• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    The invention relates to a system (1) comprising two components (2) intended to be in contact by friction with each other in a given direction, friction being established in a functional area, the system (1 ) being characterized in that at least one of the two components (2) comprises on a surface in the functional area a texture formed by a succession of recesses (3a) of rounded shape separated by ridges (3b) or by a succession of bumps of rounded shape separated by recesses (3a), said recesses (3a) extending in said given direction and allowing the evacuation of debris (4) from friction and acting as a reservoir for a lubricant (5) . It also relates to the manufacturing process by deep reactive ion etching (DRIE) of said at least component (2) or of a mold, the surface defects on flanks machined by the DRIE process being exploited to produce said recesses (3a) .
    公开号:CH715242A2
    申请号:CH00975/18
    申请日:2018-08-09
    公开日:2020-02-14
    发明作者:Gandelhman Alex；Cusin Pierre；Verardo Marco
    申请人:Nivarox Sa；
    IPC主号:
    专利说明:

    Description
    TECHNICAL FIELD The present invention relates to a micromechanical component, used in particular in the watchmaking field, intended to be subjected, in use, to friction contact with another component. It also relates to its manufacturing process.
    PRIOR ART [0002] Many horological components such as the components of the escapement, the long necks, springs, etc. are subject to friction during use. Traditionally, a good invoice of such components wants that their surface of contact / friction is perfectly smooth. However, friction between two bodies generally causes the formation of wear particles forming a third body. Far from having a proven positive effect, this third body can lead to accelerated wear of the component, which has a detrimental effect on its function. To avoid this wear and reduce the friction forces which lead to losses for certain functions, lubrication is applied to the surfaces coming into friction contact with the components. However, in the configuration where two perfectly smooth friction surfaces rub against each other, the lubricant is gradually evacuated from the contact / friction zones, leading in the medium and long term to a degradation of the friction contact conditions.
    SUMMARY OF THE INVENTION The object of the present invention is to remedy the aforementioned drawbacks by proposing a system of two components in friction contact, at least one component of which is in the area intended to be subjected to friction, a topology which facilitates, on the one hand, the evacuation of the particles generated by friction, and, on the other hand, forming a reservoir for the lubricant.
    For this purpose, the component has in said area a structure in the form of wavelets. This structure defines a set of hollows extending in the direction of friction and forming as many channels allowing the evacuation of debris from friction and the flow of lubricant. The system of the invention is defined by claim 1.
    According to the invention, the structure in the form of wavelets is produced during the machining step of the component. The manufacturing process used is the DRIE deep reactive ion etching process (from the English "Deep Reactive Ion Etching"). This process induces the formation of wavelets or ripples (in English "scalloping") on the machined edge of the component. This undulation is an inherent defect in the process that the skilled person wants, according to the state of the art, to remove. To this end, the DRIE process is generally followed by an oxidation and deoxidation step aimed at smoothing the corrugated profile. Conversely, according to the invention, this step is at least partially overcome to maintain the corrugated profile which allows the evacuation of wear debris and serves as a lubricant reservoir.
    The manufacturing method according to the invention thus allows in a single step to machine the component and to texture the surface. Furthermore, the advantage of the method according to the invention is that the texturing in the form of wavelets is naturally aligned in the direction of friction on the machined edge. The method of the invention is defined by claim 12.
    The invention also relates to a mold machined with the DRIE process to form a structure in the form of wavelets on the machined sides of the mold. These molds with the texture in the form of wavelets form an imprint for the subsequent production of components by electroforming. The electroformed components thus also have a texture of shape complementary to that in wavelets with recesses serving as channels for evacuating debris and as a reservoir for the lubricant in the area where friction is established. The mold is defined by claim 9.
    [0008] In accordance with other advantageous variants of the invention:
    - The recesses are longitudinal and parallel to each other.
    - Said recesses have a depth P which is greater than or equal to 100 nm and less than or equal to 500 nm, and, preferably, less than or equal to 300 nm.
    - The succession of hollows and ridges or bumps and hollows forms a periodic structure.
    - The texture is present on a side of said at least component machined by deep reactive ion etching.
    - Each of the two components comprises said texture on a surface in the functional area, said recesses being arranged facing one another.
    - Only said at least component has said texture on its surface, the other component of the system having a smooth surface in the functional area.
    - Said at least component is based on silicon or on metallic basis.
    - The two components are watch components.
    Other features and advantages of the present invention will appear in the following description of preferred embodiments, presented by way of non-limiting example with reference to the accompanying drawings.
