• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    For adhering an object (3) to a slide (15) in a stereolithographic process, wherein the object (3) is formed by hardening a photosensitive substance (5) by curing radiation, at least in a partial region on the slide (15) a secondary radiation in a direction different from the direction of the curing radiation to the slide (15).
    公开号:AT518051A4
    申请号:T50350/2016
    申请日:2016-04-19
    公开日:2017-07-15
    发明作者:Klaus Stadlmann Dr
    申请人:Klaus Stadlmann Dr；
    IPC主号:
    专利说明:

    The invention relates to a stereolithography apparatus for producing a three-dimensional body by layered or continuous curing and to improve the adhesion of the body to be generated on a building platform by radiation, which is suitable for solidification of a photo-reactive substance.
    Methods and devices are known which aim to increase the adhesion of the component layers at the beginning of a stereolithographic process. An example of this is the method described in WO 2010/045951. In this case, light is coupled into a photoreactive substance from above through a construction platform whose underside is light-permeable.
    This has the consequence that the additional radiation allows a better adhesion of the first component layers. However, the solution described in this document has several disadvantages, for example, the light source is in the build platform itself and is moved with this, although the light source is used only during the first component layers. This requires power to the build platform. Furthermore, by integrating the light source into the build platform itself, its cost is substantially increased and no system can be created which allows one-time use. Also, the construction platform can not or only with difficulty placed at the same time with the part thereon in a cleaning system or the like., Since it can come to the penetration of the cleaning liquid in the construction platform and the contamination of the light source.
    The present invention aims to solve the problems and problems known from the prior art, to allow a better and more economical integration of the device in a plant concept for the production of three-dimensional objects and a better adhesion of the first Objektschich-th during a building process to guarantee the use of new methods.
    In the case of the stereolithography apparatus of the type described above, this object is achieved, in particular, by allowing the curing of a photoreactive substance by means of a further light source (secondary light source). In this case, the light sources are not in the slide, the light sources may be located at a local distance and may for example be arranged around the slide, wherein the slide has a plurality of at least partially translucent openings or windows through which the light are coupled or decoupled can. For example, the slide may be moved independently of the secondary light source and / or the primary light source, and both light sources may be arranged and configured to permit irradiation of the slide or coupling light over a range that includes at least the first and second light sources or the first two, five, ten or twenty component layer (s).
    By "light" or "radiation" is meant here any type of electromagnetic radiation, such as e.g. ultraviolet radiation or infrared radiation. The light sources have at least one radiation emitter, such as an LED, that can emit radiation in at least a certain wavelength range; Preferably, the light sources have a plurality of radiation sources, such as a plurality of LEDs with different wavelengths and radiation behavior, so that an entire wavelength range of, for example, 365 nm to 405 nm can be covered or selectively addressed. Preferably, a wavelength is used for coupling into the construction platform, which allows a deeper through hardening of the photoreactive substance. For example, this can be accomplished by having the central wavelength in a wavelength range in which the photoinitiator (photoinitiator) used is less potent (e.g., 405nm). If appropriate, the central wavelength, for example in the UV range around 5 nm, 10 nm, 20 nm, 40 nm or more, depending on the photoinitiator used, can differ from the primary radiation used for curing the photoactive substance. In the context of the invention, the light sources can be controlled in time and / or in their intensity and independently of each other.
    The construction platform is structurally preferably configured such that the most efficient and low-scattering coupling of the radiation can be made possible. In particular, the construction
    Platform is designed so that it acts as a kind of "light guide" and, for example, has a chamber in which an at least partially reflective surface (such as a mirror foil, mirror plate, etc.) or for example a spatially adjustable mirror is located coupled to the building platform or the object carrier that a variation of the local intensity maxima can be achieved, for example, by changing the position of the slide, by changing the angle of incidence of the radiation, and / or by a local change of a deflection mirror within the Slides, by changing the LED current, by the present in the primary light source DMD done.
    Preferably, both light sources, if any, for other purposes, such as the illumination of the interior, the signaling of a process stage (eg completion of the object, process break and process termination), for curing the remaining photo-reactive substance and for the re-exposure of generated components and, for example, as a light source in combination with a camera for 3D scanning of the generated component can be used. For this purpose, for example, at least one of the light sources used, depending on the desired function, corresponding to at least one radiation source (LED) with a central wavelength can be constructed, and / or be provided with an optical system, and it can be targeted in terms of intensity, the radiation duration, optionally with respect to the radiation pattern (eg a line pattern) and the position of the radiation input are controlled by a control individually or in sections (eg according to rows and columns of an LED array). This allows a location-dependent, intensity-dependent and time-dependent radiation entry into the construction platform as well as the possibility to radiate at different positions of the LED array or to couple radiation and / or to use different emitters or wavelengths. Thus, for example, when using at least one UV-LED panel only the radiation area can be controlled, which can be coupled into the slide at the corresponding position; At a later time, such as after completion of the three-dimensional body and corresponding post-treatment steps (cleaning of the object, etc.), the generated object by, for example, control of all UV LEDs or all panels used, for example by means of the secondary light source , and possibly the primary light source, be post-exposed.
