• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    The invention relates to a spacer adjustment device (30) for a wafer exposure unit (10), comprising an actuator (34), a spacer (32) which can be adjusted by the actuator (34) between an active and an inactive position, and a power transmission member (48) coupled to the actuator (34), the power transmission member (48) being made of wire. The invention also relates to a wafer exposure unit (10) with such a spacer adjustment device.
    公开号:AT517487A2
    申请号:T50558/2016
    申请日:2016-06-20
    公开日:2017-02-15
    发明作者:
    申请人:Suss Microtec Lithography Gmbh；
    IPC主号:
    专利说明:

    The invention relates to a spacer adjustment device for a wafer exposure unit, comprising an actuator, a spacer, which can be adjusted by the actuator between an active and an inactive position, and a force transmission element, which is coupled to the actuator. The invention also relates to a wafer exposure unit with such a spacer adjustment device.
    A wafer exposure unit may be used in a photolithography process to expose a photoresist applied to the wafer. The exposure takes place through a mask, so that certain areas of the photoresist are not exposed in accordance with the shadow cast of the mask. Depending on the exposure, physical properties of the photoresist change so that it can be partially removed in a subsequent step, leaving a (positive or negative) photoresist image of the mask on the surface of the wafer.
    The wafer can then be processed in subsequent steps to create three-dimensional structures. In this way, for example, semiconductor chips or MEMS (microelectromechanical systems) can be generated. For proper exposure of the photoresist, it is important that the mask be positioned at a precisely defined distance from the wafer. For this purpose, a plurality of the spacers may be used which, when needed, are moved from the inactive to the active position by the spacer adjustment device to position the mask.
    A known wafer exposure unit 10 with the spacer adjustment devices used in this case is shown in FIGS. 1 and 2. On a base body 11 of the wafer exposure unit a total of three spacer adjustment devices 12, 14, 16 are mounted. These each contain an actuator 18, which is assigned a pivot arm 20. At the free, remote from the pivot axis end of the pivot arm 20 is in each case a (not shown here) spacer attached, for example, a spacer ball ("proximity ball") or a disc, a roller, etc.
    To move the pivot arms 20 from the inactive position shown in Figure 1 to the active position shown in Figure 2, each actuator 18 has a rack engaging a gear segment 22 mounted on each pivot arm 20 concentric with its pivot axis. When the rack is translationally adjusted within the actuator 18, this leads to a pivoting movement of the pivot arm 20th
    The known construction is relatively expensive.
    The invention is therefore an object of the invention to provide a spacer adjustment, which is simpler and more reliable.
    To solve this problem is provided according to the invention in a spacer adjusting device of the type mentioned that the force transmission element consists of wire. Such a power transmission element makes it possible to transmit an adjusting movement of the actuator directly to the spacer, without complicated and expensive gear are necessary. Eliminating the rack eliminates the risk of sticking the rack to materials used in the photolithography process or in the manufacture of the spacer adjustment unit.
    Preferably, the wire is directed wire, so wire, which has no bending in the unloaded state and extends straight. This allows a high precision to be achieved.
    According to one embodiment of the invention it is provided that the spacer is attached to a pivoting element. This makes it possible to translate a comparatively small stroke of the actuator in a comparatively large displacement of the spacer when it is mounted in a correspondingly large distance from the pivot axis of the pivot member.
    Preferably, the pivot member is coupled to the wire to implement without intermediate elements, the stroke of the actuator in a pivoting movement of the pivot member.
    The wire can be suspended in an opening of the pivoting element, so that a reliable coupling is obtained with low installation costs.
    Preferably, the spacer is attached to a support arm which is connected to the pivot member. As a result, a modular structure is created so that different retaining arms can be attached to one and the same pivot element.
    According to one embodiment of the invention it is provided that the holding arm consists of wire. This results in a cost-effective design.
    The spacer may be attached directly to the wire. This also leads to low production costs. In particular, the spacer can be "threaded" on the wire and glued there. This results in a small attack surface for aggressive chemicals used in photolithography processes at the splice.
    In order to adapt the spacer adjustment with little effort to different applications, the support arm is preferably mounted vertically adjustable on the pivot element.
