• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    Apparatus for applying a coating to a surface of a substrate comprising a plasma generator (1) comprising an anode (5) and a cathode (2) for generating an atmospheric plasma jet by electrical discharge in a working gas, the plasma generator (1) having an exit channel (4 ) for the plasma jet opening via an outflow opening (9) to the surrounding atmosphere, followed by an outflow area (14) of the plasma jet emerging into the surrounding atmosphere, and a supply means having an inlet side for charging the supply means with a coating material and an outlet side is provided for introducing the coating material into the plasma jet. It is proposed that the supply device is connected on the inlet side to an evaporator (15) for the coating material and on the outlet side has an outlet opening (16) for the gaseous coating material, which is directed into the outflow region (14). With the aid of the local adjustability of the material introduction into the plasma jet, it is possible in particular to make the functional properties of the coating more homogeneous and better controllable.
    公开号:AT517694A4
    申请号:T50968/2015
    申请日:2015-11-12
    公开日:2017-04-15
    发明作者:
    申请人:Inocon Tech Ges M B H；
    IPC主号:
    专利说明:

    The invention relates to a device for applying a coating to a surface of a substrate with a plasma generator comprising an anode and a cathode for generating an atmospheric plasma jet by electrical discharge in a working gas, the plasma generator having a discharge channel for the plasma jet, which extends via an outflow opening opens to the surrounding atmosphere, which is followed by a discharge area of the plasma jet discharging into the surrounding atmosphere, and a supply means is provided with an inlet side for feeding the supply means with a coating material and an outlet side for introducing the coating material into the plasma jet according to the preamble of claim 1.
    Under an atmospheric plasma jet is a plasma jet with an ambient pressure, which is in the order of the atmospheric pressure, called. To form such a plasma jet, a working gas, usually air, nitrogen or a noble gas, is passed through a channel in which high voltage electrical discharge in the form of a corona discharge and / or arc discharge is generated, which ionizes the working gas and a plasma jet in the channel forms. Subsequently, a coating material can be supplied to the plasma jet to suitably coat a substrate to which the plasma jet blended with the coating material is directed.
    As a coating material, for example, powdery coating materials in the form of metal compounds or thermoplastics are known, which are supplied to the plasma jet via a powder conveyor usually by means of a carrier gas, melt in the plasma jet and accelerated in the molten or doughy state by the volume expansion of the plasma jet and deposited on the substrate to be coated , The layer thicknesses range from the single-digit micrometer range to the millimeter range. Well-known applications are about
    Production of highly wear-resistant layers based on tungsten carbide. Furthermore, liquid coating materials are known, which are supplied in liquid form to the plasma jet and are also referred to as "precursor".
    The coating material supplied to the plasma jet experiences chemical and / or physical changes in the plasma jet that can decisively influence the properties of the layer formed on the substrate. For example, some of the known coating materials are sensitive to oxidation and can oxidize to the surrounding atmosphere by reaction with the oxygen. Other coating materials are sensitive to hydrolysis and undesirably react with water present before they are deposited on the substrate. However, unwanted or uncontrollable modifications of the chemical and / or physical type coating material reduce the coating quality by either not being able to reliably reproduce desired layer properties, or varying within the same layer, and resulting in an inhomogeneous layer structure of the layer in question. However, the coating should be as homogeneous as possible and reproducible in its properties as reliably as possible.
    Therefore, it has also been proposed to carry out the coating process under vacuum or at least a pressure greatly reduced relative to the atmospheric pressure in order to reduce chemical changes of the coating material until it hits the substrate surface, in particular its oxidation. However, the coating under vacuum significantly increases the expenditure on equipment and thus the costs and the time required for the coating process.
    It is therefore the object of the present invention to improve the application of a layer on a surface by means of a plasma jet under atmospheric conditions and in particular to make the functional properties of the coating more homogeneous and better controllable.
    These objects are achieved by the features of claim 1. Claim 1 relates to a device for applying a coating to a surface of a substrate having a plasma generator comprising an anode and a cathode for generating an atmospheric plasma jet by electrical discharge in a working gas, the plasma generator having a discharge channel for the plasma jet, which an exhaust port opens to the surrounding atmosphere, followed by an outflow portion of the plasma jet exiting into the surrounding atmosphere, and a feeder having an inlet side for charging the feeder with a coating material and an outlet side for introducing the coating material into the plasma jet. According to the invention, it is here proposed that the supply device is connected on the inlet side to an evaporator for the coating material and on the outlet side has an outlet opening for the gaseous coating material, which is directed into the outflow region.
