• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    Low erosion radio frequency ion source, which includes: - A hollow body (11) with inner conductive walls defining a cylindrical cavity (13), with a plasma supply gas supply inlet (14) and a power supply inlet (21) for injecting radio frequency energy into the cavity (13). - An expansion chamber (16) connected to the cavity (13) by means of a plasma exit orifice (17). - An ion extraction slit (18) in contact with the expansion chamber (16). - A coaxial conductor (15) located in the cavity (13), parallel to its longitudinal axis, one or both ends of the coaxial conductor (15) being in contact with a circular inner wall of the body (11), forming a coaxial resonant cavity ; arranging the coaxial conductor (15) of a conductive protrusion (22) facing the plasma exit orifice (17) and extending inside the cavity (13) in the radial direction. Substantially reduces the erosion of conductive materials. (Machine-translation by Google Translate, not legally binding)
    公开号:ES2696227A1
    申请号:ES201830684
    申请日:2018-07-10
    公开日:2019-01-14
    发明作者:Alonso Rodrigo Varela
    申请人:Centro de Investigaciones Energeticas Medioambientales y Tecnologicas CIEMAT；
    IPC主号:
    专利说明:

    [0001]
    [0002]
    [0003]
    [0004] Field of the invention
    [0005] The present invention is framed in the field of ion sources for particle accelerators.
    [0006]
    [0007] BACKGROUND OF THE INVENTION
    [0008] An ion source is the component of the particle accelerators where the gas is ionized transforming into plasma, from which the charged particles are then extracted to be accelerated. Ion sources are mainly used as internal sources in cyclotrons for the production of light positive ions and negative hydrogen. This type of machines has traditionally found its use in the world of research as multipurpose beam machines for use in multiple fields. Recently they have been used for the synthesis of radioisotopes in radiopharmacy applications, as well as in proton / hadron therapy machines for the treatment of tumors.
    [0009]
    [0010] Ion sources have traditionally been very present in the world of research in different fields, from their use in particle accelerators such as the study of materials or the structure of matter. For the generation of ions, we start from the material that we want to ionize (usually a gas) and we remove or add electrons to their atoms by means of one or more of the following processes: impact of electrons (direct ionization and / or load exchange) ), photoionization and ionization on the surface.
    [0011]
    [0012] In its simplest scheme, an ion source consists of a main chamber where the process is carried out, material to ionize (introduced previously or continuously), a source of energy for ionization and an extraction system. According to the process followed, a general classification of the different types of ion sources can be made:
    [0013] • Bombardment of electrons: they use accelerated electrons, typically generated in a cathode at a certain temperature, that impact with the material and ionize the atoms and / or molecules of it.
    [0014] Discharge of DC / pulsed plasma: they are similar to the previous ones in that they use a beam of electrons generated by a cathode, but in this case the pressures to which they operate are higher, so a plasma is generated that the fast electrons They charge to keep depositing energy in the form of collisions. In this category are the Plasmatron, Duoplasmatron, Magnetron and Penning type sources. They generally employ magnetic fields to confine the trajectories of fast electrons and increase ionization. The disadvantage presented by these sources is the erosion in the cathode due to the high potential difference to which the cathode is located, necessary to accelerate the electrons, which causes the ions to accelerate in the opposite direction and impact the cathode , tearing material (sputtering) and limiting the life of said cathode.
    [0015] Radiofrequency discharge: they are an evolution of DC sources because they use an alternating electric field to accelerate the electrons instead of a continuous one. There are two types of them depending on how the plasma and the electric field are generated: the capacitive coupling discharges (CCP) and the induced coupling discharges (ICP). At low frequencies they continue to produce sputtering in the "cathodes" due to a high potential between the plasma and the metallic medium, but at high frequencies this potential decreases below a certain threshold and the sputtering is practically non-existent, appreciably increasing the life of said " cathodes. "
    [0016] Electron Cyclotron Resonance (ECR / ECRIS): particular design of radiofrequency discharge, since it is based on exciting the cyclotron resonance of electrons located in a magnetic field with a wave with the appropriate circular polarization, which causes an absorption of energy of the electromagnetic field very efficient in the resonance zones that results in a high ionization.
    [0017] Laser: the method used in laser ion sources is the photoionization by several high-power lasers whose wavelength is tuned to different electronic transitions, achieving a successive excitation of the electrons of the atom to be ionized.
    [0018] Surface ionization: the ion production method is the heating of a high working function material and the injection of the material you want to ionize.
    [0019] • Load exchange: this type of source uses a vapor of a metal with a high rate of electron transfer through which it passes ions of the desired atom to be negatively charged.
    [0020]
    [0021] In the case of sources of internal ions for cyclotrons, the field of preferred application for the present invention, due to the internal configuration of the cyclotrons, with very little space available to internally couple the ion sources and a very high magnetic field in the direction vertical that traps the trajectories of the electrons and does not let them move freely, the only internal sources that have been used so far for cyclotrons are Penning types. Ion sources with Penning configuration have two cathodes placed at the vertical ends and a hollow tube parallel to the magnetic field that surrounds them. Said cathodes may be externally heated or initially cold and heated with the ionic bombardment of the discharge. Due to the symmetric configuration of the cathodes and the magnetic field the electrons are emitted and accelerated, moving in helicoidal trajectories that increase the ionization, and when arriving at the opposite end they are reflected due to the electric field. The result of collisions of fast electrons with the injected gas is the creation of a plasma from which both positive and negative ions can be extracted. The sources of Penning-type ions have the disadvantage of cathode sputtering, which despite being commonly of high resistance materials and high emission of electrons (such as tantalum), are subject to excessive wear that requires frequent replacement .