    For this purpose, a plurality of openings can be provided at different heights in which the support arm can be arranged according to an embodiment in the pivoting element. The openings ensure reliable guidance of the support arm in any position.
    Alternatively, the pivoting element can be provided with an incision in which the holding arm can be fixed at different heights. As a result, the arm can be (almost) infinitely adjusted in height.
    In order to be able to fix the holding arm reliably in the pivoting element, however, if necessary, it can be loosened with little effort and reassembled in another position, preferably a fixing screw is provided, with which the holding arm can be clamped in the pivoting element.
    According to a preferred embodiment of the invention, an adjusting element is provided which cooperates with the pivoting element. This makes it possible to directly and directly adjust the position of the spacer in the active position.
    It can be provided that the adjusting element cooperates with a stop surface. This results in a low installation cost and high accuracy, since no intermediate components are necessary.
    According to an alternative embodiment, a deflection device is provided, which is arranged between the actuator and the spacer and engages the wire. In this embodiment, the stroke of the actuator is converted directly into a corresponding stroke of the spacer, without intermediate coupling elements are necessary.
    According to one embodiment of the invention, it is provided that the deflection device has a plurality of deflection rollers. This makes it possible to deflect the wire with little friction.
    According to an alternative embodiment, it is provided that the deflection device has a guide channel. This variant is characterized by a low installation effort.
    According to one embodiment of the invention, the actuator has a piston with which the wire is coupled. As a result, a stroke of the piston is converted directly into a stroke of the wire.
    The piston can delimit a pressure space, which can be acted upon by a pressure medium. As a result, the piston can be adjusted with little effort by the vacuum space, for example, a vacuum or compressed air is applied.
    In principle, it is also conceivable that the piston is adjusted electromagnetically.
    Preferably, a pressure chamber delimiting adjustment is provided, with which the starting position of the piston can be adjusted. As a result, the position of the spacer in the inactive position can be precisely adjusted.
    According to one embodiment of the invention, a return spring is provided. This ensures that the spacer is automatically returned to its original position when the actuator is no longer activated.
    The return spring can act in particular on the piston. This results in a compact structure with low friction.
    The invention also relates to a wafer exposure unit with such a spacer adjustment device. With regard to the resulting advantages, reference is made to the above explanations.
    The invention will be described below with reference to two embodiments, which are illustrated in the accompanying drawings. In the drawings show:
    1 shows a wafer exposure unit with spacer adjustment device according to the prior art, wherein the spacer is in an inactive position.
    Figure 2 shows the wafer exposure unit of Figure 1 with the spacer in an active position;
    Figure 3 is a spacer adjusting device according to a first embodiment of the invention in a partially sectioned view, wherein the spacer is in an inactive position;
    Figure 4 shows the spacer adjustment device of Figure 3 with the spacer in an active position;
    5 shows a spacer adjusting device according to a variant of the first embodiment in a partially sectioned plan view, wherein the spacer is in an inactive position.
    FIG. 6 shows the spacer adjusting device of FIG. 5 with the spacer in an active position;
    FIG. 7 shows the spacer adjusting device according to FIG. 5 in another sectional plane;
    FIG. 8 shows the spacer adjusting device according to FIG. 6 in the sectional plane of FIG. 7;
    FIG. 9 shows the spacer adjusting device of FIGS. 7 and 8 in another adjustment state;
    Figure 10 is a sectional side view of the spacer adjusting device of Figures 5 to 9;
    FIG. 11 shows a variant of the spacer adjusting device shown in FIG. 5, the spacer being in an inactive position;
    Figure 12 is a perspective view of an adjusting element for a spacer adjusting device according to Figures 5 to 11 with a spacer arm, which is located in a middle position.