    Due to the evaporation of the coating material before the supply to the plasma jet, a more homogeneous deposition on the substrate, in particular with regard to the particle size of the deposited material, can be achieved. In addition, it is possible to deposit thinner layers with layer thicknesses down to the single-digit nanometer range.
    It is also crucial that the outlet opening for the gaseous coating material is directed into the outflow area. In a conventional manner, the coating material is introduced via a feed channel into an outlet channel leading to the plasma jet before the plasma jet leaves the outlet channel, ie in the outflow direction of the plasma jet in front of the outflow opening of the outlet channel and thus also before the outflow region. In practice, this procedure leads to undesirable deposits of the coating material in the outlet channel of the plasma jet, which not only to lower
    Lifetime of the plasma generator can cause, but also affect the plasma jet unfavorable, whereby the coating quality is not reproducible or a layer deposition is completely impossible. By supplying the coating material into the outflow region, that is, into the region in which the plasma jet exits into the surrounding atmosphere, there is also the possibility of varying the supply of the coating material to the plasma jet locally. The plasma jet changes when it exits into the surrounding atmosphere as a function of the distance to the discharge opening in chemical and / or physical terms. For example, it increasingly cools down and undergoes chemical modifications by reaction with the surrounding air. These changes can be specifically exploited for controlling the functional layer properties by introducing the coating material into different regions of the outflow region. If it is introduced into the discharge area near the outflow opening, ie into a region of high plasma temperature and high degree of ionization of the plasma gas, the coating material becomes more ionized than if it is introduced into the outflow area with increasing distance to the discharge opening, where the plasma temperature and the degree of ionization decrease progressively , Due to the variable degree of ionization, the coating material is influenced and the surface properties can be adjusted in a targeted manner. In a conventional supply of the coating material into the outlet channel of the plasma generator, this possibility of varying the feed region into the plasma jet does not exist, so that it is not possible to exploit the different properties of the plasma jet. By means of an inventive supply of the coating material in the discharge area, however, not only a targeted control of the properties of the deposited coating material is made possible, but also a higher homogeneity of the coating, since deposits in the outlet channel and chemical and / or physical
    Reactions with these deposits and the interface of the outlet channel can be avoided.
    An advantageous apparatus embodiment also consists in performing the supply device as at least one supply pipe, which is mounted on a holder on the plasma generator. The outlet opening of the supply pipe is directed into the discharge area. In most cases, plasma generators used for a coating process are provided with their own coating head, which contains the coating material supply means and has a discharge channel for the plasma. In the context of this invention, a holder attached to the plasma generator can be provided with a discharge channel for the plasma, wherein at least one feed tube for the coating material can be attached to the outside of the holder.
    Preferably, the supply pipe is adjustably mounted to the bracket, so that the positioning of the outlet opening can be changed within the Ausströmbereiches and in particular can be selectively adjusted. This positioning can be changed in the vertical direction, in a horizontal plane, or at its angle to the outflow direction of the plasma gas. This targeted setting will probably be made mostly by the manufacturer of the plasma generator depending on the desired layer properties, but are no longer changed by the customer and user. In particular, it is also proposed that the feed direction of the coating material defined by the longitudinal axis of the feed tube is arranged at an acute angle to the outflow direction of the plasma gas, which is defined by the longitudinal axis of the outlet channel. By virtue of this arrangement, the coating material can also be introduced into regions of the outflow region which are already further away from the outflow opening.
    Furthermore, it is proposed that the working gas is preferably an inert working gas. In this way, it is to be achieved that the working gas undergoes on its way from the area of the corona and / or arc discharge, where it is highly ionized, to the outflow opening as low as possible chemical changes, otherwise the targeted control of the layer properties by locally controlled initiation of
    Coating material is impaired. By using an inert working gas, the physical and / or chemical state of the plasma jet in the outflow area can be better reproduced and controlled. Furthermore, the use of a preferably inert working gas also reduces cathode burnup and increases the service life of the plasma generator.
