• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    The invention relates to a method for depositing a layer on a sliding bearing element blank (6) from the gas phase in a process gas, according to which the layer of at least one target (9) comprising or consisting of a metal combination with a metallic base element, by at least partial atomization the target (9) and then depositing the atomized target components on the slide bearing blank (6) using a target (9) having at least one grain refining component in the form of a gas and / or a chemical compound of that gas and / or that a process gas is used to which the grain-refining gas is added.
    公开号:AT517717A4
    申请号:T50044/2016
    申请日:2016-01-28
    公开日:2017-04-15
    发明作者:Dipl Ing Dr Nagl Johann
    申请人:Miba Gleitlager Austria Gmbh；
    IPC主号:
    专利说明:

    The invention relates to a method for depositing a layer on a sliding bearing element blank from the gas phase in a process gas, according to which the layer of one or more targets, which comprises or comprises a metal combination with a metallic base element, by at least partial sputtering of the target and then depositing the atomized target components on the slide bearing blank.
    Furthermore, the invention relates to the application of the method.
    In addition, the invention relates to a target for depositing a layer on a slide bearing blank of the gas phase comprising a sintered composition of metallic components or a target for depositing a layer on a slide bearing blank from the gas phase comprising a composition of metallic constituents.
    Coarse grained sputtered layers tend to have increased layer wear, high diffusion and loss of hardness under the influence of heat, especially when they are tin-based. The coarse structure also leads under load to the formation of cracks and fatigue fractures. Therefore, efforts have been made in the prior art to reduce the coarseness of the sputtered layers. As an effective means of doing the addition of grain refining elements has been found, as is conventional in alloys, if this property is desired. The grain refining elements are usually metals. Such a method is described, for example, in WO 2009/046476 A1, according to which a sliding layer is produced on a support element by vapor deposition, optionally after the arrangement of at least one intermediate layer, wherein the sliding layer comprises an aluminum matrix in which, in addition to aluminum, bismuth as the main constituent and optionally copper are included. The grain-refining metal should have a melting point that is at least 950 ° C higher than that of bismuth. However, the grain refining can also be achieved by increasing the bismuth germ density by applying a bias voltage to the support element.
    The coarseness of the sputtering layer can also have positive properties. The concomitant lower hardness gives the sliding bearing element thus provided better adaptation properties in the running-in phase of the sliding bearing.
    The present invention has for its object to improve the property profile of a sliding bearing element, which is provided with a layer produced by a vapor deposition method.
    This object of the invention is achieved with the method mentioned, in which at least one target is used, which has at least one grain-refining constituent in the form of a gas and / or a chemical compound of this gas and / or in which a process gas is used, which is the grain-refining gas is added.
    Furthermore, the object of the invention is achieved in that the layer deposited from the gas phase is used for smoothing the surface of a slide bearing blank or a sliding bearing element.
    Finally, the object of the invention is achieved by a target which can be used in said process and in which gas-filled cavities are formed in the sintering composition or in which the composition of the target comprises at least one chemical compound of a metal and a gas.
    The advantage here is that deposited by a relatively simple intervention in the process flow from the gas phase layers can be produced, which are coarser in the area of the tread, ie that surface which is in sliding contact with a wide Ren component, and in the Area of the lying below this layer further layer is relatively fine-grained relative to the coarse-grained region of the layer. On the one hand, this improves or even maintains the improved ability to run in of the slide bearing element produced therewith. On the other hand, the layer also has a good mechanical strength, which is due to the fine grain. Thus, these finer-grained sublayers provide support for the overlying coarser sublayers. On the other hand, the method can also be carried out in such a way that the partial layers in the region of the tread are also formed with a finer grain, that is, the grain refining is also used in the area of the tread. It can thus the thermal stability of the excreted from the gas phase layer can be improved. The method can also be used to level a rough surface of the plain bearing element blank with the layer. It can be compensated defects of the rough surface. On the other hand, conventional surface sputter layers form the roughness of the substrate, which results, for example, from the mechanical processing of the surface of the sliding bearing element blank, so that the running surface is correspondingly rough. Due to the reduced roughness of the tread, inter alia, a reduction of wear and the resulting friction losses in the engine during operation of the sliding bearing element can be achieved. By the specified targets and their use in the process, the advantages mentioned can be achieved. In addition, as a grain-refining substance at least one gas and / or a chemical compound of this gas is used, the process management can be simplified because a separate / own feeding of the gas into the process gas is not required. It should be noted in this context that when using the chemical compound with the gas latter is released during the deposition process and therefore acts as the gas not bound in the target.
