![]() A method for cleaning an embedded in a technical system vacuum pump and purification system for perf
专利摘要:
The invention relates to a method for cleaning a vacuum pump (2) embedded in a technical system. For cleaning, water is provided, and a rotational speed of the vacuum pump is set to a value in a cleaning rotational speed range. A defined amount of cold water and / or hot water is supplied to the vacuum pump and the vacuum pump is flushed with the water for a predetermined period of time. After the water has been released from the vacuum pump (2), the vacuum pump is dried by aeration with a gas or gas mixture. The invention also relates to a cleaning system (1) for carrying out the method. 公开号:CH705290B1 申请号:CH01088/12 申请日:2012-07-17 公开日:2016-05-31 发明作者:Ehrmann Elmar;Kirmse Herbert;Wölfle Johann 申请人:Multivac Sepp Haggenmüller Gmbh & Co Kg; IPC主号:
专利说明:
The present invention relates to a method having the features of claim 1 and to a cleaning system according to the preamble of claim 9. It is known that in the production facilities of the food industry high standards of hygiene must be met in order to reduce the risk of bacterial contamination of the food to be produced or packaged. Because organic substances, such as food or pharmaceutical products processed, they can come in many possible ways with bacteria or other microorganisms in contact. Likewise, the production equipment that comes in contact with these products during processing must be cleaned regularly and very thoroughly. In order to meaningfully integrate this cleaning into the production process, a procedure known as Cleaning-In-Place (CIP) is known and widely used, which makes it possible to carry out cleaning, sterilization and disinfection processes within closed production plants. From DE 68 905 158 T2 a washing and cleaning system on packaging machines is known. In it, the visible facilities of a packaging machine are cleaned by means of washing nozzles with washing liquids. The disadvantage of this is that only the visible parts of the packaging machine are cleaned. A CIP system, which is suitable for the internal and external cleaning of a filling system, describes the DE 69 809 668 T2. The ClP system includes several subsystems to clean out areas of the filling system from outside and inside. It is also known that vacuum pumps are used for evacuating packaging within packaging machines. Various embodiments of such vacuum pumps are known. For example, EP 1 307 657 B1 describes a screw vacuum pump. From DE 10 207 929 A1 further side channel compressor and Roots pumps are known. Each of the aforementioned vacuum pumps is dry running, i. It works without the use of operating fluid. If these vacuum pumps are used for the evacuation of food packaging, a filter system can not ensure beyond doubt that the vacuum pumps integrated in the packaging machine or in the vicinity remain free from contamination. Rather, it must be feared that these are regularly contaminated during operation of the packaging machine, since liquids or product residues can be sucked. It would therefore be desirable that a vacuum pump with a ClP system can be cleaned. The object of the invention is therefore to provide a method for CIP for a vacuum pump. This object is achieved by a method having the features of claim 1 and by a cleaning system having the features of claim 9. In the inventive method for cleaning a in a technical system, such as a packaging machine, embedded vacuum pump, the following steps are provided:Providing water;Setting a speed of the vacuum pump to a value in a cleaning speed range;Supplying a defined amount of the water;Purging the vacuum pump with the water for a predetermined period of time;Allowing the water to escape from the vacuum pump;Dry the vacuum pump by venting it with a gas or gas mixture. An advantage of the inventive method is that the water provided is supplied in a defined amount, as this overfilling of the vacuum pump is avoided. It has proven to be expedient if the water provided is hot water, that is to say water having a temperature of at least 35 ° C. However, it can also be cold water, that is water with a temperature below 35 ° C, provided. That the speed of the vacuum pump is set to a value in a cleaning speed range, avoids overpressure within the pump, which would result in too high speeds due to high fluid velocities and an associated increase in hydrodynamic pressure. If the period of time for purging the vacuum pump is predetermined, this allows a situational purging of the pump to save time and energy. To make the subsequent drying more efficient, it is advantageous to let the water escape in advance. The drying of the vacuum pump is particularly advantageous by venting the same with compressed air, a gas or gas mixture, since they favor evaporation or convection. For coarse impurities it may be expedient if, in addition to the water, a cleaning agent and / or a disinfectant are provided. Thus, a rinse solution from the water may be mixed with either an amount of the cleaning agent and optionally an amount of the disinfectant in a separate but integrated supply