    The invention will be explained in more detail below with reference to an embodiment with reference to the accompanying figures. It shows here the
    Fig. 1 is a sectional view through a plasma generator with an embodiment of an inventive arrangement of the supply device for coating material.
    In the following, with reference to FIG. 1, a possible embodiment of a device according to the invention for applying a coating to a surface of a substrate. The device comprises a plasma generator 1, which has a cathode 2 and an anode 5. The cathode 2 is cylindrical and has at its free end a conical end portion 3, which projects in the embodiment shown in an outlet channel 4 for the plasma jet. The anode 5 is arranged coaxially with the cathode 2, wherein the cathode 2 and the anode 5 are connected to a controllable voltage source 6. Between the cathode 2 and the anode 5, a DC voltage in the range of 10-30 V or pulsed voltage up to 5 kV is applied at a current of 3-500 A or pulsed current of 0.1 Ά to 2 A. The electric power of the plasma generator moves in the range of 100-10000 W. The cathode 2 can optionally be provided in its interior with a cathode cooling (not shown in FIG. 1). Furthermore, coolant channels 10 are provided in the jacket body of the plasma generator 1, which are connected to a cooling medium source 11 and cool the plasma generator 1.
    The cathode 2 and the anode 5 define a working gas channel 7, which is connected to a controllable working gas source 8. For example, argon, helium, nitrogen or, preferably, inert mixed gases such as argon-hydrogen mixed gases or even air can be used as the working gas. The working gas channel 7 opens into the outlet channel 4, which opens via an outflow opening 9 in the surrounding atmosphere. In operation, a voltage is applied to the cathode 2 and the anode 5, which is chosen sufficiently high to ignite between the tapered end portion of the cathode 2 and the cathode 2 surrounding anode 5 an arc. This electrical discharge ionizes the working gas flowing through the working channel 7, which subsequently flows through the outlet channel 4 as plasma and emerges as a plasma jet via the outflow opening 9 into the surrounding atmosphere. The adjacent to the outflow opening 9 atmospheric region is hereinafter referred to as Ausströmbereich 14 and is indicated in Fig. 1 with dotted lines. The outflow of the plasma jet in the surrounding atmosphere depends in particular on the operating pressure of the working gas source 8 and the applied current at cathode 2 and anode 5. The plasma jet undergoes physical and chemical changes during its flow path along the outflow, in particular the temperature and ionization degree decrease with increasing distance from the outflow opening 9. In addition, there is an increasing mixing with the chemical constituents of the surrounding atmosphere, which is greater in the peripheral areas of the plasma jet than in its core zone.
    On the plasma generator 1, a holder 12 is further arranged at its outflow end, via which a supply device for coating material is attached. In the exemplary embodiment shown, the supply device comprises two feed tubes 13, which are connected on the inlet side to an evaporator 15 for the coating material and on the outlet side each have an outlet opening 16 for the gaseous
    Coating material which are directed into the discharge area 14. The evaporator 15 is connected to at least one reservoir 17 for the coating material.
    As can be seen in FIG. 1, the feed tube 13 can be fastened to the holder 12 such that the feed axis Z of the coating material defined by the longitudinal axis of the feed tube 13 is arranged at an oblique angle α to the longitudinal axis of the outlet channel 4. This angle can be easily changed by the manufacturer and be chosen so that the supply of the coating material can be made in different regions of the exiting plasma jet, since the positioning of the outlet opening 16 of the feed tube 13 within the plasma jet changes with a different mounting angle. These different positions of the exit opening 16 in the three spatial directions can be used to control the functional layer properties of the deposited coating material. If it is introduced at approximately right angle a between the feed axis Z and the longitudinal axis of the outlet channel 4 near the outflow opening 9 in the outflow region 14, ie in a region of high plasma temperature and high degree of ionization, the coating material is excited in another way than when it increases Distance is introduced to the outflow opening 9 in the outflow region 14, where the plasma temperature and the degree of ionization increasingly decrease. However, the positioning of the outlet opening 16 of the feed tube 13 within the plasma jet can also be changed by the user, for example to deposit multilayer layers with different layer properties during repeated coating operations, for example a sequence of hydrophilic and hydrophobic layers to achieve higher abrasion resistance of the coating or lower layer corrosion. Is about a precursor on
    Siloxane base used as a coating material and supplied via the feeder 15 in the gaseous state at high inclination of the feed tube 13, ie near the discharge port 9, the outflow region 14 of the plasma jet, deposition takes place mainly as a hydrophilic layer, while at a supply of the vaporous precursor at low supply angle α between the feed axis Z and the longitudinal axis of the outlet channel 4, that is, at a relatively greater distance from the outflow opening 9, the deposition takes place mainly as a hydrophobic layer. Metallic materials, but also plastics, in particular thermoplastics, can be used as the substrate since, due to the indirectly transmitted arc, both electrically conductive and nonconductive substrates such as vitreous materials, composites (CFRP / GRP), plastics and / or paper / cardboard can be coated. The multilayer structure of coatings possible by means of the device according to the invention also makes it possible, for example, to melt metallic particles into the surface of thermoplastics in order to achieve a solid particle anchoring. In this way, premature abrasive wear of the coating can be reduced.