    [0022]
    [0023] Penning type ion sources are very simple and compact, using a DC discharge. The use of an external source adds a lot of complexity to the system, although it makes possible the use of other methods to generate the plasma, which is why manufacturers do not usually include them in their commercial cyclotrons. The problem presented by all the sources that use DC discharges is that this type of discharge erodes the cathodes while the plasma is active, so they have to be changed periodically and in these machines that are used for medical applications it is generally desirable to have it working possible time without interruptions. In addition, in the case of the production of H-, the high-energy electrons of the DC discharge are the particles that contribute most to the destruction of H-, so that the extracted current is reduced.
    [0024] Therefore, it is necessary to have an internal ion source for cyclotrons that solves said drawbacks.
    [0025]
    [0026] Description of the invention
    [0027] The present invention relates to a source of low erosion radiofrequency ions, especially useful for being used as a source of internal ions for cyclotrons.
    [0028]
    [0029] The ion source comprises:
    [0030] - A hollow body whose interior walls define a cylindrical cavity. The body has a gas supply inlet through which a gas for plasma formation is introduced into the cavity. The body has a power supply input through which radiofrequency energy is injected into the cavity. The inner walls of the body are electrically conductive (preferably, the whole body is conductive).
    [0031] - An expansion chamber connected to the cavity through a plasma exit orifice made in the body.
    [0032] - An ion extraction slit in contact with the expansion chamber. - A coaxial conductor located in the cavity of the body, arranged parallel to the longitudinal axis of the cavity. At least one of the ends of the coaxial conductor is in contact with at least one circular inner wall of the body, forming a coaxial resonant cavity. The coaxial conductor has a conductive protrusion extending inside the cavity in the radial direction. The conductive protrusion is facing the plasma exit orifice.
    [0033]
    [0034] In one embodiment, the ion source comprises a movable part partially introduced into the cavity in a radial direction through an opening made in the body for fine tuning the frequency of the resonant cavity. The moving part is preferably made of conductive material or dielectric material.
    [0035]
    [0036] The supply of radiofrequency energy is made through a capacitive coupling or an inductive coupling. The capacitive coupling is made by a coaxial waveguide whose inner conductor is partially inserted into the cavity through the power supply input. The inductive coupling is done by means of a loop that short-circuits an inner wall of the body with an inner conductor of a coaxial waveguide introduced through the power supply input.
    [0037] In one embodiment a first end of the coaxial conductor is in contact with a circular inner wall of the body, the second end of the coaxial conductor being free. In this embodiment the conductive protrusion is preferably located at the second end of the coaxial conductor. The expansion chamber is preferably cylindrical and is arranged so that its longitudinal axis is perpendicular to the longitudinal axis of the cavity. Alternatively, the expansion chamber may be arranged so that its longitudinal axis is parallel to the longitudinal axis of the cavity.
    [0038]
    [0039] In another embodiment, the two ends of the coaxial conductor are respectively in contact with the two circular inner walls of the body. In this embodiment the conductive protrusion is preferably located in the central part of the coaxial conductor.
    [0040]
    [0041] The ion source may be double-cavity, comprising a second body and a second conductor forming a second coaxial resonant cavity. The cavities of both bodies are connected to each other through a common expansion chamber.
    [0042]
    [0043] The ion source of the present invention allows solving the drawbacks of Penning-type internal ion sources used in cyclotrons, in which the plasma is generated by producing erosion in the conductive materials. Erosion occurs because the plasma is positively charged, so electrons are attracted to the plasma, while positive ions are rejected and accelerated by the potential difference between the plasma and the wall, so that if the energy of the ions at the time of the collision with the wall is sufficiently high (>> 1 eV) in the collision of the ion with the conductive material are removed atoms of the material. The amount of atoms removed depends on the conductive material.
    [0044]
    [0045] In the proposed ion source the plasma is generated without producing erosion in the conductive materials (ie the electrodes) used in the ion source, with which the maintenance and interruptions produced in the operation of the source are much lower than in the case of a Penning font. Thus, in an embodiment of the present invention where radiofrequency energy supply is employed by Capacitive discharge, working at a sufficiently high frequency (eg 2.45 GHz) does not produce erosion in the source materials. The plasma discharge can operate in two different modes, the alpha mode, where the discharge is maintained thanks to the secondary electrons emitted by the cathode (or the part that at that time became the cathode), and the gamma mode, where the mechanism of heating of the plasma by heating without collisions ("collisionless heating"). The alpha mode is given in DC and RF discharges at low frequencies, and from a certain frequency that depends on the characteristics of the plasma, the transition to gamma mode takes place. .
    [0046]
    [0047] The formation of a resonator or coaxial resonant chamber allows to increase the electric field and facilitate the ignition, so that the ion source of the present invention also achieves a much lower energy consumption.