    FIG. 13 shows the adjusting element of FIG. 12 in a section;
    Figure 14 is a perspective view of the adjusting member of Figure 12, with the support arm in a lower position;
    Figure 15 shows the adjusting element of Figure 14 in a section;
    Figure 16 is a perspective view of an adjusting element in an alternative embodiment, wherein the holding arm is mounted in a lower position;
    FIG. 17 shows the adjusting element of FIG. 16 in a section;
    FIG. 18 is a perspective view of the adjustment member of FIG. 16 with the support arm in a middle position;
    FIG. 19 shows the adjusting element of FIG. 18 in a section;
    Figure 20 is a perspective, greatly enlarged view of a height adjustment member used in the configuration of Figures 18 and 19;
    FIG. 21 shows a spacer adjusting device according to a second embodiment of the invention in a perspective view;
    FIG. 22 shows the spacer adjusting device of FIG. 21 in a sectional view;
    FIG. 23 shows a spacer adjusting device according to a variant of the second embodiment.
    FIG. 3 shows a spacer adjustment device 30, with which a spacer 32 can be adjusted from an inactive position, which is shown in FIG. 3, into an active position, which is shown in FIG.
    Spacer 32 is a sphere that may be used to place a mask in a wafer exposure unit, as used in photolithography processes, at a predefined distance relative to a wafer.
    The spacer adjustment device 30 has an actuator 34 with which the spacer 32 can be adjusted.
    In the embodiment shown in Figures 3 and 4, the actuator 34 includes a piston 36 which is adjustably arranged in a cylinder 38. The cylinder 38 is provided in a base body 40 of the actuator 34.
    The spacer 32 is attached to a support arm 42, which in turn is attached to a pivot member 44. The pivoting element 44 is pivotally mounted in the base body 40 about an axis 46.
    The holding arm 42 is designed here as a long, straight rod, which may for example consist of metal, in particular of wire. It is connected to the pivot member 44 so as to be displaced when the pivot member 44 is rotated. The holding arm 42 may, for example, be clipped into a receptacle of the pivoting element 44.
    The pivot member 44 is connected to the piston 36 by means of a power transmission element 48 made of wire. In the embodiment shown, directional wire is used which extends in a straight line.
    The power transmission element 48 is pivotally connected to the pivot member 44. In the illustrated embodiment, a bent end portion of the power transmission member 48 is suspended in an opening of the pivot member 44. The connection is thus similar to the connection between a bicycle spoke and a hub in which a cranked end of the spoke is hung in an opening in the hub.
    The remote from the pivot member 44 end of the power transmission element 48 is connected to the piston 36 tensile and pressure resistant. The piston 36 may, for example, have a central opening into which the force transmission element 48 is inserted.
    In the cylinder 38, a return spring 50 is arranged on the side facing away from the pivot member 44 side of the piston 36, which urges the piston 36 in the starting position shown in Figure 3, in which the spacer 32 is in the inactive position.
    The cylinder 38 communicates with a pressure medium connection 52, so that a pressure chamber formed in the cylinder 38, which is closed at one end by the piston 36, can be subjected to a controlled pressure.
    In order to adjust the spacer 32 from the inactive position shown in FIG. 3 to the active position shown in FIG. 4, the pressure chamber in the cylinder 38 is connected to a vacuum via the pressure medium connection 52. As a result, the piston 36 is adjusted against the action of the return spring 50 relative to the figures 3 and 4 upwards. This stroke is transmitted via the power transmission element 48 to the pivot member 44, which accordingly (together with the spacer 32) performs a pivoting movement in the clockwise direction.
    To reset the spacer 32 back to the inactive position, the pressure chamber is vented within the cylinder 38 via the pressure medium connection 52. This has the consequence that the piston 36 comes under the action of the return spring 50 back to the starting position and thereby pivots the pivot member 44 counterclockwise.
    With the force transmission element 48, the stroke of the piston 36 is transmitted to the pivoting element 44 directly and almost without friction. The small lateral deflection experienced by the connecting point between the pivoting element 44 and the force transmission element 48 when adjusting the pivoting element 44 between the inactive and the active position can absorb the force transmission element 48 due to its inherent elasticity, without the piston 36 being subjected to a disturbing tilting moment.
    FIGS. 5 to 10 show a variant of the first embodiment of the spacer adjustment device. For the components known from the first embodiment, the same reference numerals are used, and reference is made to the above explanations in this respect.
