3) has a molybdenum content of between 0.2% and 2.3%.
    [0005]
    5. Method according to any one of claims 1 to 4, characterized in that the substrate (3) has a tungsten content of between 0% and 2.5%.
    [0006]
    6. Method according to any one of claims 1 to 5, characterized in that the substrate (3) has a vanadium content of between 0% and 0.4%.
    [0007]
    7. Method according to one of claims 1 to 6, characterized in that the steel of the substrate (3) is selected from steels designated X10CrAlSi7, X11CrMo9-1, X10CrMoVNb9-1, X10Cr A / MoVNb9-2, X11CrMoVVVNb9-1-1, X20CrMoV11-1, X20CrMoV12-1 and X19CrMoNbVN11-1.
    [0008]
    8. Method according to any one of claims 1 to 7, characterized in that the heat treatment is carried out in an oxidizing atmosphere, containing at least 5% of an oxygen precursor.
    [0009]
    9. Process according to any one of claims 1 to 8, characterized in that the heat treatment is carried out at a temperature between 400 ° C and 900 ° C, and preferably between 500 ° C and 800 ° C.
    [0010]
    10. Method according to any one of claims 1 to 9, characterized in that the thickness of the oxide layer (4) is between 10nm and 1000nm, and preferably between 20nm and 500nm.
    [0011]
    11. Method according to any one of claims 1 to 10, characterized in that, before the heat treatment step, a surface treatment is performed on the substrate (3) so as to obtain a roughness Ra less than 1 pm for the outer surface (2) of the substrate (3).
    [0012]
    12. A process according to claim 11, characterized in that the surface treatment is a mechanical polishing, an electrolytic polishing or a chemical surface treatment or in that the surface treatment is carried out by cold drawing of the substrate.
    [0013]
    13. Method according to one of claims 1 to 12, characterized in that the method comprises depositing an anti-reflection layer (5) on the oxide layer (4) on the surface of the substrate (3) .
    [0014]
    14. The method of claim 13, characterized in that the antireflection layer (5) is deposited by plasma chemical vapor deposition atmospheric pressure. 30
    [0015]
    15. Method according to any one of claims 13 and 14, characterized in that the anti-reflection layer (5) is SiO 2, Al 2 O 3, TiO 2, or a combination of these different layers.
    [0016]
    16. Method according to any one of claims 13 to 15, characterized in that the anti-reflection layer (5) has a thickness of between 30nm and 250nm.
    [0017]
    17. Method according to one of claims 1 to 16, characterized in that the substrate (3) has a thickness between 1mm and 7mm.
    [0018]
    18. A solar radiation absorber element for a solar thermal concentration plant, comprising: a substrate (3) made of steel, having a chromium content of between 6% and 12.5% by weight, an oxide layer (4) on the surface of the substrate (3). 15
    [0019]
    19. Absorber element according to claim 18, characterized in that the thickness of the oxide layer (4) is between 10 nm and 1000 nm, and preferably between 20 nm and 500 nm.
    [0020]
    20. Absorber element according to one of claims 18 and 19, characterized in that the steel of the substrate (3) has a carbon content of between 0.07% and 0.23%.
    [0021]
    21. Absorber element according to one of claims 18 to 20, characterized in that the steel of the substrate (3) is selected from steels designated X10CrAlSi7, X11CrMo9-1, X10CrMoVNb9-1, X10CrMoVNb9-2 and X11CrMoWVNb9- 1-1, T9, T91, T92, T911, and T122.
    [0022]
    22. absorber element according to one of claims 18 to 21, characterized in that an anti-reflection layer (5) is disposed on the oxide layer (4). 30
    [0023]
    23. absorber element according to one of claims 18 to 22, characterized in that the substrate (3) has a thickness between 1mm and 7mm.