    [0048]
    [0049] In the ion source of the present invention, it is also not necessary to have the hot cathodes at temperatures of the order of 2000 K, so instead of using conductive materials with high resistance and high emission of electrons, such as tantalum, others can be used less expensive, such as copper. Due to the collision of the ions with the cathodes their kinetic energy is converted into thermal energy that increases the temperature of the cathodes, which emit electrons by thermionic effect, which are necessary to maintain the DC discharge in the Penning sources. As in the present invention the collisions with the cathodes are much less energetic, the heating of the cathodes is much lower and thermally less restrictive conducting materials can be used (i.e. with lower melting temperature and higher conductivity), such as copper.
    [0050]
    [0051] Furthermore, in case of producing H-, since the present ion source does not generate high energy electrons in the plasma, the extracted current is significantly increased. The production section of H- is maximum at low energy (1-10 eV), at higher energies the production section of production decreases a lot, while the production section of destruction of H- increases markedly, as it is explained in detail in the H. Tawara document, "Cross Sections and Related Data for Electron Collisions with Hydrogen Molecules and Molecular Lons".
    [0052]
    [0053] BRIEF DESCRIPTION OF THE DRAWINGS
    [0054] Next, a series of drawings that describe they help to better understand the invention and that are expressly related to an embodiment of said invention that is presented as a non-limiting example thereof.
    [0055]
    [0056] Figure 1 shows, according to the state of the art, a front view of a longitudinal section of a Penning double-cavity ion source.
    [0057]
    [0058] Figure 2 shows, according to the state of the art, a perspective view of a longitudinal section of a Penning double-cavity ion source.
    [0059]
    [0060] Figures 3, 4, 5 and 6 different samples sectional views of an ion source according to a possible embodiment of the present invention.
    [0061]
    [0062] Figures 7 and 8 are sectional views of a double cavity ion source according to a possible embodiment of the present invention.
    [0063]
    [0064] Figure 9 represents another possible embodiment of an ion source, especially suitable for cyclotrons of axial configuration.
    [0065]
    [0066] Figures 10 and 11 show a cyclotron with axial configuration for the introduction of the ion source.
    [0067]
    [0068] Figures 12 and 13 show a cyclotron with radial configuration for the introduction of the ion source.
    [0069]
    [0070] Figure 14 shows an embodiment of the ion source similar to that shown in Figure 6 but replacing the capacitive coupling with an inductive coupling.
    [0071]
    [0072] Figures 15 and 16 show an embodiment of the ion source with a different type of coupling (coupling by rectangular waveguide).
    [0073]
    [0074] Figures 17, 18, 19 and 20 show different views in partial section of an ion source according to another possible embodiment.
    [0075]
    [0076] Figure 21 illustrates, by way of example, a complete radiofrequency system in which the ion source of the present invention can be used.
    [0077] Detailed description of the invention
    [0078] The present invention relates to an ion source conceived primarily for use as an internal source in cyclotrons.
    [0079]
    [0080] Penning ion sources are currently used as an internal source for cyclotrons, such as the one shown in Figure 1 (front view of longitudinal section) and in Figure 2 (perspective view of longitudinal section), which corresponds to a source of double cavity ions.
    [0081]
    [0082] The double-cavity Penning ion source comprises two hollow bodies, each consisting of two pieces, a conductive piece (1, 1 ') and an insulating piece (2, 2'), which fit together that its inner walls delimit a cylindrical cavity (3, 3 '). At least one of the conductive parts 1 has a gas supply inlet 4 through which a gas for plasma formation is introduced into its respective cavity 3. In each cavity (3, 3 ') there is arranged a coaxial conductor (5, 5') located in the cavity (3, 3 ') of the body (1, 1'), arranged parallel to the longitudinal axis of the cavity (3, 3 ') cylindrical.
    [0083]
    [0084] Both cavities (3, 3 ') are interconnected by means of a common cylindrical expansion chamber (6) through respective holes (7, 7') made in the walls of the conductive parts (1, 1 '). An ion extraction slit (8) located in the walls delimiting the expansion chamber (6), in its central part, allows to extract ions from the plasma generated from the gas introduced in the cavities (3, 3 ').
    [0085]
    [0086] A conductive element (9, 9 ') is inserted in each cavity (3, 3'), penetrating through the insulating part (2, 2 '), and in electrical contact with the coaxial conductor (5, 5') of The cavity. The conductive element (9, 9 ') is energized with DC voltages of around 3000 V. To start the discharge it is necessary to open the gas flow and apply between anode and cathode (ie the conductive part 1/1' and the conductor 5/5 'coaxial) a potential difference of several thousand volts. After the ignition of the plasma the power supply stabilizes it maintaining a potential difference between 500-1000V with a current of several hundred milliamps. The discharge that is established is of DC type, requiring the emission of secondary electrons from the conductive material (so they must be at high temperature and be of a material with high electron emissivity) and the ions that are expelled from the plasma are accelerated at high energy, causing the erosion of the cathodes.
    [0087]
    [0088] Figure 3 shows a vertical cross section of an embodiment of the device object of the present invention, source of ions 10, according to a plane of cut perpendicular to the axis X, where the external magnetic field B (normally generated by an electromagnet or a permanent magnet when the ion source is installed and in operation) is aligned with the vertical axis Z of the reference system.