    The essential difference between the first embodiment and the embodiment of Figures 5 to 10 is that in the embodiment, the piston 36 is not adjusted by means of a vacuum, but with compressed air (or alternatively, a pressurized gas).
    As can be seen in FIGS. 5 and 6, the piston 36 and a closure element 39 are arranged in the cylinder 38. The return spring 50 is arranged on the side of the piston 36 applied by the pressure port 52, that is to say between the piston 36 and the pivoting element 44.
    When compressed air is supplied to the pressure port 52, the piston is transferred from the initial position shown in Figure 5 to the activated position shown in Figure 6, so that the spacer 32 is transferred from the inactive position to the active position.
    The position of the spacer 32 in the inactive position can be adjusted so that the closure element 39 more or less far into the cylinder 38 engages. For this purpose, the closure element 39 may be provided with an external thread, which engages in an internal thread in the cylinder 38 in the base body 40.
    The position of the spacer 32 in the active position can be adjusted with an adjustment element 54 (see FIGS. 7 and 8) that can interact with the pivot element 44.
    In the embodiment shown, a stop surface 56 is provided on the pivot member 44, which abuts on the adjusting element 54 when the spacer 32 and thus the pivot member 44 are in the active position (see Figure 8).
    The adjusting element 54 may be provided in a similar manner as the closure element 39 with an external thread which engages in an internal thread in the base body 40.
    As can be seen in FIG. 9, not only can it be ensured by means of the adjusting element 54 that the spacer 32 is adjusted by exactly 90 ° between the inactive and the active position, but other pivoting angles can also be set. Here, the adjusting element 54 is further screwed into the base body 40, so that the pivot angle of the spacer 32 is smaller than in the variant shown in Figures 7 and 8.
    In Figure 10 it can be seen that the pivoting element 44 is cylindrical and is used with its peripheral surface in a cylindrical receptacle 57 in the base body 40. The abutment surface 56 is designed as the bottom of a groove 58 which extends over a certain depth in the pivot member. The holding arm 42 is clipped into a receptacle 59, which is provided on the pivoting element 44.
    FIG. 11 shows a further variant of the spacer adjusting device. The difference to the variant shown in FIGS. 5 to 10 is that a cover element 41, which is provided with a recess 43, is attached to the main body 40.
    The cover member 41 represents an extension of the base body 40 such that the spacer, when attached to a very long support arm 42, does not protrude freely from the spacer adjustment device 30 and is unprotected, but is "parked" in the cover member 41. Here, the support arm 42 and the spacer 32 are very well protected against mechanical stress and possible contamination.
    The cover 41 is releasably secured to the base 40 by means of a screw 45. Thus, the adjustment can be modularly adapted to structural conditions.
    With regard to different configurations and applications, it is desirable to arrange the support arm 42 and thus the spacer 32 adjustable at different heights. For this purpose, the pivoting element 44 can be used with little effort.
    FIGS. 12 and 13 show an embodiment of the pivoting element 44 which is suitable for adjusting the height of the holding arm 42. The pivoting element 44 is provided with a plurality of openings 80, which extend from the cylindrical outer surface of the pivoting element 44 inwardly.
    In the embodiment shown, the openings 80 extend in the radial direction. But it is also possible that the openings 80 extend obliquely to a radial orientation.
    There are a total of four openings 80 are used, which are all arranged one above the other. This makes it possible to arrange the holding arm 42 (and thus the spacer 32) at a desired height in each case (see FIGS. 12 and 13 on the one hand, in which the holding arm 42 is arranged in one of two middle positions, with FIGS. 14 and 15) on the other hand, in which the holding arm is in a lower position).
    For fixing the holding arm 42 in the respectively selected opening 80, a fixing screw 82 can be used, which is screwed into a clamping bore 84 so far that the holding arm is reliably fixed. If desired, a spacer 86 (see Figure 13) may be placed under the circumstances where the support arm 42 is not in the lowermost position.
    FIGS. 12 and 14 also show an incision 90 in which two passages 92 open. There, the power transmission element 48 is coupled to the pivot member 44, for example, by a ball head of the force transmission element is clipped into the recesses, which are present at the intersection of the passages 92 with the recess 90.