unit. It when the cleaning of the vacuum pump by means of cleaning-in-place (CIP) is performed is particularly advantageous. This allows a particularly efficient cleaning of the pump and reduces the labor and time required because the pump does not have to be dismantled before cleaning. It has been found that it is expedient if the speed of the vacuum pump is set to a cleaning speed which is lower than the operating speed, as this pressure conditions are created within the vacuum pump, for example, the cavitative damage to the pump in consequence high avoid local pressures. A particularly advantageous variant of the invention provides that a degree of contamination of the vacuum pump is determined and maintained as information. This information may be used, for example, as a parameter for adjusting the duration of purging. For flushing, it may be particularly useful if a predetermined period of time is set for it. This allows a situational flushing of the pump and thus creates a high time and energy efficiency. Advantageously, a stored and retrievable cleaning program is kept in a machine control of the packaging machine. It has been found that air, nitrogen or CO2 are particularly well suited for aerating and drying the vacuum pump. These gases or gas mixtures are on the one hand in the procurement and on the other hand, easy and safe to store and handle. For the life of the vacuum pump, it may be advantageous if the vacuum pump after drying a corrosive agent is supplied. Thus, the removed by cleaning the pump corrosive agent can be renewed. A particularly advantageous variant of the invention provides that the cleaning of a control device, which may also be the machine control, is controlled and / or monitored in the system. Depending on the computing capacity, a control device can take into account a number of parameters, for example the degree of contamination, and enable efficient cleaning. It is particularly expedient if the mixing of the rinsing solution takes place on the basis of the degree of contamination which is stored and provided by the control device. This reduces the amount of detergent and disinfectant to a required minimum. Also, it may be advantageous if the predetermined period of time for rinsing is adjusted automatically by the control device. Due to suitable parameters, such as the degree of contamination, the time can be limited to a required minimum. The inventive cleaning system for performing the method is characterized by a control device, a supply unit and a fluid reservoir for gas or gas mixtures as gaseous fluids (eg air) for drying the vacuum pump, wherein the supply unit at least one fluid reservoir for water as a liquid fluid for Rinsing the vacuum pump, a connected to a line to the fluid reservoir for water valve and a connected to a line connected to the valve feed pump comprises. With the cleaning system configured in this way, a particularly thorough, time-saving and resource-saving cleaning of a vacuum pump can be achieved. It is also advantageous that the cleaning can be carried out without dismantling the vacuum pump. In order to meet even the strictest hygiene requirements and to allow a particularly thorough cleaning and / or disinfection of the vacuum pump, provides an advantageous variant of the cleaning system that the supply unit additionally one or more fluid reservoir for a cleaning and / or Disinfectant comprises, wherein the supply unit is set up for the mixing of the cleaning and / or disinfecting agent. A particularly advantageous variant of the cleaning system provides that a check valve is provided in a vacuum line of the vacuum pump. Thus, the flow direction of the rinsing solution is specified and effectively prevents backflow of the rinsing solution contaminated in the pump. Embodiments of the invention are illustrated in the drawings and will be described in more detail below. In detail show:<Tb> FIG. 1 <SEP> a schematically illustrated, inventive cleaning system for cleaning a vacuum pump,<Tb> FIG. 2 <SEP> a detail of a highly schematic illustrated sealing station of a packaging machine with a cleaning system according to the invention for cleaning a vacuum pump. Fig. 1 shows an embedded in a technical system 100, for example a packaging machine, i. integrated, inventive cleaning system 1 for cleaning a vacuum pump 2. The cleaning system 1 has a plurality of valves 3, 4, 5, 6. The valves 3, 4, 5, 6 are in this embodiment, two / two-way valves, for example, operated electrically pilot operated. The valves 3, 4, 5, 6 are connected on their inflow side in each case via a line 7, 8, 9, 10, each with a memory 7a, 8a, 9a, 10a. The line 7 serves to supply the valve 3 with water, preferably hot water with a water temperature of at least 35 ° C or at least 40 ° C, which is supplied from a memory 7a. A heater 7b, which is integrated in the memory 7a, heats the water to the corresponding water temperature. The line 8 connected to the valve 4 supplies the valve 4 with cleaning agent from a detergent reservoir 8a, which preferably contains additives for the prevention of corrosion and / or cavitation. The line 