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    CH620761A5|1980-12-15|Solar collector absorption surface
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    FR2466721A1|1981-04-10|COATING FOR ABSORBING SOLAR ENERGY, PROCESS FOR PRODUCING THE SAME, AND HEATING APPARATUS COMPRISING SUCH A COATING
    同族专利:
    公开号 | 公开日
    EP3080326B1|2022-01-05|
    FR3014906B1|2016-06-24|
    WO2015087021A1|2015-06-18|
    US20160363349A1|2016-12-15|
    EP3080326A1|2016-10-19|
    引用文献:
    公开号 | 申请日 | 公开日 | 申请人 | 专利标题
    EP0903421A1|1997-09-22|1999-03-24|National Research Institute For Metals|Ferritic heat-resistant steel and method for producing it|
    JP2008223128A|2007-03-16|2008-09-25|Institute Of National Colleges Of Technology Japan|Steel pipe having excellent oxidation resistance, and method for manufacturing the same|
    US20120308772A1|2010-03-12|2012-12-06|Hitachi, Ltd.|Steam turbine member|
    WO2012168577A2|2011-06-09|2012-12-13|Commissariat à l'énergie atomique et aux énergies alternatives|Process for producing an element for absorbing solar radiation for a thermal concentrating solar power plant|
    JPS6014275B2|1975-09-22|1985-04-12|Yazaki Corp|
    US4268324A|1979-04-20|1981-05-19|Sharma Vinod C|Fabrication of spectrally selective solar surfaces by the thermal treatment of austenitic stainless steel AISI 321|
    DE102005057277B4|2005-11-25|2010-08-12|Schott Ag|absorber tube|
    AU2007360138B2|2007-10-18|2013-09-19|Midwest Research Institue|High temperature solar selective coatings|
    CN103946413B|2011-11-22|2016-08-24|新日铁住金株式会社|Ascalloy and manufacture method thereof|US9935009B2|2016-03-30|2018-04-03|International Business Machines Corporation|IR assisted fan-out wafer level packaging using silicon handler|
    FR3078979B1|2018-03-15|2020-10-16|Commissariat Energie Atomique|PROCESS FOR FORMING A LAYER OF OXIDE2O3 OF RHOMBOEDRIC STRUCTURE ON A STEEL SUBSTRATE|
    DE102019123174A1|2019-08-29|2021-03-04|Mannesmann Stainless Tubes GmbH|Austenitic steel alloy with improved corrosion resistance when exposed to high temperatures|
    CN110863115B|2019-11-29|2021-08-20|四川六合特种金属材料股份有限公司|Method for improving high-temperature endurance performance of blade steel X19CrMoNbVN11-1|
    法律状态:
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    2020-03-20| CD| Change of name or company name|Owner name: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERG, FR Effective date: 20200207 Owner name: MANNESMANN PRECISION TUBES FRANCE, FR Effective date: 20200207 |
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    2021-12-31| PLFP| Fee payment|Year of fee payment: 9 |
    优先权:
    申请号 | 申请日 | 专利标题
    FR1302935A|FR3014906B1|2013-12-13|2013-12-13|METHOD FOR PRODUCING A SOLAR RADIATION ABSORBER ELEMENT FOR A CONCENTRATION THERMAL SOLAR POWER PLANT, A SOLAR RADIATION ABSORBER MEMBER|FR1302935A| FR3014906B1|2013-12-13|2013-12-13|METHOD FOR PRODUCING A SOLAR RADIATION ABSORBER ELEMENT FOR A CONCENTRATION THERMAL SOLAR POWER PLANT, A SOLAR RADIATION ABSORBER MEMBER|
    EP14824900.6A| EP3080326B1|2013-12-13|2014-12-12|Method for producing an element for absorbing solar radiation for a concentrating solar thermal power plant, element for absorbing solar radiation|
    US15/104,115| US20160363349A1|2013-12-13|2014-12-12|Method for producing an element for absorbing solar radiation for a concentrating solar thermal power plant, element for absorbing solar radiation|
    PCT/FR2014/053326| WO2015087021A1|2013-12-13|2014-12-12|Method for producing an element for absorbing solar radiation for a concentrating solar thermal power plant, element for absorbing solar radiation|
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