    FIGS. 16 and 17 show a variant of the pivoting element 44, in which the retaining arm can not be adjusted in height in a stepwise manner, as is the case in the embodiment of FIGS. 12 to 15, but (almost) steplessly.
    For this purpose, a receiving channel 94 is provided in the pivoting element, which extends in the same orientation as the entirety of the openings 80 through the pivot member 44. In the embodiment shown, the receiving channel is designed as a diametrically extending from the top by the pivot member extending incision, which ends just above the bottom surface of the pivot member.
    The holding arm 42 is inserted into the receiving channel 94 and fixed there with a fixing screw 82. This engages in a thread which is provided in a clamping bore 84 which intersects the receiving channel 94.
    When the holding arm 42 is fixed in its lowermost position, the fixing screw 82 clamps the holding arm against the bottom of the receiving channel 94 (see Figs. 16 and 17).
    If the support arm to be fixed in a higher position (see Figures 18 and 19), a Höheneinstellteil 96 is inserted into the clamping channel and / or the clamping bore 84, which is supported on the bottom of the clamping channel and then on the support arm 42 to lie comes. The fixing screw 82 then clamps the retaining arm against the top of Höheneinstellteils.
    In FIG. 20, an embodiment of a height adjustment part 96 is shown. This is a cylinder whose outer diameter corresponds approximately to the inner diameter of the clamping bore 84. On its upper side the Höheneinstellteil is provided with a semi-cylindrical receptacle 98, so that there the support arm 42 is received flat.
    The Höheneinstellteil 96 can be kept in a variety of different heights, so that the support arm can be very finely mounted in the particular desired height.
    FIGS. 21 and 22 show a second embodiment. For the components known from the first embodiment, the same reference numerals are used, and reference is made to the above explanations in this respect.
    The difference between the first and the second embodiment is that in the second embodiment, the spacer 32 is not rotationally adjusted, but translational.
    In the second embodiment, the spacer 32 is attached to the power transmission member 48. Again, the power transmission element 48 is formed by a directional wire. This is performed starting from the piston 36 of the actuator 34 via a deflection device 60. The diverter 60 allows the spacer 32 to be adjusted between the inactive and active positions in a direction different from the direction of stroke of the piston 36. This may be useful in terms of restrictions on the available space.
    In the embodiment shown, the deflection device 60 consists of a plurality of deflection rollers 62, which deflect the power transmission device 48 by 90 °. The deflection rollers 62 are arranged so that the force transmission element 48 is guided on a sufficiently large bending radius, which leads to no plastic deformation.
    Between the deflection device 60 and the spacer 32 is still a wire guide 64 is provided, which additionally stabilizes the power transmission element 48 at the output of the spacer adjustment device 30.
    Instead of pulleys 62 and a wire guide similar to a Bowden cable can be used to guide the wire in the desired manner and to redirect. If an abutment of the Bowden jacket is adjustable, the position of the spacer 32 can be adjusted in the adjustment direction with little effort.
    FIG. 23 describes a variant of the second embodiment. For the components known from the second embodiment, the same reference numerals are used, and reference is made to the above explanations in this respect.
    The essential difference between the variant shown in Figure 23 and the embodiment of Figures 21 and 22 is that in Figure 23, the deflection device 60 has no deflection rollers, but is formed by a curved channel 70 which is provided in the base body 40. As a result, the force transmission element 48 is deflected from the adjustment direction of the piston 36 in the desired adjustment direction for the spacer 32.
    Another difference is that in the spacer adjusting device according to Figure 23, the force transmission element is made so short that the spacer 32 is "parked" in the inactive position in a recess 72 in the base body 40. This is basically also possible in the embodiment shown in FIGS. 21 and 22, when the force transmission element 48 is correspondingly shorter and the wire guide 64 is dispensed with.
    权利要求:
    Claims (24)
    [1]
    claims
    A spacer adjustment device (30) for a wafer exposure unit (10), comprising an actuator (34), a spacer (32) which can be adjusted by the actuator (34) between an active and an inactive position, and a power transmission element (48), which is coupled to the actuator (34), characterized in that the force transmission element (48) consists of wire.