    More particularly, the present method is characterized in that, for adhesion of the object at least in a partial area on the slide, a secondary radiation is irradiated in a direction different from the direction of the curing radiation to the slide. It is advantageous if the secondary radiation is supplied to the generally plate-shaped, radiation-transparent slide laterally, wherein preferably the secondary radiation is deflected within the slide. In view of a simple, inexpensive design is further preferred that the secondary radiation is derived from the curing radiation. On the other hand, it is also often favorable if a radiation independent of the curing radiation is used as the secondary radiation. It is also advantageous if the secondary radiation is supplied to the slide via a light guide. It can also be provided that the secondary radiation is adjusted during the adhesion process via an adhesion region.
    To carry out the method, in particular a device is used, which is characterized by a secondary radiation source arranged laterally at a distance from the specimen slide, and in that the specimen slide is at least partially permeable to the secondary radiation. It is also advantageous if the secondary radiation source is formed by a light guide. In this case, it is furthermore advantageous if the optical waveguide is connected in a manner conducting with a main lithography radiation source.
    On the other hand, it is advantageous if a secondary radiation source independent of a main radiation source is provided.
    It is also advantageous if the slide is partially transparent to the radiation and at least partially reflective, in order to redirect the secondary radiation to an adhesion region for the object. It is also advantageous if the Objektträ ger contains a mirror surface. It is also advantageous if the mirror surface is designed to be diffuse mirror-like. On the other hand, it can also be provided that the slide contains a movably arranged deflecting mirror. Finally, it is preferred that the slide has an adhesion base plate that is at least partially permeable to the radiation.
    The invention will be further elucidated on the basis of preferred exemplary embodiments and with reference to the drawing, in which:
    1 is a schematic view of a stereolithography apparatus; FIGS. 2, 3 and 4 are views of embodiments of such apparatus modified from FIG. 1;
    Fig. 5 and Fig. 5a variants of the invention, in terms of the form of irradiation; and FIGS. 6 to 10 variants of radiation coupling into a construction platform;
    1 shows, by way of example, an exemplary embodiment of a stereolithography apparatus 1, partially in a sectional view, this apparatus 1 for generating in layers at least one three-dimensional body or object 3 from individual layers 31, 32, etc., summarized as 3if is configured, which is prepared by selectively solidifying or curing a photo-reactive substance 5, which is located in a trough 7, wherein by means of a primary light source 9 and optionally with the aid of a deflection mirror 11, a layer information is generated. The primary light source 9 may be a controllable laser, preferably a pixel-based digital mask projection unit. The primary light source 9 can be controlled via a control device 13. The photosensitive substance 5 is liquid, the term "liquid" meaning all liquids of any viscosity, including pasty substances, as well as filled or pigmented liquids The primary light source 9 consists for example of a radiation emitter 9 '(eg a UV LED). and a mask exposure device 9 '' such as a DMD (Digital Mirror Device) - or a DLP (Digital Light Process Singing) - structure, which is able to produce a pixel-based image.
    The generated, hardened by the primary light source 9 layers 3i adhere to a serving as a slide construction platform 15, which is also at least partially transparent to the radiation of at least one laterally disposed secondary light source 17 and at least partially designed to be mirrored to allow in that the secondary radiation of the light source 17 can escape downwards through the at least partially transparent bottom plate 19 of the construction platform 15. By secondary radiation radiation is understood, which is also suitable for curing the photo-reactive substance 5, at least one central wavelength (eg 405nm) and at least one radiation source type (eg LED) and, preferably independent of the primary light source 9, by the control device 13 can be controlled. In the embodiment shown in FIG. 1, the secondary radiation is deflected by, for example, a reflector 21 (eg, a mirror, a specular foil, or through the interior itself) located inside the build platform 9, in a secondary radiation space 23 is formed by this.
    The primary light source 9 is shown in FIG. 1 below the tub 7 in a machine room 25, and it may, for example on a frame 27, be arranged to be movable.
    According to FIG. 1, the secondary radiation source 17 is arranged so that it can introduce secondary radiation into the construction platform 15, at least over a certain range, for example at the beginning of the building process (eg over the first 2, 5, 10 or 20 layers), and at least only temporarily in direct contact with the building platform 15, preferably at a distance A (eg 0.1 mm, 1 mm up to 10 mm - depending on the embodiment) is arranged to the building platform 15. The construction platform 15 can be raised or lowered in accordance with the process progress by an actuator 27 and with the aid of the control device 13, for example, with respect to the trough 7.