    CH 715 242 A2
    BRIEF DESCRIPTION OF THE FIGURES [0010]
    Figs. 1A and 1B schematically represent a two-component system with one of the two components comprising on its friction surface intended to be partially in contact with the other component a texture in the form of a train of wavelets parallel to each other according to the invention. The friction is established along a longitudinal direction parallel to the longitudinal direction of the recesses receiving the third body (fig. 1 A) and the lubricant (fig. 1 B).
    Figs. 2A and 2B represent a variant of the two-component system with one of the two components having a texture of shape complementary to that shown in FIGS. 1A and 1 B.
    Fig. 3A is a representation of a clockwork system comprising two components (escapement wheel / anchor) which have a texture according to the invention on the edges of the teeth and / or the liftings. Fig. 3B schematically represents the texture on the machined wafer;
    Fig. 4 schematically illustrates, in a known manner, the different stages of the DRIE deep reactive ion etching process.
    DETAILED DESCRIPTION The present invention relates to components based on metal or based on silicon having surfaces intended to be subjected to friction in use. The present invention thus relates more specifically to a system involving two components comprising surfaces subjected to friction in a so-called functional area. In the watchmaking field, it can, for example, be a system: escapement wheel / lever lifting, cam / feeler, ratchet / toothed wheel, jumper / disc, clutch disc / spring, brake disc / shoe, etc. The present invention also relates to molds which make it possible to produce these components by electroforming. It also relates to the process for manufacturing the components or molds.
    As shown schematically in Figs. 1A-2B, at least one of the two components 2 of the system 1 has in the functional area of its friction surface a surface topology facilitating, on the one hand, the evacuation of the particles from the third body and, on the other hand, forming a reservoir for the lubricant.
    Referring to Figs. 1A and 1B, the surface topology is formed of periodic wavelets parallel to each other with hollows 3a, also called hollows, of rounded shape separated by ridges 3b. According to this variant, the contact between the two components 2 is established at the crests 3b of the structure. The longitudinal dimension of the hollows 3a extends parallel to the direction of friction in the functional area and the hollows serve as reservoirs for the lubricant 5 and channels for the evacuation of friction debris 4. According to the invention, the depth P of the recesses which is the distance between the low point of the recess and the top of the crest is typically greater than or equal to 100 nm and less than or equal to 500 nm (FIG. 3B).
    In Figs. 2A and 2B, the structure has a succession of rounded bumps 3c separated by recesses 3a. This structure is obtained by electroforming of metallic components in molds having the structure in the form of wavelets of FIGS. 1A and 1 B. The depth P of the recesses therefore corresponds here to the distance between the low point of the recess and the top of the hump and is of course equal to the depth P mentioned above. According to this other variant, the contact between the two components 2 is established at the top of the bumps 3c of the texture.
    In the variants presented in Figs. 1A-2B, only one of the two components has recesses, the other component having in the functional area a substantially smooth friction surface. According to another variant, not shown, the two components may have recesses in this zone facing one another, forming together channels for removing debris and reservoirs for the lubricant.
    By way of illustration, FIG. 3A represents a clockwork system 1: escapement wheel 6 / anchor 7 with one or both components 6,7 which have at least on the edge 8a, 9a teeth 8 and / or lifts 9 subjected to friction a texture according to l invention (fig. 3B).
    This surface texture is obtained during the machining of the component or of the mold by the DRIE process which is a plasma etching process which comprises two successive different cycles, namely an etching cycle and a passivation cycle . The process is schematically illustrated in FIG. 4. In known manner, a blank 10 based on silicon is made available. An openwork mask 11 defining the trench to be machined is formed on the surface of the blank 10 (fig. 4a). The process then consists of the succession of the etching steps (fig. 4b) under a fluorinated gas (eg SF 6 ) and passivation (layer 12) under a fluorocarbon gas (eg C 4 F 8 ), the alternating etching and passivation steps generating the wavelet structure on the machined side. The periodicity and the depth of the hollows can, in known manner, be modulated by changing, among other things, the time of the etching and passivation sequences. (For example 6 etching - 2 passivation, or 3 "etching - 1 passivation). Preferably the duration of the etching phases are greater than the durations of the passivation phases. Typically, these recesses have a depth
    CH 715 242 A2
    P between 100 and 1000 nm and preferably of the order of a few hundred nanometers with a recess periodicity of between 1.5 and 6 μm and preferably of the order of 3 μm.
    Optionally, to reduce the depth of the recesses, without eliminating the surface roughness, an oxidation step followed by a deoxidation can be envisaged (not shown). This step consists of carrying out thermal oxidation at temperatures typically between 900 and 1200 ° C followed by chemical deoxidation typically in hydrofluoric acid. By way of example, the depth P of the hollows can thus be reduced from 300 nm to 100-200 nm during this step.