    [2]
    2. Spacer adjustment device according to claim 1, characterized in that the wire (48) is directed wire.
    [3]
    3. Spacer adjustment device according to one of the preceding claims, characterized in that the spacer (32) on a pivot member (44) is mounted.
    [4]
    4. Spacer adjustment device according to claim 3, characterized in that the pivoting element (44) is coupled to the wire (48).
    [5]
    5. Spacer adjustment device according to claim 4, characterized in that the wire (48) is suspended in an opening of the pivoting element (44).
    [6]
    A spacer adjusting device according to any one of claims 3 to 5, characterized in that the spacer (32) is attached to a support arm (42) connected to the pivot member (44).
    [7]
    7. Spacer adjusting device according to claim 6, characterized in that the holding arm (42) consists of wire.
    [8]
    8. Spacer adjustment device according to claim 7, characterized in that the spacer (32) on the wire (42) is mounted.
    [9]
    9. spacer adjustment device according to one of claims 6 to 8, characterized in that the holding arm (32) height adjustable on the pivot element (42) is attachable.
    [10]
    10. Spacer adjustment device according to claim 9, characterized in that the pivoting element (42) is provided with a plurality of openings (80) at different heights, in which the holding arm (42) can be arranged.
    [11]
    11. Spacer adjustment device according to claim 9, characterized in that the pivoting element (42) is provided with an incision (90) in which the holding arm (42) can be fixed at different heights.
    [12]
    12. Spacer adjusting device according to claim 10 or claim 11, characterized in that a fixing screw (82) is provided, with which the holding arm (42) in the pivoting element (42) can be clamped.
    [13]
    13. Spacer adjustment device according to one of claims 3 to 12, characterized in that an adjusting element (54) is provided, which cooperates with the pivoting element (44).
    [14]
    14. Spacer adjusting device according to claim 13, characterized in that the adjusting element (54) is associated with a stop surface (56).
    [15]
    15. Spacer adjustment device according to one of claims 1 and 2, characterized in that a deflection device (60) is provided, which is arranged between the actuator (34) and the spacer (32) and engages the wire (48).
    [16]
    16. Spacer adjustment device according to claim 15, characterized in that the deflection device (60) has a plurality of deflection rollers (62).
    [17]
    17. Spacer adjustment device according to claim 15, characterized in that the deflection device has a wire guide jacket.
    [18]
    18. Spacer adjustment device according to claim 15, characterized in that the deflection device has a guide channel (70).
    [19]
    19. Spacer adjusting device according to one of the preceding claims, characterized in that the actuator (34) has a piston (36), with which the wire (48) is coupled.
    [20]
    20. Spacer adjustment device according to claim 19, characterized in that the piston (36) delimits a pressure chamber, which is acted upon by a pressure medium.
    [21]
    21. Spacer adjustment device according to claim 19 or claim 20, characterized in that a pressure chamber delimiting adjusting element (39) is provided, with which the starting position of the piston (36) is adjustable.
    [22]
    22, spacer adjustment device according to one of claims 19 to 21, characterized in that a return spring (50) is provided.
    [23]
    23. Spacer adjusting device according to claim 22, characterized in that the return spring (50) acts on the piston (36).
    [24]
    24. Wafer exposure unit (10) with a spacer adjustment device (30) according to one of the preceding claims.
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    同族专利:
    公开号 | 公开日
    DE102016110960A1|2017-01-19|
    AT517487B1|2018-12-15|
    KR20170009763A|2017-01-25|
    JP6863686B2|2021-04-21|
    AT517487A3|2018-08-15|
    US20170017169A1|2017-01-19|
    NL2015170B1|2017-02-01|
    US9958795B2|2018-05-01|
    JP2017027028A|2017-02-02|
    TW201704689A|2017-02-01|
    CN106356320A|2017-01-25|
    TWI723023B|2021-04-01|
    CN106356320B|2021-08-10|
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    法律状态:
    优先权:
    申请号 | 申请日 | 专利标题
    NL2015170A|NL2015170B1|2015-07-15|2015-07-15|Spacer displacement device for a wafer illumination unit and wafer illumination unit.|
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