    Preferably, the chemical compound is formed from the gas with the base element of the target. An advantage is the in situ production of the chemical compound, so that the chemical compound is always freshly made available. By using the base element of the target, irregularities in the distribution of the chemical compound can be avoided.
    In order to enhance the above-mentioned effect, according to a variant embodiment of the method, the proportion of the grain-refining substance and / or the atomized grain-refining portion of the target can be varied over the time of deposition of the layer, wherein according to a preferred embodiment, the proportion of the grain-refining substance and / or the atomized grain-refining portion of the target is reduced over the time of deposition of the layer.
    It can further be provided that the target is produced by sintering technology with cavities, wherein in the cavities the at least one gas is stored. Since the sintering technique usually leads to targets having lower densities compared to solid materials, the cavities formed therein can be used for the provision of the gas in the coating process. The gas can thus be easily incorporated into the coating process without additional expenditure on equipment and is also simpler to regulate or control the process.
    In the preferred embodiment of the method, tin is used as the base element of the target, since in the course of the evaluation of the invention it has been found that tin base layers show the above-mentioned effects more intensively. In addition, even more advantages can be achieved. For example, Sn02 and Sn2Ü3, unlike, for example, CuO, are not harmful to health.
    For a better understanding of the invention, this will be explained in more detail with reference to the following figures.
    Each shows in a simplified, schematic representation:
    Figure 1 is a multilayer plain bearing in side view.
    Fig. 2 is a sputtering chamber.
    By way of introduction, it should be noted that in the differently described embodiments, the same parts are provided with the same reference numerals and the same component names, the disclosures contained throughout the description can be mutatis mutandis to the same parts with the same reference numerals or component names. Also, the location information chosen in the description, such as top, bottom, side, etc. related to the immediately described and illustrated figure and to transmit mutatis mutandis to the new situation in a change in position.
    Fig. 1 shows a multi-layer sliding bearing element 1 in the form of a plain bearing half shell. Shown is a two-layer variant of the multi-layer sliding bearing element 1, consisting of a support layer 2 and a sliding layer 3, which on a front side 4 (radially inner side) of the multi-layer sliding bearing element 1, which is zuwendbar a component to be stored, is arranged.
    Optionally, a bearing metal layer 5 between the sliding layer 3 and the support layer 2 may be arranged, as indicated by dashed lines in Fig. 1.
    The basic structure of such multilayer sliding bearing elements 1, as e.g. find use in internal combustion engines, is known from the prior art, so that further explanations on this unnecessary. However, it should be mentioned that further layers can be arranged, that is, for example, between the sliding layer 4 and the bearing metal layer 5 an adhesion promoter layer and / or a diffusion barrier layer, as well as between the bearing metal layer 3 and the support layer 2, an adhesive layer can be arranged.
    In the context of the invention, the multi-layer sliding bearing element 1 can also be designed differently, for example as a bearing bush, as indicated by dashed lines in Fig. 1. Likewise, embodiments such as thrust rings, axially running sliding shoes, or the like are possible.
    The multi-layer sliding bearing element 1 according to the invention is used in particular in medium to high-speed engines.
    The support layer 2 is preferably made of steel, but may also consist of a material which gives the multilayer sliding bearing element 1 the required structural strength. Such materials are known from the prior art. For the bearing metal layer 5 as well as the intermediate layers, the alloys or materials known from the relevant prior art can be used, and be referred to in this regard.
    The sliding layer 3 is made of a tin-based alloy with tin as a main component, i.e., a base member. that tin is the component with the largest proportion of the tin-based alloy.
    If alloy compositions are specified below, these are to be understood, unless stated otherwise, as tin in each case forms the remainder of the stated compositions.
    Figures on the composition of tin-based alloy always refer to the entire alloy.
    Furthermore, the information on the alloy compositions should be understood to include these conventional impurities, such as occur in commodities used on a large scale. However, it is within the scope of the invention, the possibility that pure or pure metals are used. All amounts given to the alloy compositions and target compositions are, unless stated otherwise, in% by weight.
    In addition to tin, the tin-base alloy contains at least one element from a first element group comprising or consisting of copper and antimony. Optionally, the tin-based alloy may include at least one member of a second group of elements consisting of silicon, chromium, titanium, zinc, silver, iron, aluminum, bismuth and nickel.