    By means of the local adjustability of the injection of the coating material into the plasma jet, it is possible in particular to make the functional properties of the coating more homogeneous and better controllable, thereby improving the application of a layer on the substrate surface by means of a plasma jet under atmospheric conditions.
    LIST OF REFERENCES: 1 plasma generator 2 cathode 3 conical end region 4 outlet channel 5 anode 6 voltage source 7 working gas channel 8 working gas source 9 outflow opening 10 coolant channels 11 coolant source 12 holder 13 supply tube 14 outflow region 15 evaporator 16 outlet opening 17 storage container Z supply surface of the coating material
    权利要求:
    Claims (5)
    [1]
    Claims:
    An apparatus for applying a coating to a surface of a substrate comprising a plasma generator (1) comprising an anode (5) and a cathode (2) for generating an atmospheric plasma jet by electrical discharge in a working gas, the plasma generator (1) having an exit channel (4) for the plasma jet which opens to the surrounding atmosphere via an outflow opening (9) followed by a discharge area {14} of the plasma jet emerging into the surrounding atmosphere, and a supply means having an inlet side for charging the supply means Coating material and a Äuslassseite for introducing the coating material is provided in the plasma jet, characterized in that the supply means on the inlet side with an evaporator (15) for the coating material is connected and the outlet side an outlet opening (16) for the gaseous coating material which in de n outflow area (14) is directed.
    [2]
    2. Apparatus according to claim 1, characterized in that the supply device is designed as at least one supply pipe (13) which is mounted on a holder (12) on the plasma generator (1).
    [3]
    3. Apparatus according to claim 2, characterized in that the supply pipe (13) on the holder (12) is adjustably mounted.
    [4]
    4. Apparatus according to claim 2 or 3, characterized in that by the longitudinal axis of the feed tube (13) defined supply direction of the coating material at an acute angle (α) to the through the longitudinal axis of the outlet channel {4) defined outflow direction of the plasma gas is arranged.
    [5]
    5. Device according to one of claims 1 to 4, characterized in that it is the working gas is an inert working gas.
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    引用文献:
    公开号 | 申请日 | 公开日 | 申请人 | 专利标题
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    DE102009030303A1|2009-06-24|2010-12-30|Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.|Method for the production of a coating having antireflexion layer on a movable substrate by a plasma-enhanced chemical vapor deposition, comprises providing a gas mixture having process-, carrier- and/or balance gas through a slit|
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    WO2013152805A1|2012-04-13|2013-10-17|European Space Agency|Method and system for production and additive manufacturing of metals and alloys|EP3680361A1|2019-01-09|2020-07-15|Innovent e.V.|Attachment for dosing a precursor and method for producing a layer|
    法律状态:
    优先权:
    申请号 | 申请日 | 专利标题
    ATA50968/2015A|AT517694B1|2015-11-12|2015-11-12|Apparatus and method for applying a coating|ATA50968/2015A| AT517694B1|2015-11-12|2015-11-12|Apparatus and method for applying a coating|
    PCT/EP2016/075653| WO2017080815A1|2015-11-12|2016-10-25|Device and method for applying a coating|
    EP16787428.8A| EP3374542B1|2015-11-12|2016-10-25|Device for applying a coating|
    CN201680065941.0A| CN108368609A|2015-11-12|2016-10-25|Device and method for applying coating|
    HK18111717.9A| HK1252420A1|2015-11-12|2018-09-12|Device and method for applying a coating|
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