    [0089]
    [0090] The operation of the ion source 10 is based on a coaxial resonant cavity. Figure 4 shows a cross section of the ion source 10 according to the horizontal plane XY passing through the axis of the resonant cavity. The inner walls (11a, 11b, 11c) of a hollow body 11 are electrically conductive and define a cylindrical cavity 13. In one embodiment the entire body 11 is conductive, preferably copper.
    [0091]
    [0092] The body 11 has three interior walls: a first interior wall 11a, of circular geometry, a second interior wall 11b, also circular and opposite the first interior wall 11a, and a third interior wall 11c, of cylindrical geometry, connecting both circular interior walls (11a, 11b).
    [0093]
    [0094] A coaxial conductor 15 is located in the cavity 13 of the body 11, arranged parallel to the longitudinal axis of the cylindrical cavity 13. At least one of the ends (15a, 15b) of the coaxial conductor 15 is in contact with one of the circular inner walls (11a, 11b) of the body 11, forming a coaxial resonant cavity. In this way, the coaxial conductor 15 can short-circuit both inner walls (11a, 11b) to obtain a coaxial resonant cavity A / 2, obtaining the maximum electric field in the center, or short-circuit a single inner wall to obtain a coaxial resonant cavity A / 4 (with the maximum electric field at the opposite end of the conductor). In the example of Figures 3 and 4 only one of the ends of the coaxial conductor 15, in particular the first end 15a, short circuits one of the circular inner walls of the body 11 (in particular, the first inner wall 11a), forming this the body 11 and the coaxial conductor 15 form a coaxial resonant cavity A / 4, with the maximum electric field at the second end 15b of the coaxial conductor 15.
    [0095] The body 11 has a port or a gas supply inlet 14 (that is, a hole or opening made in one of its walls) through which a gas for forming plasma is introduced into the cavity 13. In Figure 4 a tube 20 is shown, hermetically coupled to the gas supply inlet 14, through which the gas is introduced into the cavity 13. This type of ion sources generally work with Hydrogen, and to a lesser extent Deuterium and Helium, depending on the ion that you want to extract.
    [0096]
    [0097] The body 11 also has a power supply input 21 through which radiofrequency energy is injected into the cavity 13.
    [0098]
    [0099] An expansion chamber 16 is connected to the cavity 13 through a plasma exit orifice 17 made in one of the walls of the body 11. An ion extraction slit 18 is located in one of the walls of the expansion chamber 16. The ion source 10 is introduced under vacuum into the chamber of a cyclotron, and the gas that is injected is partially transformed into plasma and the rest escapes through the ion extraction gap 18.
    [0100]
    [0101] The coaxial conductor 15 has a conductive protrusion 22 which extends inside the cavity 13 in a radial direction with respect to the axis of the cylindrical cavity (that is, perpendicular to said axis), said conductive protrusion 22 being facing the orifice of the cavity. plasma outlet 17 of the body 11 connecting the cavity 13 to the expansion chamber 16 (that is, the conductive protrusion 22 faces the expansion chamber 16). The conductive protrusion 22 does not come into contact with the inner wall of the body 11, although it remains very close, usually less than 5 millimeters; this distance of separation will depend to a great extent on the dimensions of the resonant cavity. The ignition voltage, power injected in the case of RF, will in turn depend on this separation distance and the density of the gas injected.
    [0102]
    [0103] Depending on where the plasma is to be generated, the body 11 is short-circuited by the internal coaxial conductor 15 at one end 15a or at both ends (15a, 15b). The coaxial conductor 15 is an inner conductor that has a function of an electrode opposite the outer conductor, the inner walls of the body 11, such that when the power is injected the cavity 13 comes into resonance, and the electric field that is established in the gap between the two conductors (11, 15) is changing sign.
    [0104] In the example of Figures 3 and 4 a part of the free end of the coaxial conductor 15, second end 15b, is modified by a projection or conductive protrusion 22 directed towards the expansion chamber 16, in order to produce a concentration and an increase of the electric field in the area where you want to produce the plasma (plasma production area). Through the plasma exit orifice 17 the plasma produced escapes from the cavity 13 towards the expansion chamber 16, forming a column of plasma 23 aligned with the magnetic field B, from which the ions are extracted using the extraction slit of the plasma. ions 18. The expansion chamber 16 is a cavity, preferably also cylindrical in geometry, which performs the function of expansion chamber for the plasma column 23. In the ion sources applied to the cyclotrons, the expansion chamber 16 is a cylindrical cavity of small radius so that after extracting the particles through the ion extraction slit 18 and being accelerated in the first turn do not collide with the source and get lost. The expansion chamber 16 also acts as a mechanical support, keeping the two symmetrical parts of the ion source separate, when dealing with a double-cavity ion source (as shown in Figures 1 and 2).