    The proportion of antimony is between 1 wt .-% and 8 wt .-%, in particular between 1 wt .-% and 5 wt .-%. At less than 1% by weight, the
    Tin base alloy too soft, thereby deteriorating fatigue strength. On the other hand, the slip layer containing more than 8% by weight becomes too hard, so that the conformability of the tin-base alloy in the break-in phase is too low.
    The proportion of copper is between 8 wt .-% and 20 wt .-%, in particular between 9 wt .-% and 15 wt .-%. However, if the proportion of copper exceeds 20% by weight, coarse-grained precipitation of the copper-rich hard phase occurs.
    The proportion of each of the elements silicon, chromium, titanium, zinc, silver and iron can be between 0.1% by weight and 2% by weight, in particular between 0.25% by weight and 1.5% by weight ,
    Silicon may be added to improve the fatigue strength and to slow down diffusion effects, which may result in layer softening.
    By adding chromium, a slowdown of grain boundary diffusion can be achieved.
    Titanium and iron in turn form hard phases with tin, whereby the fatigue strength of the tin-based alloy can be improved.
    The addition of zinc or silver can improve the fatigue strength and load capacity of the tin-based alloy.
    Proportions of these elements outside the stated limits result in a property profile of the tin-based alloy that renders it less suitable for use in the multi-layer sliding bearing element 1.
    The proportion of each of the further elements aluminum, bismuth and nickel can be between 0.05% by weight and 5% by weight, in particular between 0.1% by weight and 3.1% by weight.
    Aluminum can also improve the fatigue strength of the tin-based alloy.
    The addition of nickel can improve the fatigue strength and the strength of the tin-based alloy.
    The addition of bismuth hinders grain boundary diffusion under the influence of temperature.
    The sum content of all alloying elements in addition to tin is preferably limited to a maximum of 30% by weight, in particular to a proportion of between 10% by weight and 25% by weight. It has been found that sum amounts above the stated ranges lead to brittleness, below too low hardness and fatigue strength of the tin-based alloy.
    The remainder to 100 wt .-% forms tin with the usual, production-related impurities.
    In addition to a tin-based alloy, however, the sliding layer 3 can also be replaced by an alloy with the base element aluminum, such as aluminum. AISn20Cu1, AIBil 5Cu1Ni1, or by an alloy with copper as the base element, e.g. CuPb27, CuPb25Sn3, CuPb25Ni3, or by silver or an alloy with silver as the base element, e.g. AgCu5.
    To prepare the multi-layer sliding bearing element 1, a blank is prepared. The blank consists at least of the support layer 2, but may also have at least one of the above-mentioned layers, in particular the bearing metal layer 5. The production of this Gleitlagerelementrohlings 6 (FIG. 2) can be carried out according to the prior art, for example, by a steel plate Applied bearing metal layer and thus connected by rollers. Other known methods are applicable. Optionally, a mechanical processing of this Gleitlagerelementrohlings 6.
    The plain bearing element blank 6 can be brought into the corresponding shape, for example the shape of a half shell, by reshaping before the sliding layer 3 is deposited thereon.
    The sliding layer 3 is deposited from the gas phase on the sliding bearing element blank 6. In particular, the vapor deposition is carried out by a cathode sputtering method or an electron beam evaporation method. Since these methods are known in principle from the prior art, reference is made to avoid repetition.
    It should be noted at this point that it is possible within the scope of the invention to deposit other layers of the multilayer plain bearing 1 by vapor deposition, in particular by a cathode sputtering method or an electron beam vapor deposition method, on a plain bearing element blank 6.
    For deposition, at least one slide bearing element blank 6 is placed in a deposition chamber 7, which is shown schematically in FIG. For example, the plain bearing element blank 6 can be introduced into the separation chamber 7 via a lock. The slide bearing element blank 6 can be arranged during the deposition of the sliding layer 3 on a support 8 and held by this.
    It is also possible for a plurality of plain bearing element blanks 6 to be coated simultaneously, for which purpose a correspondingly shaped support 8 can be used.
    Although in Fig. 2, the Gleitlagerelementrohling 6 is shown planar, this may-as described above - already be formed, so for example, have the shape of a Flalbschale, so so that to be coated Gleitlagerelementrohling 6 may have a curved surface to be coated.
    The sliding layer 3 may preferably be produced with a layer thickness of at least 10 μm, preferably at least 15 μm, and at most 60 μm, preferably at most 50 μm, if a bearing metal layer 3 is arranged. In the absence of a bearing metal layer 3, layer thicknesses of at least 150 μm, preferably at least 200 μm, and a maximum of 1000 μm, preferably a maximum of 750 μm, are preferably produced.