9 is connected to a storage 9a for disinfectant and makes this the valve 5 available. The valve 6 is supplied via a connected line 10 with a gas or gas mixture from the memory 10a. The valves 3, 4, 5 are connected via further lines 11, 12, 13 to a supply unit 15, wherein the supply unit 15 is connected by means of a manifold 16 to the vacuum pump 2. The valve 6 is connected via a line 14 to the manifold 16. In order to regulate the line pressure in the lines 11, 12, 13, throttle valves 17, 18, 19 are provided whose cross-section can be adjusted continuously or in stages. In order to convey the water, the cleaning agent and the disinfectant, pumps 11a, 12a, 13a are provided in the lines 11, 12, 13. Further, the lines 11, 12, 13, 14 are connected by means of the manifold 16 to the vacuum pump 2. Furthermore, the cleaning system 1 has a check valve 20 in order to define a flow direction of a rinsing solution or of a gas supplied via the valve 6 to the vacuum pump 2. The vacuum pump 2 further has an integrated, i. via a discharge device 21, which is arranged in the interior of the vacuum pump 2 and is arranged to discharge the rinsing solution. The outflow device 21 may be for example a spray device or a vacuum connection. 2, a detail of a sealing station 22 is shown in a highly schematic manner, as used for example in the packaging machine 100 suitable for foodstuffs. The sealing station 22 has a tool 23 for evacuating the packaging 24. The tool 23 has a sealing tool upper part 25 and a sealing tool lower part 26, wherein a plurality of suction channels 27 are connected to the sealing tool lower part 26. The suction channels 27 are connected to a vacuum chamber 28, wherein in the vacuum chamber 28 with the via the manifold 16 of the cleaning system 1 and a vacuum line 29 connected thereto by means of a flange vacuum pump 2, a vacuum can be generated. For the control of the sealing station 22 as well as of the cleaning system 1 integrated into the packaging machine 100, a control device 30 is provided, which preferably also serves to control the packaging machine 100 at the same time. The control device 30 furthermore has one or more sensors 31, for example for measuring an impurity level, the sensors 31 preferably being arranged in the interior of the vacuum pump 2. The general cleaning method with the cleaning system 1 will be briefly described below. Due to impurities that arise through the smallest openings or the vacuum line 25 in the vacuum pump 2, a regular cleaning of the vacuum pump 2 is necessary. The cleaning of the vacuum pump is preferably carried out at intervals, for example with each machine start. Alternatively, the controller 30 may determine a degree of contamination of the vacuum pump 2 via the one or more sensors 31. If a defined threshold value is exceeded, cleaning of the vacuum pump 2 is initiated at the earliest possible time, which may be, for example, after the end of a production unit. Depending on parameters, taking into account, for example, an amount of liquid required for cleaning the vacuum pump 2, the speed of the vacuum pump 2 is set to a value in a cleaning speed range lower than the rated or operating speed of the vacuum pump 2. The held in the memory 8a detergent is supplied to the supply unit 15 by opening the valve 4 depending on the degree of contamination in a coordinated amount. If the control device 30 decides that a disinfectant is also to be supplied, the valve 5 is controlled electronically in such a way that a defined amount of the disinfectant flows into the supply unit 15. By activating the valve 3, the supply unit 15 can be supplied with a certain amount of water. A rinsing solution so mixed with detergent and / or disinfectant and / or water is fed to the vacuum pump 2. The vacuum pump 2 continues to run at its above-defined cleaning speed, so that a thorough cleaning and possibly a disinfection is possible. The controller 30 determines, based on parameters such as the degree of contamination, for what period of time a purging of the vacuum pump 2 is performed. When the predetermined period for purging the vacuum pump 2 is reached, the purging solution is allowed to escape from the vacuum pump 2. After the escape of the rinsing solution from the vacuum pump 2, a gas or gas mixture to the vacuum pump 2 is performed by opening the valve 6. This can be done either via a gas pressure, with which the line 14 is acted upon, or by means of a feed pump. By introducing the gas or the gas mixture, the vacuum pump 2 is internally dried by convection. The check valve 20, which is arranged in the vacuum line 25, avoids during the entire cleaning of the vacuum pump 2 that liquids or gases reach the vacuum chamber 28. For some types of vacuum pump 2, it may be useful if after drying the vacuum pump 2 of the same a corrosion agent for renewal of the removed corrosive agent is supplied. It is also conceivable that a plurality of vacuum pumps 2 are used within or in the vicinity of the packaging machine or the technical system 100. Further, the controller 30 may be integrated into a controller of the entire packaging machine 100.