    [0105]
    [0106] As shown in the embodiment of Figure 4, through the access, port or power supply input 21, a coaxial waveguide 24 that carries the radiofrequency / microwave energy is coupled, which may be the type coupling. electrical (capacitive) or magnetic (inductive). Figure 4 shows a typical capacitive coupling, where the dielectric 25 that surrounds the inner conductor 26 of the coaxial waveguide 24 allows the hermetic closure of the power supply input 21 (so that part of the gas injected does not escape by said inlet), and where the inner conductor 26 of the coaxial waveguide 24 protrudes from the dielectric 25, partially entering the interior of the cavity 13. In contrast to this capacitive coupling, a typical inductive coupling employs a coil that short-circuits the interior of the coaxial waveguide with the resonant cavity.
    [0107]
    [0108] The frequency of the resonant cavity can be adjusted by means of an insert or moving part 27 which is partially inserted into the cavity 13. The moving part 27 can be displaced, in the moment of the initial configuration of the ion source 10, in the radial direction ( ie perpendicular to the axis of the cylindrical cavity 13), thus allowing a fine adjustment of the resonance frequency depending on the volume of the piece mobile 27 that is introduced into the interior of the cavity 13. The mobile part 27 is an optional element, not strictly necessary for the operation of the ion source, although it improves the operation by facilitating the adjustment of the resonance frequency. The moving part 27 can be made of conductive material (preferably copper), or of dielectric material (such as alumina), depending on the behavior and frequency variation desired.
    [0109]
    [0110] Figures 5 and 6 show two additional views of the ion source 10, according to a possible embodiment. In Figure 5 illustrates a front view of the ion source 10, where the part above the axis of the cavity 13 is shown in mid section. Figure 6 represents a three-dimensional view of an ion source 10. The gas supply inlet 14 is not shown in Figure 6 when it is located in this view in the rear part of the body 11. The projection 70 shown in the Figure 6 is an element with the same function as the moving part 27 of Figure 4, an element by which fine tuning of the frequency of the resonant cavity is performed. In this case the projection 70 is integrated into the body of the ion source, but could be designed as a separate body.
    [0111]
    [0112] Figures 7 and 8 show, respectively and according to another embodiment, a front section and a perspective section of a double-cavity ion source 30, with a plane of symmetry 31 in the central part of the ion extraction slit. 18, both cavities (13, 13 ') being connected by a common expansion chamber 16, which allows the expansion of the plasma column 23 produced in each cavity (13, 13'). The elements of the ion source 30 for each of the two cavities (13, 13 ') are the same as those shown in Figures 3 to 6 for the ion source 10 of a single cavity (first body 11 and second body). 11 ', first coaxial conductor 15 and second coaxial conductor 15', first conductive protrusion 22 and second conductive protrusion 22 ', first plasma exit orifice 17 and second plasma exit orifice 17', etc.), with the particularity in this case that both cavities (13, 13 ') are facing each other and share the expansion chamber 16. The double-cavity ion sources 30 are used to obtain plasma more easily and increase the production of particles, in such a way that at both ends two plasma jets are produced which converge at the level of the plane of symmetry 31, forming a single column of plasma 23 in the central part, where the slit is located. extraction of ions 18 to remove the desired particles, either positive or negative ions.
    [0113]
    [0114] The length of the resonant cavity (along the Y axis) is of the order or less than A / 4 (where A is the wavelength associated with the oscillating electromagnetic field by the relation Á = f / c, where f is the frequency of oscillation and c the speed of light) in the case of resonant cavities short-circuited at one end (quarter-wave cavities). In the case of half-wave resonant cavities, short-circuited at both ends and with plasma formation in the central part of the inner conductor, the length of the resonant cavity will be of the order or less than A / 2. The transversal dimensions, as well as those of the conductive protuberance 22 to concentrate the electric field, are determined by the concrete parameters of the resonant cavity that are to be obtained, mainly the quality factor Q and the characteristic impedance R / Q, and will also influence in the resonant frequency of the cavity.
    [0115]
    [0116] The inner walls of the body 11 are made of a conductive material of low electrical resistivity and high thermal conductivity, generally copper or copper deposited on another metal, since it is desired that the Q factor is high and the power deposited in the walls is quickly dissipated .
    [0117]
    [0118] To operate the ion source (10; 30), starting from the initial state, where there is no energy in the cavity 13 or cavities (13, 13 '). The radiofrequency energy that is introduced into the cavity is produced in a generator, which can be solid state, electron tube (magnetron, TWT, girotron, klystron ...) or a resonant circuit of coil and capacitor, depending on the frequency, power and work mode required. Said power travels through a waveguide, generally coaxial or hollow (eg rectangular) to the cavity, where by means of a coupling (electrical, inductive or by hole) the power is transferred to the resonant cavity, minimizing reflections and power losses. As the electromagnetic energy (of the same frequency as the resonant of the cavity) is introduced into the cavity, the value of the electric field increases in magnitude, in such a way that it reaches a point at which the ignition of the plasma takes place ( Paschen for oscillating electromagnetic fields). Once the plasma is formed, which expands through the plasma exit orifice 17 diffusing along the magnetic field lines generated by an electromagnet or a permanent magnet, the resonant frequency of the cavity shifts, so that If the frequency of the electromagnetic field that is supplied to the cavity remains constant, power begins to be reflected due to the impedance difference, reaching a point where all the power will be reflected except that necessary to maintain the discharge and compensate for losses in the walls of the the cavity, stabilizing the system in the steady state.