    In the deposition chamber 7, at least one target 9 is arranged. It is also possible to arrange a plurality of targets 9.
    The target 9 preferably has the same metals from which the deposited sliding layer 3 is produced, for example, the above-mentioned elements of the tin-based alloy. In particular, the target 9 contains these metals in the same relative amounts to one another, so that therefore the target 9 can have at least approximately the same, in particular exactly the same, composition as the sliding layer 3 to be produced.
    If multiple targets 9 are used, they may all have the same composition. However, it is also possible to use differently composed targets 9, the sum of the targets 9 qualitatively giving the sum of the metals to be deposited.
    The target (s) 9 and the sliding bearing element blank (s) 6 are correspondingly electrically contacted so that an electrical potential prevails therebetween.
    The deposition of the sliding layer 3 takes place in a process gas, for example consisting of or comprising argon. For the introduction of the process gas, the separation chamber 7 has at least one inlet 10 and for its removal at least one outlet 11. For deposition by means of sputtering the following parameters can be used:
    Tension on slide bearing element blank 6: -150 V to 0 V process gas mixture: argon, oxygen process gas pressure: 7x 10-4 to 6x10-3 mbar,
    Temperature: 80 to 160 ° C
    Voltage at the target (s) 9: -450 V to -800 V Coating rate: 0.1 pm / minute to 5 pm / minute
    As is known, during sputtering, process gas atoms are accelerated onto the target 9, and from this beat out the metal atoms to be deposited, which are subsequently accelerated in the direction of the sliding bearing element blank 6 and precipitate on its surface, so that the sliding layer 3 is built up.
    Deposition by a PVD (vapor deposition) process is preferred because they take place away from the thermodynamic equilibrium so that particle diffusion and coagulation of precipitates can be prevented.
    With the method, in particular the sputtering method, therefore, a layer, in particular the sliding layer 3, can be deposited on a sliding bearing element blank 6 from the gas phase in a process gas. For this purpose, the layer of a target 9, which comprises or consists of a metal combination with a metallic base element, in particular tin (based on the metal combination), is produced by at least partial sputtering of the target 9 and subsequent deposition of the sputtered target components on the sliding bearing blank 6.
    For the production of this layer, in particular the sliding layer 3, on the one hand at least one target 9 can be used which has at least one grain-refining constituent. The grain-refining constituent is a gas and / or a chemical compound of this gas. Alternatively or additionally, a process gas may be used to which the grain-refining gas is added.
    The grain refining gas is preferably selected from a group comprising oxygen, nitrogen, carbon dioxide, carbon-hydrogen based gases CxHy (e.g., acetylene), hydrogen.
    The content of the grain-refining gas at the target 9 may be selected from a range of 20 ppm to 4,000 ppm, especially from a range of 50 ppm to 2,500 ppm.
    Argon is preferably used as the process gas. But it can also be used other noble gases such as helium, neon or krypton.
    If the grain-refining gas is added to the process gas, its proportion of the total gas composition (ie, process gas plus grain-refining gas) may be selected from a range of 25 ppm to 20,000 ppm, more preferably from a range of 100 ppm to 10,000 ppm.
    In this case, the grain-refining gas can be directly added to the process gas, and this gas mixture can be fed into the deposition chamber 7. Therefore, according to a preferred embodiment, the at least one inlet 10 for the process gas into the separation chamber 7 has a branch 12 which can be connected to a corresponding gas container and via the grain-refining gas is added to the process gas. This has the advantage that the volumes of the process gas and the grain-refining gas which are fed in can be regulated separately via two gas flow control elements. It is thus also possible, if necessary, to stop the supply of the grain-refining gas wholly during the deposition of the layer.
    However, it is also possible for the separation chamber 7 to have at least one separate inlet for the grain-refining gas, so that the mixing with the process gas takes place only in the separation chamber 7.
    In general, the grain-refining gas can be added to the process gas continuously or in discrete steps discontinuously. It can thus influence the layer growth of the layer to be evaporated.
    According to a preferred embodiment of the method or of the target 9, a chemical compound is used as the chemical compound of the grain-refining gas with the base element of the target. In the case of tin as base elements, for example, a tin oxide (SnO or SnO 2 or mixed oxides) is used which is added to the metal combination of the target 9. The proportion of the chemical compound of the grain-refining gas to the base member at the target, i. On the metal combination, may be selected from a range of 0.02 wt .-% to 3 wt .-%, in particular from a range of 0.1 wt .-% to 2 wt .-%. This proportion is based on the total composition, ie the sum of the proportions of the individual metals and the chemical compound.