    The secondary radiation source 17 can, as shown in FIG. 1, be attached to the machine frame 27 at a suitable location, for example, and it transmits the secondary radiation, for example through a protective window 29, whereby optical elements (lenses, scattering plates, Optical fiber, etc.) between the secondary radiation source 17 and the building platform 15 may be arranged.
    By an appropriate arrangement and the use of multiple secondary radiation sources 17 or by splitting the secondary radiation, a nearly annular illumination of the building platform 15 can be made possible by the lateral coupling of several sides.
    Fig. 2 shows an embodiment of a stereolithography apparatus 101 in which at least one secondary radiation source 17 is arranged, for example, below the building platform 15 in the frame 27 and the secondary radiation is transmitted through at least one light guide 31 (e.g.
    Light bar), which is designed to be at least partially transparent to the secondary radiation, wherein optionally, as shown in Figure 2, a 90 ° deflection is possible to couple secondary radiation at least from one side into the construction platform 15. The optical fiber 31 may be detachably connected to the frame 27 and the secondary light source 17, respectively. This arrangement protects the secondary light source 17 from soiling and enables the decoupling surface of the light guide 31 to be formed geometrically and optically (e.g., circular, rectangular, lenticular, etc.) and coupled at a certain angle by its geometric configuration; Preferably, the geometry of the light guide 31 is designed so that as far as possible no stray radiation can escape. The light conductor 31, which is preferably made in one piece, can be provided with a shell, lacquer layer, etc., which is not transparent and / or reflective for the secondary radiation, in order to prevent the leakage of stray radiation and to the light emission of secondary radiation from the end face 31 ' maximize.
    Fig. 3 shows another embodiment of a stereolithography apparatus 102, in which the secondary radiation on one side, for example from below by means of an edge portion 33 of the
    Trough 7 deflected, in particular preferably with at least one and at least one piece executed, for the secondary radiation at least partially transparent edge portion 33 of the tub 7, which acts as a light guide for the secondary radiation, so in the construction platform 15 laterally at least at one point can be coupled. The edge portion 33 of the trough 7 can be used to minimize or prevent the spread of stray radiation within the trough 7 and / or through the trough 7, which could lead to unwanted activation of the photosensitive substance 5, preferably by at least one non-transparent, e.g. at least one partially reflective sidewall and / or resist layers, e.g. 35, 37, be shielded so that only a lateral irradiation takes place in the building platform 15 via the end face 33 '.
    The illustrated in Fig. 4 stereolithography apparatus 103 has a movable and optionally focusable light source 9 (shown here as a system unit), by the control unit 13 and by means of at least one linear motor 39, which may be attached to the frame 27, for example Position X can be moved in the machine room 25 and / or their focus can be adjusted by the controller 13 to initiate primary radiation using the Lichtwelllenlei-33 as "secondary radiation" in the construction platform 15. In another variant, for example a special exposure image, eg a partial image or an edge-zone image, see Fig. 5 and Fig. 5a, are used to emit primary radiation emitted by the light source 9, optionally via an at least partially movable mirror system to guide into the light guide 33, where the radiated image need not be focused. After successful coupling of S Radiation in the optical waveguide 33, the light source 9 is moved back by the control unit 13 by means of the linear unit 39, for example, in its original position. Preferably, the primary radiation source 9 is designed to be focusable and movable, more preferably, e.g. by movement of a deflection mirror, not shown, or by folding away a deflection mirror, the primary radiation directly coupled with or without movement of the light source 9 in the light guide 33.
    5 and 5a show possible examples of an exposure mask 41 or 41 'which serves for coupling primary radiation into at least one optical waveguide 33 (see FIG. 4) and thus for illuminating the construction platform 15 with primary radiation, wherein, for example, the region 47 or 47 'can be used for coupling, and wherein at least partially a layer information 45 or 45' to form a component layer 3 ± and optionally an unexposed area 43, 43 'may be present. With the aid of the exposed area 47, 47 ', the primary radiation is introduced into the optical waveguide, in which case the coupled wavelength corresponds to the wavelengths used for curing the layer, e.g. 388 nm; Preferably, the primary light source 9 may additionally emit a second radiation having a different wavelength (e.g., 405nm) which is at least used to illuminate the build platform 15.