权利要求:
Claims (13) [1] Method for cleaning a vacuum pump (2) embedded in a technical system (100), in particular in a packaging machine, comprising:Providing water;Setting a speed of the vacuum pump (2) to a value in a cleaning speed range;Supplying a defined amount of the water;Purging the vacuum pump (2) with the water for a predetermined period of time;Allowing the water to escape from the vacuum pump (2);Dry the vacuum pump (2) by aerating it with a gas or gas mixture. [2] 2. The method according to claim 1, characterized in that additionally cleaning agents and / or disinfectants are provided, wherein a rinsing solution in a supply unit (15) of the system (100) is mixed, and wherein the rinsing solution, an amount of water and an amount of the cleaning agent and / or an amount of the disinfectant. [3] 3. The method according to claim 1 or 2, characterized in that the rotational speed of the vacuum pump (2) is set to a cleaning speed, which is lower than the operating speed. [4] 4. The method according to any one of the preceding claims, characterized in that a degree of contamination of the vacuum pump (2) is determined and maintained as information. [5] 5. The method according to any one of the preceding claims, characterized in that the gas or gas mixture is ambient air, nitrogen or CO2. [6] 6. The method according to any one of the preceding claims, characterized in that the predetermined period of time for purging the vacuum pump (2), for example, as a function of a determined degree of contamination of the vacuum pump (2) is set. [7] 7. The method according to any one of the preceding claims, characterized in that the cleaning of a control device (30) is controlled and / or monitored. [8] 8. The method according to claim 7, characterized in that the predetermined period of time for purging of the control device (30) is set. [9] 9. A cleaning system (1) for carrying out a method according to one of claims 7 or 8, comprising a control device (30), a supply unit (15) and a fluid reservoir (10a) for gas or gas mixtures as gaseous fluids for drying the vacuum pump, wherein the Supply unit (15) at least one fluid reservoir (7a) for water as a liquid fluid for purging the vacuum pump, a connected to a line (7) to the fluid reservoir (7a) for water valve (3) and one with a conduit (11) on the Valve (3) connected to the feed pump (11a) comprises. [10] 10. A cleaning system according to claim 9, characterized in that the supply unit (15) further comprises one or more fluid reservoirs (8a, 9a) for a cleaning and / or a disinfectant and the supply unit (15) for mixing a rinsing solution using a Amount of water and a quantity of the cleaning and / or disinfecting agent is set up. [11] 11. Cleaning system according to claim 9 or 10, characterized in that further comprises a check valve (20) in a vacuum line (29) for use for the vacuum pump (2) is provided. [12] Cleaning system according to one of the preceding claims 9 to 11, characterized in that one or more sensors (31), for example for determining a degree of contamination of the vacuum pump (2), are provided, the control device (30) being arranged to to interact with the one or more sensors (31). [13] 13. Packaging machine (100) with a vacuum pump (2) and a cleaning system (1) according to one of claims 9 to 12.
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同族专利:
公开号 | 公开日 CH705290A2|2013-01-31| DE102011108092A1|2013-01-24| US20130019900A1|2013-01-24|
引用文献:
公开号 | 申请日 | 公开日 | 申请人 | 专利标题 DD263272A| SE462740B|1988-12-21|1990-08-27|Roby Teknik Ab|DISC AND CLEANING SYSTEM FOR A PACKAGING MACHINE| DE19522554A1|1995-06-21|1997-01-02|Sihi Ind Consult Gmbh|Compressor operative chamber surface cleaning method| DE19741242C1|1997-09-18|1999-07-08|Diversey Lever Gmbh|Plant for cleaning a bottling plant| DE10039006A1|2000-08-10|2002-02-21|Leybold Vakuum Gmbh|Two-shaft vacuum pump| DE10155757A1|2001-11-14|2003-05-22|Convenience Food Sys Wallau|Process for cleaning and / or disinfecting the vacuum channels of a sealing station| DE10207929A1|2002-02-23|2003-09-04|Leybold Vakuum Gmbh|vacuum pump| AU2003269250A1|2002-10-14|2004-05-04|The Boc Group Plc|Rotary piston vacuum pump with washing installation| GB0408651D0|2004-04-16|2004-05-19|Lauzon Normand|Cleaning method and system for use with piping systems| DE102004063058A1|2004-12-22|2006-07-13|Leybold Vacuum Gmbh|Method for cleaning a vacuum screw pump| WO2007088989A1|2006-01-31|2007-08-09|Ebara Densan Ltd.|Vacuum pump unit| CN201200981Y|2008-06-06|2009-03-04|中国科学院沈阳科学仪器研制中心有限公司|Cleaner of multilevel dry-type vacuum pump| DE102008030788A1|2008-06-28|2009-12-31|Oerlikon Leybold Vacuum Gmbh|Method for cleaning vacuum pumps|FR2993614B1|2012-07-19|2018-06-15|Pfeiffer Vacuum|METHOD AND APPARATUS FOR PUMPING A CHAMBER OF PROCESSES| DE102016102954A1|2016-02-19|2017-08-24|Multivac Sepp Haggenmüller Se & Co. Kg|vacuum pump| DE102018110227A1|2018-04-27|2019-10-31|Multivac Sepp Haggenmüller Se & Co. Kg|Packaging machine for packaging products in plastic packaging|
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申请号 | 申请日 | 专利标题 DE102011108092A|DE102011108092A1|2011-07-19|2011-07-19|Cleaning method and system for vacuum pump| 相关专利
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