    In principle, it is possible that the proportion of the grain-refining gas and / or the atomized grain-refining portion of the target 9 over the time of the deposition substantially, in particular exactly, is constant or held. On the other hand, it is also possible that the proportion of the grain-refining gas to the process gas and / or the atomized grain-refining portion of the target 9, i. the chemical composition of the grain-refining gas is varied over the time of deposition of the layer to influence the layer growth of the layer to be deposited. The proportion can be chosen over time or increasingly decreasing. Embodiments are also possible in which this proportion increases at least once and decreases at least once, for example, this proportion of a sine curve can be chosen following.
    In the preferred embodiment of the method, the proportion of the grain-refining gas and / or the atomized grain-refining portion of the target 9 over the time of deposition of the layer is reduced. It is thus achieved that the size of the grains of the layer increases in the direction of the radially inner sliding surface of the multi-layer sliding bearing element 1.
    In order to vary the proportion of the grain-refining substance, either the proportion of the grain-refining gas in the process gas can be adjusted accordingly via the at least one gas-flow regulating element, in particular regulated automatically. However, it is also possible to influence this proportion by means of the electrical deposition parameters, for example by varying the tension on the plain bearing element blank 6.
    For example, the fraction of grain refining gas may be changed from an initial value of 10,000 ppm to a final value of 1,000 ppm. There are also other variations in shares within the above quantities for the grain fine gas possible.
    It should be noted at this point that not only a grain-refining gas can be used, but also a mixture of various grain-refining gases selected from the aforementioned group of grain-refining gases or the corresponding chemical compounds thereof with at least one of Metals, in particular the base element. In addition, it is possible that the grain-refining gas or the chemical compound per se is changed over time, so that, for example, oxygen is used as grain-refining gas at the beginning of the deposition, and the oxygen is supplemented or replaced by CO2 over the course of the deposition of the layer becomes. The variation of the amounts of the controlling gases may be continuous or stepped, i. that, for example, the gas used first is added or replaced with a continuously increasing amount of the further gas, or that the gas used first is mixed with the further gas in several (at least two) stages or replaced by it. The steps can be designed to be equidistant or variable in time.
    In the method for depositing the layer, a target 9 can be used, which is produced by sintering, wherein the at least one grain-refining gas is incorporated or incorporated into the cavities (pores) produced by the sintering technique. The grain-refining gas is thus released continuously or discontinuously only during the atomization of the target 9.
    But it is also possible that the at least one chemical compound of the at least one grain-refining gas with one of the metals from which the layer is produced, is already mixed as such in the target 9.
    The target 9 per se may consist of the metallic components and optionally the at least one grain-refining gas. But it is also possible that the metallic components for the production of the layer and optionally the at least one grain-refining gas are arranged on a support of the target.
    In addition to producing a grain size gradient of the grains of the layer to be deposited, in particular the sliding layer 3, wherein preferably the grain size of the grains of this layer increases in the direction of the radially inner sliding surface of the multilayer sliding bearing element 1, it is also possible to produce this layer with constant grain sizes within a grain size band ,
    The grain size of the grains may be selected, for example, from a mean grain size at the beginning of the deposition selected from a range of 0.2 pm to 2 pm to a mean grain size at the end of the deposition from a range of 0.5 pm to 20 pm by corresponding variation of the Part of the grain refining gas, as described above, to be changed. In general, the mean grain size can change by two to twenty times, in particular over the course of the deposition become larger. In the event that the grain size of the grains is generated at least approximately constant, the mean grain size can be selected from a range of 0.5 pm to 10 pm.
    The mean grain size is determined in a two-dimensional evaluation on the metallographic cross-section (digital photo from the light microscope, magnification 1000x) and corresponds to twice the geometric mean of the distance of the grain boundary curve from the centroid of the associated grain, wherein an area of the cross section is used for the evaluation, whose width corresponds to at least 5 times the layer thickness. Sub-microscopic grains (<0.5pm) are not detected due to the resolution of the measuring system.
    In addition, the method can also be used to smooth the surface of the plain bearing element blank 6, as stated above. The method can do this with the addition of a grain-refining process gas, as described above, and a coating temperature, the (
    Diffusion) not more than 60 Kelvin below the melting temperature of the lowest-melting alloy component.