    [0119]
    [0120] According to a possible embodiment, a specific design of the present invention uses a coaxial resonant cavity A / 4, with approximately 3 cm in length for a frequency of 2.45 GHz, with one end short-circuited and another open, made of copper. In the part of the open end of the inner coaxial conductor 15 there is a conductive protrusion 22 projecting in the same direction of the magnetic field (in the vertical direction Z) that faces the outlet orifice of the plasma 17 and which allows to increase the electric field in that zone to achieve plasma formation with less power. The plasma exits through the outlet orifice of the plasma 17 and enters the expansion chamber 16, where it diffuses mostly in the direction of the magnetic field lines (parallel to the Z axis) forming a plasma column 23, and passes close to the ion extraction slit 18, where ions are extracted through an electric field.
    [0121]
    [0122] In the embodiment shown in the figures, the gas supply inlet 14 is implemented by a simple hole connected to a tube 20, while the coupling of the radiofrequency system is performed with electrical coupling by means of a protruding cylinder (dielectric 25) connected to the inner conductor 26 of a coaxial waveguide 24. Other alternatives for the introduction of power are a magnetic coupling by means of a loop or an orifice made to a waveguide. The resonant frequency of the cavity is adjusted by the moving part 27.
    [0123]
    [0124] Figure 9 illustrates an ion source 40 according to another possible embodiment, where the location of the plasma exit orifice 17 (in this case it is located in the second circular inner wall 11b) and the orientation of the expansion chamber 16 with respect to to the cavity 13. Furthermore, the conductive protuberance 22 of the ion source 40 for this embodiment is preferably circular in section, to thereby maintain the internal symmetry in the cavity 13 (the conductive protrusion 22 of Figure 9 protrudes at each side - top and bottom - of the coaxial conductor 15). However, the conductive protrusion 22 of Figure 3 may have different types of sections, depending on the geometry and dimensions of the cavity, the coaxial conductor and the plasma exit orifice (the section can be optimized by simulation to obtain a greater concentration of the electric field in front of the plasma exit orifice 17 that favors the formation and stability of the plasma) , so that the conductive protrusion 22 only protrudes on one side, superiorly. The upper circle illustrated in Figure 9 represents the resonator 12 (that is, the coaxial resonant cavity) that is formed when the ion source 40 is in operation.
    [0125]
    [0126] While in the ion source 10 of Figures 3 to 6 the main axis of the expansion chamber 16 is arranged perpendicular to the axis of the cylindrical cavity 13, in the ion source 40 of Figure 9 both axes are parallel (in the example of Figure 9 are coincident), which allows coupling the ion sources in cyclotrons axially.
    [0127]
    [0128] Sources of internal ions for cyclotrons can be introduced into the cyclotron radially or axially. Figures 10 and 11 show respectively a front and perspective view (partially sectioned) of a cyclotron 41 (in the figure of the cyclotron omitted components such as magnet coils, radio frequency system-acceleration-, the extraction system and the vacuum and iron opening system) with axial configuration for the introduction of an ion source. In the cyclotron 41 of Figures 10 and 11 the ion source is introduced with the axial configuration of Figure 9, where the electromagnetic and mechanical design of the ion sources is simpler. Figures 12 and 13 show a cyclotron 46 with radial configuration for the introduction of the ion source, where the design of the ion sources is more complicated (corresponds to the ion source represented in Figures 3 to 6). In Figures 10, 11, 12 and 13 the following references are used:
    [0129] 41 and 46 - Cyclotron.
    [0130] 42 and 47 - Flange of the ion source. It has gas bushings, waveguide and liquid cooling (if necessary). It also closes vacuum.
    [0131] 43 - Gas tube, waveguide and cooling. They provide mechanical support to the ion source and can be integrated or separately. It could include a dedicated support if necessary. In the case of radial insertion, they are usually shielded to withstand the impact of the particles that are lost.
    [0132] 44 - Magnet iron. It guides the magnetic field and serves to attenuate the radiation.
    [0133] 45 - Magnet pole (the circular part can be machined to modify the magnetic field).
    [0134] 48 - Ion source.
    [0135]
    [0136] As indicated above in the description of Figure 4, a coaxial waveguide 24 carrying radiofrequency / microwave energy is coupled through the power supply input 21. The coupling can be electrical / capacitive or magnetic / inductive. Figure 14 shows an embodiment as shown in Figure 6 but replacing the capacitive coupling with a magnetic coupling, where a coil 49 short-circuits the inner conductor 26 of the coaxial waveguide 24 with the inner wall of the body 11. In the Figures 15 and 16 are shown in two different views (top view and perspective view, with partial section) another type of coupling, coupled by rectangular waveguide 71. In this case the coupling is made through a hole 72 that joins the cavity 13 with the vacuum of the rectangular waveguide 71. It would act as an electric dipole and a magnetic dipole that radiate on both sides, so that if on one side there is greater energy density, energy is transferred to the other side until they reach an equilibrium. In this embodiment, the ion source 10 has larger dimensions due to the rectangular waveguide 71, which must also be idle.