    Then, when the aforementioned method is used to manufacture a mold, the method further comprises a step of electroforming deposition of a metal alloy on the textured face of the mold to produce the component comprising on the surface a succession of bumps and of hollows.
    Legend [1] Component system (2) Component (3) So-called wavy texture
    a) Digging
    b) Crest
    c) Bump (4) Debris (5) Lubricant (6) Exhaust wheel (7) Anchor (8) Exhaust wheel tooth
    at. Slice or flank (9) Lifting of the anchor
    at. Slice or flank (10) Rough (11) Mask (12) Passivation layer
    权利要求:
    Claims (15)
    [1]
    Claims
    1. System (1) comprising two components (2) intended to be in frictional contact by friction surfaces relative to one another in a given friction direction, the friction being established in a so-called functional area , the system (1) being characterized in that at least one of the two components (2) comprises in the functional area a surface having a texture formed by a succession of recesses (3a) of rounded shape separated by ridges (3b ) or a succession of bumps (3c) of rounded shape separated by recesses (3a), said ditches (3a) extending parallel to said given direction and allowing the evacuation of debris (4) from friction and making reservoir office for a lubricant (5).
    [2]
    2. System (1) according to claim 1 characterized in that the recesses (3a) are longitudinal and parallel to each other.
    [3]
    3. System (1) according to claim 1 or 2, characterized in that said recesses (3a) have a depth P which is greater than or equal to 100 nm and less than or equal to 1000 nm, and, preferably, less than or equal at 300 nm.
    [4]
    4. System (1) according to one of claims 1 to 3, characterized in that the succession of hollows (3a) and ridges (3b) or bumps (3c) and hollows (3a) form a periodic structure.
    CH 715 242 A2
    [5]
    5. System (1) according to any one of the preceding claims, characterized in that the texture is present on a side (8a, 9a) of said at least component (2) machined by deep reactive ion etching.
    [6]
    6. System (1) according to any one of the preceding claims, characterized in that each of the two components (2) comprises said texture on a surface in the functional area, said recesses (3a) being arranged opposite one another on the other .
    [7]
    7. System (1) according to any one of claims 1 to 5, characterized in that only said at least component (2) has on its surface said texture, the other component (2) of the system (1) having a smooth surface in the functional area.
    [8]
    8. System (1) according to any one of the preceding claims, characterized in that said at least component (2) is based on silicon or on metal base.
    [9]
    9. System (1) according to any one of the preceding claims, characterized in that the two components (2) are watch components.
    [10]
    10. Timepiece comprising the system (1) according to claim 9.
    [11]
    11. Mold intended to produce said at least component (2) comprising a succession of bumps (3c) of rounded shape separated by recesses (3a) according to any one of claims 1 to 9, the mold comprising on one of its faces an imprint with said texture formed by a succession of hollows (3a) of rounded shape separated by ridges (3b).
    [12]
    12. A method of manufacturing a mold or a component (2) respectively based on silicon, the method comprising the following steps;
    (a) Provision of a blank (10) based on silicon, (b) Machining of flanks (8a, 9a) on said blank (10) by the deep reactive ion etching method to produce the mold or the component (2), said machined flanks (8a, 9a) having a texture in the form of wavelets inherent in the deep reactive ion etching method, said texture defining on the machined flanks (8a, 9a) a set of recesses (3a) of a depth P, said method being characterized in that at the end of the manufacturing process, said recesses (3a) are maintained on the machined sides (8a, 9a) of the mold or of the component (2) so as to form on said machined sides (8a, 9a) of the channels capable of collecting debris (4) or receiving a lubricant (5).
    [13]
    13. Method according to claim 12, characterized in that at the end of the manufacturing process, said recesses (3a) on the machined sides (8a, 9a) of the mold or of the component (2) have a depth P greater than or equal to 100 nm and less than or equal to 1000 nm, and preferably less than or equal to 300 nm.
    [14]
    14. Method according to claim 12 or 13, characterized in that the machining step (b) is followed by an oxidation and deoxidation step (c) making it possible to reduce the depth P of the recesses (3a), the depth P being maintained at a value greater than or equal to 100 nm at the end of said step (c).
    [15]
    15. The method of claim 13 or 14 for the manufacture of a mold, characterized in that after step (b) or step (c), a step of electroforming of a metal alloy on the machined sides (8a, 9a) of the mold to produce another component (2).
    CH 715 242 A2
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    法律状态:
    优先权:
    申请号 | 申请日 | 专利标题
    EP18188355.4A|EP3608727A1|2018-08-09|2018-08-09|Component, in particular for a timepiece, with a surface topology and manufacturing method thereof|
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