    The following sliding layers 3 were produced by means of a PVD process. In this case, 6 half shells consisting of a supporting layer 2 made of steel and a leaded bronze as bearing metal layer 5 were introduced into a electromagnetically generated metal vapor as Gleitlagerelementrohlinge 6, wherein a sliding layer 3 was applied with a thickness of about 20 pm. The generation of the sliding layer 3 can take place both from a single source (target 9) and at the same time from several sources (targets 9) of the same or different composition.
    The following tables give examples that were produced during the evaluation of the process.
    In this case: PG ... Process gas PG Var ... Variation of the process gas UB ... Tension on the sliding element blank 6 p ... total process gas pressure T ... coating temperature R .... coating rate
    SdT ... state of the art
    Table 1:
    In the following Table 2 the respective results are summarized. In this mean: HV ... layer hardness according to Vickers HV (0.001) D ... average grain size
    Ra ... roughness depth value
    BiZo ... area near binding zone (5μηι)
    Ofl ... area near surface (5μηι)
    Table 2:
    The exemplary embodiments show or describe possible design variants, it being noted at this point that various combinations of the individual design variants are also possible with one another.
    For the sake of order, it should finally be pointed out that for a better understanding of the construction of the multilayer sliding bearing element 1 or the deposition chamber 7, these or their components have been shown partially unevenly and / or enlarged and / or reduced in size.
    REFERENCE SIGNS LIST 1 multilayer sliding bearing element 2 supporting layer 3 sliding layer 4 front side 5 bearing metal layer 6 sliding bearing element blank 7 separating chamber 8 carrier 9 target 10 inlet 11 outlet 12 branching
    权利要求:
    Claims (9)
    [1]
    claims
    Method for depositing a layer on a slide bearing blank (6) from the gaseous phase in a process gas, according to which the layer of at least one target (9) comprising or consisting of a metal combination with a metallic base element, by at least partial sputtering of the target (9) and then depositing the atomized target constituents on the plain bearing element blank (6), characterized in that a target (9) is used which has at least one grain-refining constituent in the form of a gas and / or a chemical compound of this gas and / or that a process gas is used to which the grain-refining gas is added.
    [2]
    2. The method according to claim 1, characterized in that the chemical compound of the gas and the base element of the target (9) is formed.
    [3]
    3. The method according to any one of claims 1 or 2, characterized in that the proportion of the grain-refining gas and / or the atomized grain-fine fraction of the target (9) over the time of deposition of the layer is varied.
    [4]
    4. The method according to claim 3, characterized in that the proportion of the grain-refining gas and / or the atomized grain-fine fraction of the target (9) over the time of deposition of the layer is reduced.
    [5]
    5. The method according to any one of claims 1 to 4, characterized in that the target (9) is sintered with cavities, wherein in the cavities, the at least one gas is stored.
    [6]
    6. The method according to any one of claims 1 to 5, characterized in that is used as the base element of the target (9) tin.
    [7]
    7. Use of the method according to one of claims 1 to 5 for smoothing the surface of a Gleitlagerelementrohlings (6) or a multi-layer sliding bearing element (1).
    [8]
    A target (9) for depositing a layer on a slide bearing blank (6) from the gas phase comprising a sintered composition of metallic constituents, characterized in that gas-filled cavities are formed in the sintering composition.
    [9]
    A target (9) for depositing a layer on a slide bearing blank (6) from the gas phase comprising a composition of metallic constituents, characterized in that the composition further contains at least one chemical compound of a metal and a gas.
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    同族专利:
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    引用文献:
    公开号 | 申请日 | 公开日 | 申请人 | 专利标题
    WO2005090631A1|2004-03-15|2005-09-29|Bekaert Advanced Coatings|Method to reduce thermal stresses in a sputter target|
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    法律状态:
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    申请号 | 申请日 | 专利标题
    ATA50044/2016A|AT517717B1|2016-01-28|2016-01-28|Method for depositing a layer on a plain bearing element blank|ATA50044/2016A| AT517717B1|2016-01-28|2016-01-28|Method for depositing a layer on a plain bearing element blank|
    AT80042019A| AT520654B1|2015-04-22|2016-03-16|Device for positioning the lower limbs of a patient during an operation|
    PCT/AT2017/060012| WO2017127859A1|2016-01-28|2017-01-27|Method for depositing a layer on a sliding bearing element blank|
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