    [0137] Figures 17 , 18 , 19 and 20 show different views in partial section (in particular, a front view, a top view, a front perspective view and a rear perspective view, respectively) of an embodiment of the ion source. where the two ends (15a, 15b) of the coaxial conductor 15 are respectively in contact with the two circular inner walls (11a, 11b) of the body 11, thereby obtaining a coaxial resonant chamber A / 2.
    [0138]
    [0139] Figure 21 shows, by way of example, a complete radiofrequency system 50 in which the ion source (10; 30; 40) of the present invention can be used. The radio frequency system comprises a generator 51 of sufficient power and adjustable parameters to achieve the ignition of the plasma, a circulator 52 with a load 53 to absorb the reflected power and a directional coupler 54 with a power meter 55 for monitoring the incident power and reflected.
    [0140]
    [0141] The ion source (10; 30; 40) is placed immersed in a magnetic field generated by an electromagnet or by a permanent magnet 56, where the direction of the field lines is not important, only its direction. The ion source (10; 30; 40) is connected, via the gas supply inlet 14, to a gas injection system 57, which comprises a reservoir or gas reservoir 58 and is metered by a gas injection system. regulation 59. The ion source (10; 30; 40) is located in a chamber 60 with a sufficient vacuum so that the ions are not neutralized by the residual gas and can be accelerated for later use.
    [0142]
    [0143] The necessary radiofrequency power is provided by the generator 51, and the transmitted power is measured with the power meter 55 connected to the directional coupler 54. The generator 51 is protected with the circulator 52 which diverts the power reflected by the ion source (10). ; 30; 40) to load 53.
    权利要求:
    Claims (13)
    [1]
    1. Source of low erosion radiofrequency ion, comprising:
    a hollow body (11) whose inner walls (11a, 11b, 11c) define a cylindrical cavity (13), where the body (11) has a gas supply inlet (14) through which it enters the cavity ( 13) a gas for plasma formation;
    a coaxial conductor (15) located in the cavity (13) of the body (11) and arranged parallel to the longitudinal axis of the cavity (13);
    an expansion chamber (16) connected to the cavity (13) through a plasma exit orifice (17) made in the body (11);
    an ion extraction slit (18) in contact with the expansion chamber (16);
    characterized by:
    the body (11) has a power supply input (21) through which radiofrequency energy is injected into the cavity (13);
    the inner walls of the body (11) are conductive;
    at least one of the ends (15a; 15b) of the coaxial conductor (15) is in contact with at least one circular inner wall (11a, 11b) of the body (11), forming a coaxial resonant cavity;
    the coaxial conductor (15) has a conductive protrusion (22) that extends inside the cavity (13) in the radial direction, said conductive protrusion (22) being facing the plasma exit orifice (17).
    [2]
    2. Source of ions according to claim 1, characterized in that it comprises a moving part (27) partially inserted into the cavity (13) in a radial direction through an opening made in the body (11) to perform a fine adjustment of the frequency of the resonant cavity.
    [3]
    3. Ion source according to claim 2, characterized in that the moving part (27) is made of conductive material.
    [4]
    4. Ion source according to claim 2, characterized in that the moving part (27) is made of dielectric material.
    [5]
    Ion source according to any one of claims 1 to 4, characterized in that the supply of radiofrequency energy is carried out through a capacitive coupling by means of a coaxial waveguide (24) whose inner conductor (26) is partially inserted in the cavity (13) through the power supply inlet (21).
    [6]
    Ion source according to any one of claims 1 to 4, characterized in that the supply of radiofrequency energy is carried out through an inductive coupling by means of a turn (49) that short-circuits an inner wall of the body (11) with a conductor inner (26) of a coaxial waveguide (24) introduced through the power supply input (21).
    [7]
    Ion source according to any of claims 1 to 6, characterized in that a first end (15a) of the coaxial conductor (15) is in contact with a circular inner wall (11a) of the body (11), the second end being (15b) of the free coaxial conductor, and where the conductive protrusion (22) is located at the second end (15b) of the coaxial conductor (15).
    [8]
    Ion source according to claim 7, wherein the expansion chamber (16) is cylindrical, characterized in that the longitudinal axis of the cavity (13) is arranged perpendicular to the longitudinal axis of the expansion chamber (16).
    [9]
    Ion source according to claim 7, wherein the expansion chamber (16) is cylindrical, characterized in that the longitudinal axis of the cavity (13) is arranged parallel to the longitudinal axis of the expansion chamber (16).
    [10]
    Ion source according to any of claims 1 to 6, characterized in that the two ends (15a, 15b) of the coaxial conductor (15) are respectively in contact with the two circular inner walls (11a, 11b) of the body (11). ).
    [11]
    11. Ion source according to claim 10, characterized in that the conductive protrusion (22) is located in the central part of the coaxial conductor (15).
    [12]
    12. Source of ions according to any of the preceding claims, characterized by the entire body (1) is conductive.
    [13]
    13. Source of ions according to any of the preceding claims, characterized in that it comprises a second body (11 ') and a second conductor (15') forming a second coaxial resonant cavity; the cavities (13, 13 ') of both bodies (11, 11') being connected to each other through a common expansion chamber (16).