    6 shows an advantageous embodiment variant of a building platform 151, in which a secondary radiation space 23 is formed, which may be at least partially equipped with a diffusely reflecting, partially curved surface 211, for example a reflective film 21 'or coating, which surrounds the side Secondary radiation as evenly as possible radiates over the at least partially transparent bottom plate 19. In this case, laterally a window 39 can at least partially close off the secondary radiation space 23 and be at least partially permeable to the secondary radiation, in order to allow radiation to be coupled in. For example, at least one LED (e.g., UV LED) or a lamp (e.g., a UVC lamp) protected by a protective window 29 serves as a secondary radiation source 17.
    7 shows a further variant of the building platform 152, with a movable reflector 21 '' (eg a mirror), which can be inclined at an angle α (eg 45 °) to the bottom plate 19 so as to enable illumination of the bottom plate 19 , The light source 17 preferably has an at least partially collimated beam path.
    8, a multi-part embodiment of the construction platform 153 is shown in a schematic diagram, similar to FIG. 7, wherein an LED panel 17, in particular with individual LEDs 17 ', 17' ', 17', is provided to provide the secondary radiation. '' etc., is used, which consists of at least one LED type with a central wavelength, but preferably from different LED types, with different central wavelengths, eg 365, 405, 388nm, can be built. The build platform 152 is e.g. but also in several parts, and a shell-shaped lower part 49 can be separated together with the additional windows 17, 39 and a holder 20 'of the building platform 153. The shell-shaped lower part 49 may also be formed in one piece, for example by a transparent plastic part.
    FIG. 9 shows an embodiment variant of the building platform 154, in which there is a mirror 21 '' ', which is inclined at an angle β to the base plate 19 and is located in the secondary radiation space 23. This variant has, for example, an optical system 51 which is designed to collimate the secondary radiation.
    In Fig. 10, finally, an embodiment of the structural panel 154 is illustrated, in which the secondary radiation, s. LED unit 17, in turn laterally coupled into the hollow building platform 154, via an optical waveguide 33 'with total reflection of the injected from the LED unit 17 radiation.
    权利要求:
    Claims (16)
    [1]
    claims
    A method of adhering an object (3) to a slide (15) in a stereolithographic process, wherein the object (3) is formed by curing a photosensitive substance (5) by means of curing radiation, characterized in that for adhering the object (3) a secondary radiation is irradiated to the object carrier (15) in a direction different from the direction of the curing radiation at least in a partial region on the slide (15).
    [2]
    2. The method according to claim 1, characterized in that the secondary radiation is supplied to the generally plate-shaped, radiation-transparent slide (15) laterally.
    [3]
    3. The method according to claim 2, characterized in that the secondary radiation is deflected within the slide (15).
    [4]
    4. The method according to any one of claims 1 to 3, characterized in that the secondary radiation is derived from the curing radiation.
    [5]
    5. The method according to any one of claims 1 to 3, characterized in that as a secondary radiation independent of the curing radiation is used.
    [6]
    6. The method according to any one of claims 1 to 5, characterized in that the secondary radiation is supplied to the slide (15) via a light guide (31).
    [7]
    7. The method according to any one of claims 1 to 6, characterized in that the secondary radiation is adjusted during the adhesion process over a Anhaftbereich.
    [8]
    8. Device for carrying out the method according to one of claims 1 to 7, characterized by a distance from the slide (15) laterally arranged secondary radiation source (17), and in that the slide (15) is at least partially permeable to the secondary radiation.
    [9]
    9. Apparatus according to claim 8, characterized in that the secondary radiation source (17) is formed by a light guide (31).
    [10]
    10. The device according to claim 9, characterized in that the light guide (31) with a stereolithography main radiation source (9) is light-conductively connected.
    [11]
    11. The device according to claim 8, characterized in that one of a main radiation source (9) independent secondary radiation source (17) is provided.
    [12]
    12. The device according to one of claims 8 to 11, characterized in that the slide (15) is partially transparent to the radiation and at least partially reflective, to redirect the secondary radiation to an adhesion region for the object (3).
    [13]
    13. Device according to one of claims 8 to 12, characterized in that the slide (15) includes a mirror surface (21).
    [14]
    14. The apparatus according to claim 13, characterized in that the mirror surface (21) is executed diffuse mirroring.
    [15]
    15. The apparatus according to claim 13, characterized in that the slide contains a movably arranged deflecting mirror (21 '').
    [16]
    16. Device according to one of claims 8 to 15, characterized in that the slide has a radiation for at least partially permeable adhesive bottom plate (19).
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    法律状态:
    2021-12-15| MM01| Lapse because of not paying annual fees|Effective date: 20210419 |
    优先权:
    申请号 | 申请日 | 专利标题
    ATA50350/2016A|AT518051B1|2016-04-19|2016-04-19|Device and method for increasing the adhesion of a component layer to a carrier object|ATA50350/2016A| AT518051B1|2016-04-19|2016-04-19|Device and method for increasing the adhesion of a component layer to a carrier object|
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