    类似技术:
    公开号 | 公开日 | 专利标题
    USRE48317E1|2020-11-17|Interrupted particle source
    JPH0732072B2|1995-04-10|Plasma excitation apparatus and method and plasma generation apparatus
    US4727293A|1988-02-23|Plasma generating apparatus using magnets and method
    US5666023A|1997-09-09|Device for producing a plasma, enabling microwave propagation and absorption zones to be dissociated having at least two parallel applicators defining a propogation zone and an exciter placed relative to the applicator
    RU2480858C2|2013-04-27|High-current source of multicharge ions based on plasma of electronic-cyclotronic resonant discharge retained in open magnetic trap
    US20110215722A1|2011-09-08|Device and method for producing and/or confining a plasma
    Zelenski et al.2002|Optically pumped polarized H− ion source for RHIC spin physics
    KR100876052B1|2008-12-26|Neutralizer-type high frequency electron source
    US6922019B2|2005-07-26|Microwave ion source
    Skalyga et al.2006|Gasdynamic ECR source of multicharged ions based on a cusp magnetic trap
    ES2696227B2|2019-06-12|INTERNAL ION SOURCE FOR LOW EROSION CYCLONES
    US2901628A|1959-08-25|Ion source
    JPH05314918A|1993-11-26|Microwave antenna for ion source
    JP2021533572A|2021-12-02|Systems and methods for processing workpieces using a neutral atom beam
    Liu et al.1998|Design aspects of a compact, single-frequency, permanent-magnet electron cyclotron resonance ion source with a large uniformly distributed resonant plasma volume
    Mozjetchkov et al.1998|Microwave plasma source for the negative hydrogen ion production
    US6795462B1|2004-09-21|Gas laser
    Komppula et al.2015|An experimental study of waveguide coupled microwave heating with conventional multicusp negative ion sources
    RU2151438C1|2000-06-20|Ribbon-beam ion plasma source |
    WO2013030804A2|2013-03-07|Compact self-resonant x-ray source
    Efthimion et al.2003|ECR plasma source for heavy ion beam charge neutralization
    Skalyga et al.2018|Status of new developments in the field of high-current gasdynamic ECR ion sources at the IAP RAS
    Christensen et al.1981|Performance of Intense Pulsed Ion Source
    Leitner et al.1999|High-current, high-duty-factor experiments with the H ion source for the Spallation Neutron Source
    SU529712A1|1977-06-05|Metal ion source
    同族专利:
    公开号 | 公开日
    WO2020012047A1|2020-01-16|
    EP3799104A4|2021-07-28|
    EP3799104A1|2021-03-31|
    CA3105590A1|2020-01-16|
    JP2021530839A|2021-11-11|
    ES2696227B2|2019-06-12|
    US20210274632A1|2021-09-02|
    CN112424901A|2021-02-26|
    引用文献:
    公开号 | 申请日 | 公开日 | 申请人 | 专利标题
    US4507588A|1983-02-28|1985-03-26|Board Of Trustees Operating Michigan State University|Ion generating apparatus and method for the use thereof|
    US4992665A|1987-11-11|1991-02-12|Technics Plasma Gmbh|Filamentless magnetron-ion source and a process using it|
    DE4413234A1|1994-04-15|1995-10-19|Siemens Ag|Coaxial system with virtual short circuit|
    US6495842B1|1997-12-24|2002-12-17|Forschungszentrum Karlsruhe Gmbh|Implantation of the radioactive 32P atoms|
    US6388225B1|1998-04-02|2002-05-14|Bluem Heinz-Juergen|Plasma torch with a microwave transmitter|
    EP1272015A1|2001-06-22|2003-01-02|Pantechnik|Cyclotron resonance device for the generation of ions with variable positive charge|
    FR2147497A5|1971-07-29|1973-03-09|Commissariat Energie Atomique|
    US5053678A|1988-03-16|1991-10-01|Hitachi, Ltd.|Microwave ion source|
    法律状态:
    2019-01-14| BA2A| Patent application published|Ref document number: 2696227 Country of ref document: ES Kind code of ref document: A1 Effective date: 20190114 |
    2019-06-12| FG2A| Definitive protection|Ref document number: 2696227 Country of ref document: ES Kind code of ref document: B2 Effective date: 20190612 |
    优先权:
    申请号 | 申请日 | 专利标题
    ES201830684A|ES2696227B2|2018-07-10|2018-07-10|INTERNAL ION SOURCE FOR LOW EROSION CYCLONES|ES201830684A| ES2696227B2|2018-07-10|2018-07-10|INTERNAL ION SOURCE FOR LOW EROSION CYCLONES|
    JP2021500717A| JP2021530839A|2018-07-10|2019-07-01|Low erosion internal ion source for cyclotron|
    PCT/ES2019/070461| WO2020012047A1|2018-07-10|2019-07-01|Low-erosion internal ion source for cyclotrons|
    US17/258,641| US20210274632A1|2018-07-10|2019-07-01|Low-erosion internal ion source for cyclotrons|
    EP19834900.3A| EP3799104A4|2018-07-10|2019-07-01|Low-erosion internal ion source for cyclotrons|
    CN201980045922.5A| CN112424901A|2018-07-10|2019-07-01|Low corrosion internal ion source for cyclotron|
    CA3105590A| CA3105590A1|2018-07-10|2019-07-01|Low-erosion internal ion source for cyclotrons|
    [返回顶部]